Sliced grating coupler with increased beam alignment sensitivity

1. An integrated device comprising:

a grating disposed on a substrate and arranged to couple radiation incident on the grating into a plurality of optical waveguides disposed on the substrate;

a first inlet to a first receiving region of the plurality of optical waveguides;

a second inlet to a second receiving region of the plurality of optical waveguides, wherein the second inlet is offset a first amount with respect to the first inlet in a first direction approximately perpendicular to lines of the grating;

a plurality of pixels formed on the substrate, each including a reaction chamber configured to receive a sample for genetic or protein sequencing, detection and/or measurement;

wherein the waveguides are configured to provide excitation radiation to the reaction chambers; and

wherein each waveguide of the plurality of optical waveguides comprises a first dielectric material embedded within a second dielectric material having a lower index of refraction than the first dielectric material.

2. The integrated device of claim 1 , further comprising a third inlet to a third receiving region of the plurality of optical waveguides, wherein the third inlet is offset a second amount with respect to the first inlet in a second direction approximately perpendicular to lines of the grating, the second direction opposite the first direction.

3. The integrated device of claim 2 , wherein a first portion of the grating located adjacent to the first inlet has a first periodicity that is different than a second periodicity of a second portion of the grating located adjacent to a fourth inlet to a fourth receiving region of the plurality of optical waveguides.

4. The integrated device of claim 1 , further comprising:

a first optical sensor arranged to receive radiation coupled into the first waveguide; and

a second optical sensor arranged to receive radiation coupled into the second waveguide.

5. The integrated device of claim 1 wherein the first inlet is at a first position angle to the first receiving region and the second inlet is at a second position angle to the second receiving region.

6. The integrated device of claim 1 , wherein the first inlet has a different width than the second inlet.

7. The integrated device of claim 1 , wherein the first amount of the offset is any value between 1 micron and 20 microns.

8. The integrated device of claim 1 , wherein the grating comprises a plurality of separated grating portions.

9. The integrated device of claim 1 , wherein lines of the grating comprise a first dielectric material embedded within a second dielectric material having a lower index of refraction than the first dielectric material.

10. The integrated device of claim 1 , wherein lines of the grating comprise a metal.

11. The integrated device of claim 9 , wherein the first dielectric material is a same material and layer that is used to form the plurality of optical waveguides.

12. The integrated device of claim 1 , wherein the first dielectric material is silicon nitride.

13. The integrated device of claim 1 , wherein the second receiving region has a tapered width.

14. The integrated device of claim 13 , wherein a width of the first inlet is different from a width of the second inlet.

15. An integrated device comprising:

a grating disposed on a substrate and arranged to couple radiation incident on the grating into a plurality of optical waveguides disposed on the substrate;

a first inlet to a first receiving region of the plurality of optical waveguides; and

a second inlet to a second receiving region of the plurality of optical waveguides, wherein the second inlet is offset a first amount with respect to the first inlet in a first direction approximately perpendicular to lines of the grating; and

a plurality of pixels formed on the substrate, each including a reaction chamber and an optical sensor, wherein at least one waveguide is configured to provide excitation radiation to a plurality of the reaction chambers;

wherein each reaction chamber is configured to receive a sample for genetic sequencing or protein sequencing, detection and/or measurement.

16. An integrated device comprising:

a grating disposed on a substrate and arranged to couple radiation incident on the grating into a plurality of optical waveguides disposed on the substrate;

a first inlet to a first waveguide of the plurality of optical waveguides;

a second inlet to a second waveguide of the plurality of optical waveguides, wherein a first portion of the grating located adjacent to the first inlet has a different periodicity than a second portion of the grating located adjacent to the second inlet; and

a plurality of pixels formed on the substrate, each including a reaction chamber configured to receive a sample for genetic or protein sequencing, detection and/or measurement;

wherein the waveguides are configured to provide excitation radiation to the reaction chambers; and

wherein each waveguide of the plurality of optical waveguides comprises a first dielectric material embedded within a second dielectric material having a lower index of refraction than the first dielectric material.

17. The integrated device of claim 16 , further comprising:

a first optical sensor arranged to receive radiation coupled into the first waveguide; and

a second optical sensor arranged to receive radiation coupled into the second waveguide.

18. An integrated device comprising:

a grating disposed on a substrate and arranged to couple radiation incident on the grating into a plurality of optical waveguides disposed on the substrate;

a first inlet to a first receiving region of the plurality of optical waveguides;

a second inlet to a second receiving region of the plurality of optical waveguides, wherein the second inlet is offset a first amount with respect to the first inlet in a first direction approximately perpendicular to lines of the grating;

a third inlet to a third receiving region of the plurality of optical waveguides, wherein a first portion of the grating located adjacent to the first inlet has a different periodicity than a second portion of the grating located adjacent to the third inlet; and

a plurality of pixels formed on the substrate, each including a reaction chamber configured to receive a sample for genetic or protein sequencing, detection and/or measurement;

wherein the waveguides are configured to provide excitation radiation to the reaction chambers; and

wherein each waveguide of the plurality of optical waveguides comprises a first dielectric material embedded within a second dielectric material having a lower index of refraction than the first dielectric material.