Electronic device with 2-dimensional electron gas between polar-oriented rare-earth oxide layer grown over a semiconductor
Layered structures described herein include electronic devices with 2-dimensional electron gas between polar-oriented cubic rare-earth oxide layers on a non-polar semiconductor. Layered structure includes a semiconductor device, comprising a III-N layer or rare-earth layer, a polar rare-earth oxide layer grown over the III-N layer or rare-earth layer, a gate terminal deposited or grown over the polar rare-earth oxide layer, a source terminal that is deposited or epitaxially grown over the layer, and a drain terminal that is deposited or grown over the layer.
1. A layered structure, comprising:
a group III-nitride (III-N) layer, wherein the III-N layer has an orientation that is not polar; and
a polar rare-earth oxide layer grown over the III-N layer,
wherein the orientation of the III-N layer comprises an atomic arrangement such that a portion of rare-earth metal atoms of the polar rare-earth oxide layer are vertically aligned with nitrogen atoms of the III-N layer, and
wherein the orientation of the III-N layer comprises a <1-100> orientation or a <11-20> orientation.
2. The layered structure of claim 1 , wherein the orientation of the III-N layer is non-polar.
3. The layered structure of claim 1 , wherein the orientation of the III-N layer is semi-polar.
4. The layered structure of claim 1 , further comprising:
a rare-earth silicide layer grown over the polar rare-earth oxide layer.
5. The layered structure of claim 1 , further comprising:
an epitaxial metal layer epitaxially grown over the polar rare-earth oxide layer.
6. The layered structure of claim 1 , wherein the polar rare-earth oxide layer has at least a first portion of electrons that diffuse to an interface between the polar rare-earth oxide layer and the III-N layer or are transferred to the III-N layer to form an n-type 2-dimensional electron gas (2DEG) on the III-N layer.
7. The layered structure of claim 6 , wherein the III-N layer and the polar rare-earth oxide layer are selected to yield a conduction band offset between the III-N layer and the polar rare-earth oxide layer that is sufficient for electrons to diffuse from the polar rare-earth oxide layer into the III-N layer.
8. The layered structure of claim 1 , further comprising:
a group IV substrate; and
an epi-twist rare-earth oxide layer over the group IV substrate,
wherein the III-N layer is over the epi-twist rare-earth oxide layer.
9. The layered structure of claim 8 , further comprising:
an epitaxial metal layer between the epi-twist rare-earth oxide layer and the III-N layer.
10. The layered structure of claim 1 , wherein the III-N layer comprises gallium nitride.
11. A semiconductor device, comprising:
a group III-nitride (III-N) layer, wherein the III-N layer has an orientation that is not polar;
a polar rare-earth oxide layer grown over the III-N layer;
a gate terminal deposited or grown over the polar rare-earth oxide layer;
a source terminal that is deposited or epitaxially grown over the layer; and
a drain terminal that is deposited or grown over the layer,
wherein the orientation of the III-N layer comprises an atomic arrangement such that a portion of rare-earth metal atoms of the polar rare-earth oxide layer are vertically aligned with nitrogen atoms of the III-N layer, and
wherein the orientation of the III-N layer comprises a <1-100> orientation or a <11-20> orientation.
12. The semiconductor device of claim 11 , wherein the gate terminal comprises a rare-earth silicide or an epitaxial metal element.
13. The semiconductor device of claim 11 , further comprising:
a silicon dioxide layer between the polar rare-earth oxide layer and the gate terminal.
14. The semiconductor device of claim 11 , further comprising:
a silicon substrate; and
an epi-twist rare-earth oxide layer over the silicon substrate,
wherein the III-N layer is over the epi-twist rare-earth oxide layer.
15. The semiconductor device of claim 14 , wherein the III-N layer aligns with a first region on the epi-twist rare-earth oxide layer, and the layered structure further comprises:
a second III-N layer over a second region on the epi-twist rare-earth oxide layer, wherein the first region and the second region are non-overlapping;
a transparent electrode over a first sub-region of the second III-N layer; and
an electrode over a second sub-region of the III-N layer,
wherein the second III-N layer, the transparent electrode, and the electrode form a photonic device.
16. The semiconductor device of claim 15 , wherein the first region of the epi-twist rare-earth oxide layer and the second region of the epi-twist rare-earth oxide layer are discontinuous.
17. The semiconductor device of claim 16 , further comprising:
a silicon device integrated into the silicon substrate at a third region between the first region of the epi-twist rare-earth oxide layer and the second region of the epi-twist rare-earth oxide layer.
18. The semiconductor device of claim 17 , further comprising:
an element that comprises a rare-earth pnictide over the silicon substrate at the third region between the first region of the epi-twist rare-earth oxide layer and the second region of the epi-twist rare-earth oxide layer; and
a III-N device over the rare-earth pnictide element.
19. A layered structure, comprising:
a rare-earth-nitride (RE-N) layer, wherein the RE-N layer has an orientation that is not polar; and
a polar rare-earth oxide layer grown over the RE-N layer,
wherein the orientation of the RE-N layer comprises an atomic arrangement such that a portion of rare-earth metal atoms of the polar rare-earth oxide layer are vertically aligned with nitrogen atoms of the RE-N layer, and
wherein the orientation of the RE-N layer comprises a <1-100> orientation or a <11-20> orientation.
20. The layered structure of claim 19 , wherein the orientation of the RE-N layer is non-polar.
21. The layered structure of claim 19 , wherein the orientation of the RE-N layer is semi-polar.
22. The layered structure of claim 19 , further comprising:
a rare-earth silicide layer grown over the polar rare-earth oxide layer.
23. The layered structure of claim 19 , further comprising:
an epitaxial metal layer epitaxially grown over the polar rare-earth oxide layer.
24. The layered structure of claim 19 , wherein the polar rare-earth oxide layer has at least a first portion of electrons that diffuse to an interface between the polar rare-earth oxide layer and the RE-N layer or are transferred to the RE-N layer to form an n-type 2-dimensional electron gas (DEG) on the RE-N layer.
25. The layered structure of claim 24 , wherein the RE-N layer and the polar rare-earth oxide layer are selected to yield a conduction band offset between the RE-N layer and the polar rare-earth oxide layer that is sufficient for electrons to diffuse from the polar rare-earth oxide layer into the RE-N layer.
26. The layered structure of claim 19 , further comprising:
a group IV substrate; and
an epi-twist rare-earth oxide layer over the group IV substrate,
wherein the RE-N layer is over the epi-twist rare-earth oxide layer.
27. The layered structure of claim 26 , further comprising:
an epitaxial metal layer between the epi-twist rare-earth oxide layer and the RE-N layer.