Semiconductor device with redistribution structure and method for fabricating the same

1. A semiconductor device, comprising:

a first chip comprising:

a first substrate comprising a center region and a peripheral region surrounding the center region;

a first center bonding pad positioned above the center region of the first substrate; and

a first peripheral bonding pad positioned above the peripheral region of the first substrate; and

a second chip positioned on the first chip and comprising:

a plurality of peripheral upper bonding pads located at a peripheral region of the second chip and respectively positioned on the first center bonding pad and the first peripheral bonding pad;

a plurality of redistribution structures respectively positioned on the plurality of peripheral upper bonding pads and extending toward a center region of the second chip;

a plurality of center lower bonding pads located at the center region of the second chip and respectively positioned on the plurality of redistribution structures; and

a plurality of storage units electrically coupled to the plurality of center lower bonding pads.

2. The semiconductor device of claim 1 , wherein the plurality of redistribution structures comprise:

a plurality of redistribution layers respectively positioned on the plurality of peripheral upper bonding pads, and respectively extending from the peripheral region of the second chip toward the center region of the second chip; and

a plurality of redistribution plugs located at the center region of the second chip, and positioned between the plurality of center lower bonding pads and the plurality of redistribution layers, respectively and correspondingly.

3. The semiconductor device of claim 2 , further comprising a plurality of first supporting plugs respectively positioned on the plurality of redistribution layers, wherein the plurality of first supporting plugs are distant from the plurality of redistribution plugs and the plurality of first supporting plugs are floating.

4. The semiconductor device of claim 3 , further comprising a plurality of second supporting plugs respectively positioned on the plurality of redistribution layers, wherein the plurality of second supporting plugs are distant from the plurality of first supporting plugs and the plurality of second supporting plugs are floating.

5. The semiconductor device of claim 4 , wherein a distance between an adjacent pair of the plurality of redistribution plugs and the plurality of first supporting plugs and a distance between an adjacent pair of the plurality of first supporting plugs and the plurality of second supporting plugs are substantially the same.

6. The semiconductor device of claim 2 , further comprising a molding layer positioned on the first chip and covering the second chip.

7. A method for fabricating a semiconductor device, comprising: providing a first chip comprising:

providing a first substrate comprising a center region and a peripheral region;

forming a plurality of storage units above the first substrate;

forming a plurality of center lower bonding pads above the plurality of storage units and located at the center region;

forming a plurality of redistribution plugs on the plurality of center lower bonding pads;

forming a plurality of first supporting plugs and a plurality of second supporting plugs above the first substrate;

forming a plurality of second redistribution layers on the plurality of redistribution plugs, the plurality of first supporting plugs, and the plurality of second supporting plugs;

forming a plurality of peripheral upper bonding pads on the plurality of second redistribution; and

bonding a second chip onto the first chip.

8. The method for fabricating the semiconductor device of claim 7 , wherein the first chip is configured as a logic chip and the second chip is configured as a memory chip, and the plurality of storage units are configured as capacitor array or floating array.

9. The method for fabricating the semiconductor device of claim 7 , wherein the plurality of redistribution plugs and the plurality of second redistribution layers together configure a plurality of redistribution structures.

10. The method for fabricating the semiconductor device of claim 7 , wherein the plurality of redistribution structures comprise:

a plurality of redistribution layers respectively positioned on the plurality of peripheral upper bonding pads, and respectively extending from the peripheral region of the second chip toward the center region of the second chip; and

a plurality of redistribution plugs located at the center region of the second chip, and positioned between the plurality of center lower bonding pads and the plurality of redistribution layers, respectively and correspondingly.

11. The method for fabricating the semiconductor device of claim 7 , wherein the plurality of first supporting plugs are distant from the plurality of redistribution plugs and the plurality of first supporting plugs are floating.

12. The method for fabricating the semiconductor device of claim 7 , wherein the plurality of second supporting plugs are distant from the plurality of first supporting plugs and the plurality of second supporting plugs are floating.

13. The method for fabricating the semiconductor device of claim 7 , wherein a distance between an adjacent pair of the plurality of redistribution plugs and the plurality of first supporting plugs and a distance between an adjacent pair of the plurality of first supporting plugs and the plurality of second supporting plugs are substantially the same.