IP Library Granted Patent US 11,762,292
Granted Patent B2
US 11,762,292 · App. 14/980,222 · Granted Sep 19, 2023

Coating compositions for use with an overcoated photoresist

Inventors: Sun-Jung Lee (Gyeonggi-Do, KR); Jihoon Kang (Seoul, KR); Dong-Je Hong (Gyeonggi-Do, KR)
Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
G03F7/0397G03F7/11G03F7/325
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Quick Facts
Patent No.
US 11,762,292
App. No.
14/980,222
Granted
Sep 19, 2023
Kind
B2
Abstract

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a surface agent of the Formula (I). where A and B are each independently hydrogen, optionally substituted alkyl or optionally substituted aryl; X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and n is a positive integer. Preferred coating compositions can provide improved pattern collapse margin of an overcoated photoresist layer.

Claims (37)

1. A method for forming a photoresist relief image, comprising:

a) applying on a substrate a layer of a coating composition comprising 1) a matrix polymer that comprises polyester linkages; 2) a surface energy control agent; 3) a crosslinking agent; and 4) a thermal acid generator, wherein the coating composition does not comprise fluorine;

b) thermally treating the applied coating composition layer; and thereafter

c) applying a layer of a photoresist composition above the coating composition layer,

wherein the surface energy control agent comprises a structure corresponding to the following Formula (I):

wherein A and B are each independently hydrogen, or optionally substituted alkyl, provided that at least one or A and B is not hydrogen;

X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and

n is a positive integer, and the surface energy control agent has a number average molecule weight of 300 to 1,000.

2. The method of claim 1 wherein the photoresist composition is imaged with activating radiation and the imaged photoresist composition layer is developed to provide a photoresist relief image.

3. The method of claim 2 wherein a developer is applied to the imaged photoresist composition layer and unexposed portions of the photoresist layer are removed by the developer.

4. The method of claim 1 wherein the coating composition comprises the surface energy control agent in an amount of 1 weight percent to 10 weight percent based on total solid content of the coating composition.

5. The method of claim 1 wherein the surface energy control agent is a poly(ethylene glycol)methyl ether.

6. The method of claim 1 wherein the matrix polymer further comprises cyanurate groups.

7. The method of claim 1 further comprising imaging the photoresist composition layer with 193 nm activating radiation.

8. The method of claim 1 further comprising imaging the photoresist composition layer with EUV radiation.

9. The method of claim 1 wherein substituents of the substituted alkyl of A and B are selected from the group consisting of halogen, nitro, hydroxy, amino, alkyl, alkenyl, alkylamino, and carbocyclic aryl.

10. A coated substrate comprising:

a substrate having thereon:

1) a coating composition comprising a) a matrix polymer that comprises polyester linkages; b) a surface energy control agent, c) a crosslinking agent; and d) a thermal acid generator, wherein the coating composition does not comprise fluorine; and

2) a layer of a photoresist composition above the coating composition layer, wherein the surface energy control agent comprises a structure corresponding to the following Formula (I):

wherein A and B are each independently hydrogen, or optionally substituted alkyl, provided that at least one or A and B is not hydrogen, and wherein substituents of the substituted alkyl of A and B are selected from the group consisting of halogen, nitro, hydroxy, amino, alkyl, alkenyl, alkylamino, and carbocyclic aryl;

X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and

n is a positive integer, and the surface energy control agent has a number average molecular weight of 300 to 1,000.

11. The substrate of claim 10 wherein the matrix polymer further comprises cyanurate groups.

12. A coating composition for use with an overcoated photoresist composition layer, the coating composition comprising:

1) a crosslinker agent;

2) a matrix polymer comprising polyester linkages;

3) a surface energy control agent which is distinct from the matrix polymer and comprising a structure corresponding to the following Formula (I):

wherein A and B are each independently hydrogen, or optionally substituted alkyl, provided that at least one or A and B is not hydrogen, and wherein substituents of the substituted alkyl of A and B are selected from the group consisting of halogen, nitro, hydroxy, amino, alkyl, alkenyl, alkylamino, and carbocyclic aryl;

X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and

n is a positive integer,

the surface energy control agent has a number average molecular weight of 300 to 1,000, and

4) a thermal acid generator.

wherein the coating composition does not comprise fluorine.

13. The coating composition of claim 12 wherein the coating composition is formulated with a solvent carrier.

14. The coating composition of claim 12 wherein the surface energy control agent is a poly(ethylene glycol)methyl ether.

15. The composition of claim 12 wherein the matrix polymer comprises cyanurate groups.

Assignments (2)
CHANGE OF NAME Recorded Feb 10, 2025
From: ROHM & HAAS ELECTRONIC MATERIALS KOREA LTD
To: DUPONT SPECIALTY MATERIALS KOREA LTD
Reel/Frame 070165/0806 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 28, 2015
From: LEE, SUN-JUNG, MR.; KANG, JIHOON, MR.; HONG, DONG-JE, MR.
To: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
Reel/Frame 037365/0273 →
Continuity (2)
Provisional Application 62097667 · Dec 30, 2014
Related Publication 20160187778A1 · Jun 30, 2016