Display apparatus and method of manufacturing the same

1. A method of manufacturing a display apparatus, the method comprising:

forming a lower metal layer on an upper surface of a substrate,

wherein the substrate comprises a main display area, a component area, and a peripheral area,

wherein the component area comprises a transmission area, and the peripheral area is arranged outside the main display area,

wherein the lower metal layer is formed in the component area, and the lower metal layer comprises a first metal layer and a second metal layer;

forming a conductive material layer on the substrate in the main display area and on the lower metal layer in the component area;

forming a pixel electrode by removing at least a portion of the conductive material layer and by removing the second metal layer from the transmission area;

forming an organic functional layer, an opposite electrode, and an upper layer on an entirety of the upper surface of the substrate,

wherein the organic functional layer, the opposite electrode, and the upper layer cover the pixel electrode and the first metal layer; and

irradiating a lower surface of the substrate that is opposite to the upper surface of the substrate in the transmission area with a laser beam.

2. The method of claim 1 , wherein forming the pixel electrode by removing the at least the portion of the conductive material layer and by removing the second metal layer from the transmission area comprises:

removing the at least the portion of the conductive material layer and the second metal layer from the transmission area through wet-etching.

3. The method of claim 2 , further comprising:

forming an undercut structure in the second metal layer through the wet-etching.

4. The method of claim 1 , wherein forming the lower metal layer comprising the first metal layer and the second metal layer comprises:

forming the first metal layer having a first thickness in a thickness direction of the display apparatus; and

forming the second metal layer having a second thickness in the thickness direction of the display apparatus,

wherein the second thickness is greater than the first thickness.

5. The method of claim 4 , wherein the first thickness is about 200 Å to about 400 Å, and the second thickness is about 2,500 Å to about 3,500 Å.

6. The method of claim 4 , wherein the first metal layer comprises at least one of Ti, Cr, ITO, IZO, ZnO, In 2 O 3 , IGO, and AZO.

7. The method of claim 4 , wherein the second metal layer comprises Mo.

8. The method of claim 4 , wherein the lower metal layer is directly formed on the upper surface of the substrate.

9. The method of claim 1 , wherein the first metal layer, the organic functional layer, the opposite electrode, and the upper layer formed on the upper surface of the substrate in the transmission area are removed by irradiating the lower surface of the substrate that is opposite to the upper surface of the substrate in the transmission area with the laser beam.

10. The method of claim 9 , wherein the lower metal layer comprises a first hole corresponding to the transmission area.

11. The method of claim 1 , further comprising:

forming a main thin-film transistor on the substrate in the main display area and an auxiliary thin-film transistor on the lower metal layer in the component area after forming the lower metal layer on the upper surface of the substrate in the component area and before forming the conductive material layer on the substrate in the main display area and on the lower metal layer in the component area.

12. The method of claim 11 , wherein the lower metal layer and the auxiliary thin-film transistor at least partially overlap each other.

13. The method of claim 1 , wherein a component is further arranged on the lower surface of the substrate in the component area, and

the component comprises an imaging device or a sensor.