Thermal acid generator and resist composition using same
A thermal acid generator having a high acid generation temperature, and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R 1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y 1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R 11 and R 12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R 13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R 2 to R 7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R 1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R 1 is optionally substituted with —O— or the like).
1. A method of making a resist, said method comprising:
heating an acid-reactive organic substance and a thermal acid generator, wherein said heating of the thermal acid generator releases a Lewis acid to induce a polymerization or cross-linking of said acid-reactive organic substance to make said resist;
wherein the polymerization or cross-linking is performed at a heating condition of 200 to 300° C. for 1 to 100 minutes; and
wherein the thermal acid generator is
selected from the group consisting of:
2. The method according to claim 1 , wherein the thermal acid generator is selected from the group consisting of:
3. The method according to claim 1 , wherein the thermal acid generator is the following Compound No. 4:
4. The method according to claim 1 , wherein the polymerization or cross-linking is performed at a heating condition of 209 to 300° C. for 1 to 100 minutes.
5. A resist obtained by the method according to claim 1 .
6. A resist obtained by the method according to claim 3 .