Display substrate and method for manufacturing the same

1. A display substrate, comprising:

a light-emitting substrate, which comprises a plurality of light-emitting regions arranged in parallel with a light propagation direction, and each light-emitting region is provided with a light-emitting layer;

a defining layer provided on the light-emitting substrate and comprising a plurality of hollow-out portions, and the hollow-out portions correspond to the light-emitting regions one to one;

a plurality of micro-lenses provided in the hollow-out portions in a one-to-one correspondence manner;

a first planarization layer provided on a side of the light-emitting layer close to the defining layer; and

a second planarization layer provided on a side of the defining layer away from the first planarization layer and completely covering the micro-lenses, wherein

a refractive index of the first planarization layer, a refractive index of each of the micro-lenses, a refractive index of the second planarization layer, a curvature radius of each of the micro-lenses, a focal length of each of the micro-lenses, and an aperture of each of the micro-lenses satisfy the following conditions:

r

≥

D

2

;

n

2

-

n

3

n

1

≥

D

2

⁢

f

;

where n1 is the refractive index of the first planarization layer; n2 is the refractive index of each of the micro-lenses; n3 is the refractive index of the second planarization layer; r is the curvature radius of each of the micro-lenses; f is the focal length of each of the micro-lenses; and D is the aperture of each of the micro-lenses.

2. The display substrate of claim 1 , wherein a material of the micro-lenses comprises a negative photoresist.

3. The display substrate of claim 1 , wherein a material of the defining layer comprises a metal oxide.

4. The display substrate of claim 3 , wherein the metal oxide comprises indium tin oxide or indium gallium zinc oxide.

5. The display substrate of claim 1 , further comprising a color filter substrate provided between the light-emitting substrate and the first planarization layer, wherein the color filter substrate comprises a plurality of color filter regions, each of the color filter regions has a color filter layer disposed thereon, and color filter layers are provided in a one-to-one correspondence with the light-emitting layers.

6. The display substrate of claim 1 , further comprising a color filter substrate provided between the light-emitting substrate and the first planarization layer, wherein the color filter substrate comprises a plurality of color filter regions, each of the color filter regions has a color filter layer disposed thereon, and color filter layers are provided in a one-to-one correspondence with the light-emitting layers.

7. The display substrate of claim 1 , wherein the light-emitting substrate further comprises a plurality of color filter layers, the color filter layers are in a one-to-one correspondence with the light-emitting layers and are located on a side of the first planarization layer away from the defining layer, and the plurality of color filter layers are located on a side of the light-emitting substrate opposite to the light-emitting layer.

8. The display substrate of claim 1 , wherein the light-emitting substrate further comprises a plurality of color filter layers, the color filter layers are in a one-to-one correspondence with the light-emitting layers and are located on a side of the first planarization layer away from the defining layer, and the plurality of color filter layers are located on a side of the light-emitting substrate opposite to the light-emitting layer.

9. A display device, comprising the display substrate of claim 1 .

10. A method for manufacturing a display substrate, comprising:

forming a defining layer on a side of a light-emitting substrate; the light-emitting substrate comprises a plurality of light-emitting regions which are arranged in parallel with a light propagation direction, each light-emitting region is provided with a light-emitting layer, the defining layer comprises a plurality of hollowed-out portions, the hollowed-out portions are in a one-to-one correspondence with the light-emitting regions, and the defining layer is located on a side of the light-emitting substrate away from the light-emitting layers; and

forming micro-lenses in the hollow-out portions such that the micro-lenses are in a one-to-one correspondence with the light-emitting regions,

forming a first planarization layer provided on a side of the light-emitting layer close to the defining layer; and

forming a second planarization layer provided on a side of the defining layer away from the first planarization layer and completely covering the micro-lenses, wherein

a refractive index of the first planarization layer, a refractive index of each of the micro-lenses, a refractive index of the second planarization layer, a curvature radius of each of the micro-lenses, a focal length of each of the micro-lenses, and an aperture of each of the micro-lenses satisfy the following conditions:

r

≥

D

2

;

n

2

-

n

3

n

1

≥

D

2

⁢

f

;

where n1 is the refractive index of the first planarization layer; n2 is the refractive index of each of the micro-lenses; n3 is the refractive index of the second planarization layer; r is the curvature radius of each of the micro-lenses; f is the focal length of each of the micro-lenses; and D is the aperture of each of the micro-lenses.

11. The method of claim 10 , wherein the forming the defining layer on the side of the light-emitting substrate further comprises:

depositing an entire film layer on the side of the light-emitting substrate; and

patterning the entire film layer to obtain the defining layer comprising the plurality of hollow-out portions, wherein the hollow-out portions are in a one-to-one correspondence with the light-emitting regions.

12. The method of claim 10 , wherein the forming the micro-lenses in the hollow-out portions such that the micro-lenses are in the one-to-one correspondence with the light-emitting regions further comprises:

forming an entire layer of micro-lens base layer on the side of the light-emitting substrate; wherein the micro-lens base layer completely covers the defining layer, and a thickness of the micro-lens base layer is greater than or equal to that of each micro-lens;

forming a micro-lens mask layer on a side of the micro-lens base layer away from the defining layer, wherein the micro-lens mask layer comprises a plurality of micro-lens masks, and the micro-lens masks are in a one-to-one correspondence with the light-emitting regions; and

etching the micro-lens mask layer, and etching the micro-lens base layer by taking the micro-lens mask layer as a mask until reaching the defining layer so as to obtain the plurality of micro-lenses, wherein the micro-lenses are in a one-to-one correspondence with the light-emitting regions.

13. The method of claim 12 , wherein the forming the micro-lens mask layer on the side of the micro-lens base layer away from the defining layer further comprises:

forming an entire reflow layer on the side of the micro-lens base layer away from the defining layer, wherein the entire reflow layer completely covers the micro-lens base layer;

patterning the entire reflow layer to obtain a plurality of sub-reflow-layers such that the sub-reflow-layers are in a one-to-one correspondence with the light-emitting regions; and

performing a thermal reflow on the sub-reflow-layers to form micro-lens masks corresponding the sub-reflow-layers in a one-to-one correspondence manner, so that the micro-lens masks are in a one-to-one correspondence with the light-emitting regions, and the micro-lens mask layer comprising the plurality of micro-lens masks is formed.