Ion conductive layer and methods of forming
An ion conductive layer can include a hygroscopic ion conductive material, such as a halide-based material. In an embodiment, the ion conductive layer can include an organic material, ammonium halide, or a combination thereof.
1. A solid ion conductive layer, comprising:
a first phase extending continuously for at least a portion of the solid ion conductive layer, wherein the first phase comprises an ion conductive material comprising a halide-based material represented by formula M 3−δ (Me k+ ) f X 3−δ+*f , wherein −3≤δ<3, 0<f≤1, k is the valence of Me, 2≤k<6, M includes an alkali metal element including Li, Me includes a metal element that is different from M, and X includes a halogen; and
a second phase comprising an organic material comprising a binder material,
wherein the binder material comprises an HLB value of 0; and a Reactivity Value of 0; and
wherein the binder material comprises poly(vinylidene fluoride), polyisobutylene, or a combination thereof.
2. The solid ion conductive layer of claim 1 , wherein the binder material is at most 10 wt % for a total weight of the solid ion conductive layer.
3. The solid ion conductive layer of claim 1 , wherein the binder material comprises poly(vinylidene fluoride).
4. The solid ion conductive layer of claim 1 , wherein the binder material comprises polyisobutylene.
5. The solid ion conductive layer of claim 1 , wherein the binder material comprises siloxane.
6. The solid ion conductive layer of claim 1 , wherein the binder material comprises hydrogenated nitrile butadiene rubber.
7. The solid ion conductive layer of claim 1 , comprising a cathode active material.
8. The solid ion conductive layer of claim 7 , wherein the binder material comprises poly(vinylidene fluoride).
9. The solid ion conductive layer of claim 1 , wherein the solid ion conductive layer is in a form of a tape.
10. The solid ion conductive layer of claim 1 , comprising an ionic conductivity of at least 0.15 mS/cm.
11. The solid ion conductive layer of claim 1 , comprising a porosity of at most 10 vol % for a total volume of the solid ion conductive layer.
12. The solid ion conductive layer of claim 1 , comprising at least 50 vol % and at most 90 vol % of the ion conductive material for a total volume of the solid ion conductive layer.
13. The solid ion conductive layer of claim 3 , comprising at least 0.1 wt % and at most 10 wt % of poly(vinylidene fluoride) for a total weight of the solid ion conductive layer.
14. The solid ion conductive layer of claim 1 , comprising a network of interconnecting flakes within a bulk of the solid ion conductive layer, wherein the flakes comprise the halide-based material and comprising pores extending through at least a portion of the network.
15. The solid ion conductive layer of claim 1 , further comprising an electrode active electrode material.
16. A composition, comprising a solid ion conductive material including a halide-based material represented by M 3−δ (Me k+ ) f X 3−δk*f , wherein −3≤δ<3, 0<f≤1, k is the valence of Me, 2≤k<6, M includes an alkali metal element including Li, Me includes a metal element that is different from M, and X includes a halogen and an organic material, wherein the organic material comprises polyisobutylene and a solvent having an HLB value of 0 and a Reactivity Value of 0.
17. The composition of claim 16 , comprising at least 1 wt % to at most 60 wt % of the solvent and at least 20 wt % to at most 90 wt % of the solid ion conductive material for the total weight of the composition, wherein the composition is a slurry.
18. The composition of claim 16 , wherein the halide material is doped with ammonium halide.
19. The composition of claim 16 , further comprising an electrode active material.