Semiconductor memory device including capacitor

1. A semiconductor device, comprising:

a substrate;

bottom electrodes on the substrate, each bottom electrode including a first region and a second region, the second region containing an additional element relative to the first region;

a first supporting pattern on the substrate and in contact with a portion of a side surface of each bottom electrode;

a top electrode on the bottom electrodes;

a dielectric layer between the bottom electrodes and the top electrode; and

a capping layer between the bottom electrodes and the dielectric layer, the capping layer covering a top surface and a bottom surface of the first supporting pattern,

wherein:

the second region is in contact with the capping layer, and

the capping layer and the dielectric layer include different materials from each other.

2. The semiconductor device as claimed in claim 1 , wherein:

the capping layer includes a metal oxide or a metal oxynitride, and

a metallic element in the capping layer is the same as the additional element in the second region.

3. The semiconductor device as claimed in claim 1 , wherein the dielectric layer is spaced apart from the bottom electrodes and the first supporting pattern.

4. The semiconductor device as claimed in claim 1 , wherein:

the capping layer includes a first doping metal,

the additional element in the second region is a second doping metal, and

a concentration of the first doping metal in the capping layer is higher than a concentration of the second doping metal in the second region.

5. The semiconductor device as claimed in claim 1 , further comprising a second supporting pattern on the first supporting pattern and spaced apart from the first supporting pattern,

wherein the capping layer is in direct contact with a top surface and a bottom surface of the second supporting pattern.

6. The semiconductor device as claimed in claim 1 , further comprising:

an interlayer insulating layer on the substrate;

a conductive contact on the substrate and penetrating the interlayer insulating layer;

an etch stop layer on the interlayer insulating layer; and

a penetration hole on the substrate and exposing a top surface of the etch stop layer,

wherein:

the bottom electrodes penetrate the etch stop layer, and

the capping layer covers an inner side surface and a bottom surface of the penetration hole.

7. The semiconductor device as claimed in claim 1 , wherein:

the capping layer includes a doping metal, and

a bandgap of the doping metal ranges from 3 eV to 12 eV.

8. The semiconductor device as claimed in claim 1 , wherein:

the capping layer includes a doping metal, and

the doping metal in the capping layer includes Ta, V, Mo, Cr, Sb, Co, Ni, Fe, Nb, or Cu.

9. The semiconductor device as claimed in claim 1 , wherein a thickness of the capping layer ranges from 0.05 nm to 0.5 nm.

10. A semiconductor device, comprising:

a substrate;

bottom electrodes on the substrate, each of the bottom electrodes including a first region and a second region, the second region being a doped region;

a first supporting pattern on the substrate and in contact with a portion of a side surface of each of the bottom electrodes;

a top electrode on the bottom electrodes;

a dielectric layer between the bottom electrodes and the top electrode; and

a capping layer between the bottom electrodes and the dielectric layer, between a top surface of the first supporting pattern and the dielectric layer, and between a bottom surface of the first supporting pattern and the dielectric layer,

wherein:

the second region is between the first region and the capping layer, and

the capping layer includes a doping metal.

11. The semiconductor device as claimed in claim 10 , further comprising:

an interlayer insulating layer on the substrate;

a conductive contact on the substrate and penetrating the interlayer insulating layer; and

an etch stop layer on the interlayer insulating layer,

wherein the capping layer is in contact with the etch stop layer.

12. The semiconductor device as claimed in claim 10 , wherein the first region is in direct contact with the first supporting pattern.

13. The semiconductor device as claimed in claim 10 , wherein:

the second region includes a doping metal that is the same as the doping metal in the capping layer, and

a concentration of the doping metal in the second region decreases with decreasing distance to the first region.

14. The semiconductor device as claimed in claim 10 , further comprising a second supporting pattern on the first supporting pattern and connecting the bottom electrodes to each other,

wherein the dielectric layer is spaced apart from the second supporting pattern.

15. The semiconductor device as claimed in claim 10 , wherein the second region has an arc shape, when viewed in a plan view.

16. The semiconductor device as claimed in claim 10 , wherein the capping layer is an electrical insulator.

17. A semiconductor device, comprising:

a semiconductor substrate including a device isolation layer, the device isolation layer defining an active region, the active region including a first impurity region and a pair of second impurity regions, which are spaced apart from each other with the first impurity region therebetween;

a word line in the semiconductor substrate and crossing the active region;

a bit line on the semiconductor substrate and crossing the word line, the bit line being connected to the first impurity region;

a storage node contact on the semiconductor substrate and connected to the second impurity region;

a landing pad electrically connected to the storage node contact;

bottom electrodes on the landing pad, each of the bottom electrodes including a first region and a second region, the second region containing an additional element relative to the first region;

a top electrode on the bottom electrodes;

a supporting pattern between the bottom electrodes;

a dielectric layer between the bottom electrodes and the top electrode; and

a capping layer between the bottom electrodes and the dielectric layer and covering a top surface and a bottom surface of the supporting pattern,

wherein the second region is between the first region and the capping layer.

18. The semiconductor device as claimed in claim 17 , wherein:

the capping layer includes a material different from the dielectric layer, and

the capping layer includes a metal oxide or a metal oxynitride.

19. The semiconductor device as claimed in claim 17 , wherein the capping layer includes a metal different from a metal included in the first region.

20. The semiconductor device as claimed in claim 17 , wherein:

the dielectric layer is spaced apart from the bottom electrodes and the supporting pattern, and

the first region is in direct contact with the supporting pattern.