ALD cycle time reduction using process chamber lid with tunable pumping

1. A process chamber lid comprising:

a pumping liner having a body with an inner wall, an outer wall, a top wall and a bottom wall, the inner wall extending around a central axis spaced a first distance from the central axis to form an open central region;

a showerhead positioned within the open central region of the pumping liner, the showerhead having a front surface and a back surface defining a thickness with a plurality of apertures extending through the thickness;

a gas funnel positioned within the open central region of the pumping liner, the gas funnel having a front surface and sidewalls, the front surface spaced a distance from the back surface of the showerhead to form a gap, the sidewalls in contact with the inner wall of the pumping liner to form a plenum, the gas funnel having an opening extending through the back surface to the front surface, the gas funnel including a plurality of apertures extending from the front surface to the back surface of the gas funnel, the apertures extending from a common area adjacent the back surface of the gas funnel to the gap; and

a purge ring having a ring shaped body with an inner peripheral edge, an outer peripheral edge, a top surface and a bottom surface defining a thickness of the body, the purge ring positioned within the open central region of the pumping liner, the bottom surface of the purge ring in contact with the back surface of the gas funnel, a circular channel formed in the bottom surface of the purge ring body positioned adjacent the common area of the apertures in the gas funnel, at least two openings extending from the top surface of the body to the top surface of the circular channel.

2. The process chamber lid of claim 1 , wherein the plurality of apertures in the gas funnel are separated into radial zones, each radial zone at a different distance from the central axis and having a plurality of openings in the front surface of the gas funnel.

3. The process chamber lid of claim 2 , wherein each of the radial zones comprises a plurality of apertures extending around the central axis in a circular pattern.

4. The process chamber lid of claim 3 , further comprising a purge ring exhaust line splitting at a junction to form at least two legs, each leg connecting one of the at least two openings in the purge ring to exhaust downstream of the junction.

5. The process chamber lid of claim 4 , wherein the purge ring exhaust line comprises a dump valve downstream of the junction and upstream of the exhaust.

6. The process chamber lid of claim 5 , further comprising a plenum exhaust line connecting the plenum to exhaust.

7. The process chamber lid of claim 6 , wherein there are two openings in the plenum and each opening is in fluid communication with an end of the plenum exhaust line, the ends of the plenum exhaust line connecting at a plenum exhaust junction.

8. The process chamber lid of claim 6 , wherein the plenum exhaust line joins the purge ring exhaust line at a union downstream of the dump valve of the purge ring exhaust line.

9. The process chamber lid of claim 8 , wherein the union comprises a valve that controls a flow amount from each of the plenum exhaust line and the purge ring exhaust line.

10. The process chamber lid of claim 9 , further comprising a controller configured to control a flow of gas into the opening in the gas funnel and out of the gap between the gas funnel and the showerhead through the plurality of apertures in the showerhead.

11. The process chamber lid of claim 10 , wherein the controller is further configured to control a flow of gas through the apertures in the showerhead into the gap between the gas funnel and the showerhead and out of the gap through the plurality of apertures in the gas funnel.

12. The process chamber lid of claim 11 , wherein the controller is further configured to meter the flow of gas through the dump valve.

13. The process chamber of lid claim 11 , wherein the controller is further configured to meter the flows of gases through the plenum exhaust line and the purge ring exhaust line.

14. The process chamber lid of claim 11 , wherein the thermal element is positioned closer to the central axis of the body than the circular channel.

15. The process chamber lid of claim 12 , wherein the thermal element comprises a heater with a power capacity up to 3200 W.

16. The process chamber lid of claim 1 , wherein the purge ring further comprises a thermal element within the body.

17. A process chamber lid comprising:

a pumping liner having a body with an inner wall, an outer wall, a top wall and a bottom wall, the inner wall extending around a central axis spaced a first distance from the central axis to form an open central region;

a showerhead positioned within the open central region of the pumping liner, the showerhead having a front surface and a back surface defining a thickness with a plurality of apertures extending through the thickness;

a gas funnel positioned within the open central region of the pumping liner, the gas funnel having a front surface and sidewalls, the front surface spaced a distance from the back surface of the showerhead to form a gap, the sidewalls in contact with the inner wall of the pumping liner to form a plenum, the gas funnel having an opening extending through the back surface to the front surface, the gas funnel including a plurality of apertures extending from the front surface to the back surface of the gas funnel, the apertures extending from a common area adjacent the back surface of the gas funnel to the gap and forming a plurality of radial zones of openings in the front surface, each of the radial zones comprises a plurality of apertures extending around the central axis in a circular pattern and spaced at a different distance from the central axis than other radial zones;

a purge ring having a ring shaped body with an inner peripheral edge, an outer peripheral edge, a top surface and a bottom surface defining a thickness of the body, the purge ring positioned within the open central region of the pumping liner, the bottom surface of the purge ring in contact with the back surface of the gas funnel, a circular channel formed in the bottom surface of the purge ring body positioned adjacent the common area of the apertures in the gas funnel, at least two openings extending from the top surface of the body to the top surface of the circular channel; and

a purge ring exhaust line splitting at a junction to form at least two legs, each leg connecting one of the at least two openings in the purge ring to exhaust downstream of the junction, the purge ring exhaust line comprising a dump valve downstream of the junction and upstream of the exhaust.

18. The process chamber lid of claim 17 , further comprising a plenum exhaust line connecting the plenum to exhaust, the plenum exhaust line joining the purge ring exhaust line at a union downstream of the dump valve, the union comprising a valve that controls a flow amount from each of the plenum exhaust line and the purge ring exhaust line.

19. The process chamber lid of claim 18 , further comprising a controller comprising one or more configurations selected from: a configuration to control a flow of gas into the opening in the gas funnel and out of the gap between the gas funnel and the showerhead through the plurality of apertures in the showerhead; a configuration to control a flow of gas through the apertures in the showerhead into the gap between the gas funnel and the showerhead and out of the gap through the plurality of apertures in the gas funnel; a configuration to meter the flow of gas through the dump valve; and a configuration to meter the flows of gases through the plenum exhaust line and the purge ring exhaust line.