Transmission X-ray critical dimension (T-XCD) characterization of shift and tilt of stacks of high-aspect-ratio (HAR) structures
A method for X-ray measurement includes generating and directing an X-ray beam to a sample including at least first and second layers stacked on one another, the X-ray beam incident on a sample location at which the first and second layers include respective first and second high aspect ratio (HAR) structures. X-ray scatter profiles are measured, that are emitted from the sample location in response to the X-ray beam as a function of tilt angle between the sample and the X-ray beam. A shift is estimated, between the first and second layers and a characteristic tilt of the first and second layers, based on the X-ray scatter profiles measured as a function of the tilt angle.
1. A method for X-ray measurement, the method comprising:
generating and directing an X-ray beam to a sample comprising at least first and second layers stacked on one another, the X-ray beam incident on a sample location at which the first and second layers comprise respective first and second high aspect ratio (HAR) structures;
measuring X-ray scatter profiles emitted from the sample location in response to the X-ray beam as a function of tilt angle between the sample and the X-ray beam; and
estimating a shift between the first and second layers and a characteristic tilt of the first and second layers, based on the X-ray scatter profiles measured as a function of the tilt angle, including:
defining a model of an X-ray scatter profile as a function of the relative shift and the characteristic tilt; and
calculating a fit between the measured X-ray scatter profiles to the model, and extracting the estimated shift and the characteristic tilt from the fit.
2. The method according to claim 1 , wherein estimating the characteristic tilt of the first and second layers comprises estimating one or more of: an average tilt of the first and second layers, an extremum tilt of the first and second layers, and a relative tilt between the first and second layers.
3. The method according to claim 1 , wherein calculating the fit comprises applying a regression model to the measured X-ray scatter profiles.
4. The method according to claim 1 , wherein calculating the fit comprises:
fitting, to the X-ray scatter profiles, functions that comprise multiple peaks; and
solving a regression model for (i) relative intensities of the peaks and (ii) an angular position of a center peak, which best match the measured X-ray scatter profiles.
5. The method according to claim 1 , wherein calculating the fit comprises applying a non-linear regression model to the measured X-ray scatter profiles.
6. The method according to claim 1 , wherein measuring the X-ray scatter profiles comprises combining multiple X-ray scatter measurements from multiple different angular ranges into a combined measured X-ray scatter profile.
7. The method according to claim 1 , wherein the HAR structures are holes.
8. The method according to claim 4 , wherein estimating the shift and the characteristic tilt comprises deducing the shift and the characteristic tilt from the relative intensities and the angular position that best match the measured X-ray scatter profiles.
9. A method for X-ray measurement, the method comprising:
generating and directing an X-ray beam to a sample comprising at least first and second layers stacked on one another, the X-ray beam incident on a sample location at which the first and second layers comprise respective first and second high aspect ratio (HAR) structures;
measuring X-ray scatter profiles emitted from the sample location in response to the X-ray beam as a function of tilt angle between the sample and the X-ray beam; and
estimating a shift between the first and second layers and a characteristic tilt of the first and second layers, based on the X-ray scatter profiles measured as a function of the tilt angle, by applying a machine learning model to the measured X-ray scatter profiles.
10. A system for X-ray measurement, the system comprising:
an X-ray source configured to generate an X-ray beam;
optics configured to direct the X-ray beam to a sample comprising at least first and second layers stacked on one another, the X-ray beam incident on a sample location at which the first and second layers comprise respective first and second high aspect ratio (HAR) structures; and
a processor, which is configured to:
measure, using a detector, X-ray scatter profiles emitted from the sample location in response to the X-ray beam as a function of tilt angle between the sample and the X-ray beam; and
estimate a shift between the first and second layers and a characteristic tilt of the first and second layers, based on the X-ray scatter profiles measured as a function of the tilt angle, including:
defining a model of an X-ray scatter profile as a function of the relative shift and the characteristic tilt; and
calculating a fit between the measured X-ray scatter profiles to the model, and extracting the estimated shift and the characteristic tilt from the fit.
11. The system according to claim 10 , wherein the processor is configured to estimate the characteristic tilt of the first and second layers by estimating one or more of: an average tilt of the first and second layers, an extremum tilt of the first and second layers, and a relative tilt between the first and second layers.
12. The system according to claim 10 , wherein the processor is configured to calculate the fit by applying a regression model to the measured X-ray scatter profiles.
13. The system according to claim 10 , wherein the processor is configured to calculate the fit by:
fitting, to the X-ray scatter profiles, functions that comprise multiple peaks; and
solving a regression model for (i) relative intensities of the peaks and (ii) an angular position of a center peak, which best match the measured X-ray scatter profiles.
14. The system according to claim 10 , wherein the processor is configured to calculate the fit by applying a non-linear regression model to the measured X-ray scatter profiles.
15. The system according to claim 10 , wherein the processor is configured to measure the X-ray scatter profiles by combining multiple X-ray scatter measurements from multiple different angular ranges into a combined measured X-ray scatter profile.
16. The system according to claim 10 , wherein the HAR structures are holes.
17. The system according to claim 13 , wherein the processor is configured to deduce the shift and the characteristic tilt from the relative intensities and the angular position that best match the measured X-ray scatter profiles.
18. A system for X-ray measurement, the system comprising:
an X-ray source configured to generate an X-ray beam;
optics configured to direct the X-ray beam to a sample comprising at least first and second layers stacked on one another, the X-ray beam incident on a sample location at which the first and second layers comprise respective first and second high aspect ratio (HAR) structures; and
a processor, which is configured to:
measure, using a detector, X-ray scatter profiles emitted from the sample location in response to the X-ray beam as a function of tilt angle between the sample and the X-ray beam; and
estimate a shift between the first and second layers and a characteristic tilt of the first and second layers, based on the X-ray scatter profiles measured as a function of the tilt angle, by applying a machine learning model to the measured X-ray scatter profiles.