Substrate processing apparatus
A substrate processing apparatus comprises a processing tub and a fluid supply. In the processing tub, a processing is performed on multiple substrates by immersing the multiple substrates in a processing liquid. The fluid supply is disposed under the multiple substrates within the processing tub and configured to discharge a fluid to generate a liquid flow of the processing liquid within the processing tub. Further, the fluid supply includes multiple discharge paths configured to discharge the fluid to different regions in an arrangement direction of the multiple substrates.
1. A substrate processing apparatus, comprising:
a processing tub in which a processing is performed on multiple substrates; and
a fluid supply disposed under the multiple substrates within the processing tub and configured to discharge a fluid within the processing tub,
wherein the fluid supply includes multiple discharge paths including a first discharge path having a first plurality of discharge openings and a second discharge path having a second plurality of discharge openings,
the first plurality of discharge openings provided in the first discharge path are arranged at a front side of the processing tub, and
the second plurality of discharge openings provided in the second discharge path are arranged at a back side of the processing tub,
wherein the fluid supply includes additional discharge paths configured to discharge the fluid and disposed in parallel to the multiple discharge paths in a direction orthogonal to the arrangement direction of the multiple substrates, and
inner diameters of the multiple discharge paths are smaller than those of the additional discharge paths,
wherein both of the multiple discharge paths and the additional discharge paths are connected to a same fluid source configured to supply the fluid.
2. The substrate processing apparatus of claim 1 ,
wherein the fluid supply supplies a gas as the fluid.
3. The substrate processing apparatus of claim 2 ,
wherein the fluid supply is equipped with a discharge plate including multiple discharge regions partitioned from each other, and
each of the multiple discharge regions includes multiple discharge openings and is connected to a corresponding one of the multiple discharge paths.
4. The substrate processing apparatus of claim 3 , further comprising:
a moving mechanism configured to move the multiple discharge paths.
5. The substrate processing apparatus of claim 4 ,
wherein the fluid supply includes a discharge opening through which the fluid is discharged toward an inner wall of the processing tub.
6. The substrate processing apparatus of claim 5 ,
wherein the fluid supply is equipped with a mounting plate on which the multiple discharge paths are mounted, and
the mounting plate includes multiple mounting holes, and each of the multiple discharge paths is mounted on a corresponding one of the multiple mounting holes.
7. The substrate processing apparatus of claim 1 ,
wherein the fluid supply is equipped with a discharge plate including multiple discharge regions partitioned from each other, and
each of the multiple discharge regions includes multiple discharge openings and is connected to a corresponding one of the multiple discharge paths.
8. The substrate processing apparatus of claim 1 , further comprising:
a moving mechanism configured to move the multiple discharge paths.
9. The substrate processing apparatus of claim 1 ,
wherein the fluid supply further includes a discharge opening through which the fluid is discharged toward an inner wall of the processing tub.
10. The substrate processing apparatus of claim 1 ,
wherein the fluid supply is equipped with a mounting plate on which the multiple discharge paths are mounted, and
the mounting plate includes multiple mounting holes, and each of the multiple discharge paths is mounted on a corresponding one of the multiple mounting holes.
11. A substrate processing apparatus, comprising:
a processing tub in which a processing is performed on multiple substrates;
a fluid supply disposed under the multiple substrates within the processing tub and configured to discharge a fluid within the processing tub; and
a controller configured to control at least one of a discharge time or a flow rate or both of the fluid discharged from the fluid supply,
wherein the fluid supply includes multiple discharge paths including a first discharge path having a first plurality of discharge openings and a second discharge path having a second plurality of discharge openings,
the first plurality of discharge openings provided in the first discharge path are arranged at a front side of the processing tub, and
the second plurality of discharge openings provided in the second discharge path are arranged at a back side of the processing tub,
wherein the fluid supply includes additional discharge paths configured to discharge the fluid and disposed in parallel to the multiple discharge paths in a direction orthogonal to the arrangement direction of the multiple substrates, and
inner diameters of the multiple discharge paths are smaller than those of the additional discharge paths,
wherein both of the multiple discharge paths and the additional discharge paths are connected to a same fluid source configured to supply the fluid.
12. The substrate processing apparatus of claim 11 , further comprising:
a moving mechanism configured to move the multiple discharge paths,
wherein the controller changes discharge positions of the multiple discharge paths by controlling the moving mechanism to move the multiple discharge paths in a state where the multiple substrates are immersed in the processing tub and the fluid is discharged from the multiple discharge paths.
13. The substrate processing apparatus of claim 12 ,
wherein the moving mechanism moves the multiple discharge paths along the arrangement direction of the multiple substrates.
14. The substrate processing apparatus of claim 10 ,
wherein the controller moves the multiple discharge paths by a stroke smaller than a distance between the multiple substrates.