Resist composition, method of forming resist pattern, and acid diffusion-controlling agent
A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid. The resist composition includes a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (d0) in which Rd 01 represents a monovalent organic group, Rd 02 represents a single bond or a divalent linking group, m represents an integer of 1 or greater, and M m+ represents an m-valent organic cation
1. A resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid, the resist composition comprising:
a base material component (A) whose solubility in a developing solution is changed by action of an acid; and
a compound (D0) represented by General Formula (d0),
wherein Rd 01 represents a linear or branched alkynyl group, or a monocyclic hydrocarbon group which may have a substituent; Rd 02 represents a single bond or a linear or branched alkylene group; m represents an integer of 1 or greater; and M m+ represents an m-valent organic cation represented by any one of General Formulae (ca-1) to (ca-5):
wherein R 201 to R 207 and R 211 to R 212 each independently represents an aryl group, an alkyl group, or an alkenyl group, each of which may have a substituent; provided that R 201 to R 203 may be bonded to each other to form a ring together with the sulfur atoms in the formulae, R 206 to R 207 may be bonded to each other to form a ring together with the sulfur atoms in the formulae, and R 211 to R 212 may be bonded to each other to form a ring together with the sulfur atoms in the formulae; R 208 and R 209 each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; R 210 represents an aryl group which may have a substituent, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, or a —SO 2 -containing cyclic group which may have a substituent; L 201 represents —C(═O)— or —C(═O)—O—; Y 201 s each independently represents an arylene group, an alkylene group, or an alkenylene group; x represents 1 or 2; and W 201 represents an (x+1)-valent linking group.
2. The resist composition according to claim 1 , wherein the anion moiety in General Formula (d0) is an anion represented by General Formula (d0-an),
wherein R d011 represents a monocyclic hydrocarbon group which may have a substituent;
R 021 represents a single bond or a linear or branched alkylene group; n 011 represents an integer of 0 to 3.
3. The resist composition according to claim 1 , wherein Rd 02 represents a single bond.
4. A method of forming a resist pattern, comprising:
forming a resist film on a support using the resist composition according to claim 1 ;
exposing the resist film; and
developing the exposed resist film to form a resist pattern.
5. An acid diffusion-controlling agent comprising a compound represented by General Formula (d0),
wherein Rd 01 represents a linear or branched alkynyl group, or a monocyclic hydrocarbon group which may have a substituent; Rd 02 represents a single bond or a linear or branched alkylene group; m represents an integer of 1 or greater; and M m+ represents an m-valent organic cation represented by any one of General Formulae (ca-1) to (ca-5):
wherein R 201 to R 207 and R 211 to R 212 each independently represents an aryl group, an alkyl group, or an alkenyl group, each of which may have a substituent; provided that R 201 to R 203 may be bonded to each other to form a ring together with the sulfur atoms in the formulae, R 206 to R 207 may be bonded to each other to form a ring together with the sulfur atoms in the formulae, and R 211 to R 212 may be bonded to each other to form a ring together with the sulfur atoms in the formulae; R 208 and R 209 each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; R 210 represents an aryl group which may have a substituent, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, or a —SO 2 -containing cyclic group which may have a substituent; L 201 represents —C(═O)— or —C(═O)—O—; Y 201 s each independently represents an arylene group, an alkylene group, or an alkenylene group; x represents 1 or 2; and W 201 represents an (x+1)-valent linking group.
6. The acid diffusion-controlling agent according to claim 5 , wherein the anion moiety in General Formula (d0) is an anion represented by General Formula (d0-an),
wherein Rd 011 represents a monocyclic hydrocarbon group which may have a substituent;
Rd 021 represents a single bond or a linear or branched alkylene group; n 011 represents an integer of 0 to 3.
7. The acid diffusion-controlling agent according to claim 5 , wherein Rd 02 represents a single bond.