IP Library › Granted Patent US 11,749,545
Granted Patent B2
US 11,749,545 · App. 16/888,612 · Granted Sep 5, 2023

Substrate-floatation-type laser processing apparatus and method for measuring floating height

Inventors: Daisuke Hayashi (Tokyo, JP); Takahiro Mikami (Tokyo, JP); Yuki Suzuki (Tokyo, JP)
Assignee: JSW AKTINA SYSTEM CO., LTD
H01L21/67259B65G19/02H01L21/67115H01L21/02675
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Quick Facts
Patent No.
US 11,749,545
App. No.
16/888,612
Granted
Sep 5, 2023
Kind
B2
Abstract

A substrate-floatation-type laser processing apparatus and a method for measuring a floating height, capable of improving performance of laser processing are provided. A substrate-floatation-type laser processing apparatus according to an embodiment includes a stage configured to float and convey a substrate, and a floating-height measurement apparatus configured to measure a floating height H of the substrate. Note that a distance between the floating-height measurement apparatus and the substrate can be automatically adjusted according to the measured floating height H. The floating height H of the substrate is measured by applying laser light to the substrate and the stage. The distance between the floating-height measurement apparatus and the substrate is adjusted by using a feedback mechanism in which the measured floating height of the substrate is used as an input.

Claims (31)

1. A substrate-floatation-type laser processing apparatus comprising:

a floating stage configured to float and convey a substrate;

a floating-height measurement apparatus configured to measure a floating height of the substrate in the floating stage, the floating height being a distance between a top surface of the floating stage and a bottom surface of the substrate in the floating stage; and

a controller to which the measured floating height is input from the floating-height measurement apparatus, the controller being configured to determine a difference between the measured floating height and a preset target value, wherein

a distance along a vertical axis between the floating-height measurement apparatus and the substrate in the floating stage is automatically adjusted based on the determined difference by moving the floating-height measurement apparatus along the vertical axis,

wherein the distance between the floating-height measurement apparatus and the substrate is adjusted so as to make the floating height larger than the preset target value when the difference is negative, and so as to make the floating height smaller than the preset target value when the difference is positive.

2. The substrate-floatation-type laser processing apparatus according to claim 1 , wherein the floating height of the substrate is measured by applying laser light to the substrate and the floating stage.

3. The substrate-floatation-type laser processing apparatus according to claim 1 , wherein the distance between the floating-height measurement apparatus and the substrate is adjusted by using a feedback mechanism in which the measured floating height of the substrate is used as an input.

4. The substrate-floatation-type laser processing apparatus according to claim 2 , wherein

the floating-height measurement apparatus comprises a laser displacement gauge configured to apply the laser light to the substrate and the floating stage and receive reflected light of the laser light reflected by the substrate and the floating stage, and

the laser displacement gauge measures the floating height of the substrate from reflected light of the laser light reflected by a bottom surface of the substrate and reflected light of the laser light reflected by a top surface of the floating stage.

5. The substrate-floatation-type laser processing apparatus according to claim 1 , wherein

the floating-height measurement apparatus comprises a camera configured to take an image of a top surface of the substrate, and

the camera measures the floating height of the substrate based on its position at which its focal point coincides with the top surface of the substrate when the substrate is brought into contact with the floating stage and its position at which its focal point coincides with the top surface of the substrate when the substrate is floated over the floating stage.

6. The substrate-floatation-type laser processing apparatus according to claim 1 , wherein

the floating-height measurement apparatus comprises a camera configured to take an image of a top surface of the substrate, and

the camera measures the floating height of the substrate based on its position at which its focal point coincides with the top surface or a bottom surface of the substrate and its position at which its focal point coincides with the top surface of the floating stage.

7. The substrate-floatation-type laser processing apparatus according to claim 1 , wherein

the floating-height measurement apparatus comprises a length measurement device configured to measure a distance to a top surface of the substrate, and

the length measurement device measures the floating height of the substrate based on a distance to the top surface of the substrate when the substrate is brought into contact with the floating stage and a distance to the top surface of the substrate when the substrate is floated over the floating stage.

8. The substrate-floatation-type laser processing apparatus according to claim 1 , wherein

the floating-height measurement apparatus comprises a translation movement stage extending in one direction on a horizontal plane above the floating stage, and

the floating-height measurement apparatus measures the floating height of the substrate along the one direction.

9. The substrate-floatation-type laser processing apparatus according to claim 8 , wherein the translation movement stage is movable in another direction perpendicular to the one direction on the horizontal plane above the floating stage.

10. The substrate-floatation-type laser processing apparatus according to claim 1 , wherein

the floating stage comprises a plurality of floatation units configured to eject air for floating the substrate, and

a top surface of the floating stage includes top surfaces of the plurality of floatation units.

11. The substrate-floatation-type laser processing apparatus according to claim 1 , wherein the controller excludes the input floating height from data for adjusting the distance when the difference between the target value and the input floating height exceeds a predetermined range.

12. The substrate-floatation-type laser processing apparatus according to claim 1 , wherein

the controller comprises a storage unit in which a distance between the floating-height measurement apparatus and the floating stage is stored, and

the controller corrects the measured floating height of the substrate by using the distance stored in the storage unit.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 28, 2022
From: THE JAPAN STEEL WORKS, LTD.
To: JSW AKTINA SYSTEM CO., LTD.
Reel/Frame 059418/0794 →
CORRECTIVE ASSIGNMENT TO CORRECT THE SECOND INVENTOR'S EXECUTION DATE PREVIOUSLY RECORDED AT REEL: 052794 FRAME: 0389. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Sep 10, 2021
From: HAYASHI, DAISUKE; MIKAMI, TAKAHIRO; SUZUKI, YUKI
To: THE JAPAN STEEL WORKS, LTD.
Reel/Frame 058297/0966 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 29, 2020
From: HAYASHI, DAISUKE; MIKAMI, TAKAHIRO; SUZUKI, YUKI
To: THE JAPAN STEEL WORKS, LTD.
Reel/Frame 052794/0389 →
Priority Claims (1)
JP 2019-130992 · Jul 16, 2019 · national
Continuity (1)
Related Publication 20210020481A1 · Jan 21, 2021