Control system and method of machine and host computer
View Patent ↗The present disclosure provides a host computer, and a control system and method of a machine. The host computer includes a control unit, a service configuration unit, and a functional flow unit. The control unit is configured to control a lower level computer to execute items of a functional flow of the machine. The service configuration unit is configured with action instruction information used to execute the functional flow of the machine and configured to interact with the control unit. The functional flow unit stores items of the functional flow of the machine edited by a user and is configured to interact with the control unit. A technical solution of the host computer and the control system and method of the machine may realize an editable function of the functional flow of the machine to improve flexibility, convenience, and a degree of automation of addition/modification of the functional flow.
1. A control method of an etching machine, comprising:
editing a functional flow of the etching machine by using a host computer;
editing items of the functional flow of the etching machine item by item according to action instruction information configured with a service configuration circuit and used to execute the functional flow of the etching machine;
setting a time interval between adjacent items of the functional flow of the etching machine after editing the items of the functional flow and before storing the edited items;
storing edited items of the functional flow of the etching machine in a functional flow circuit; and
starting the functional flow circuit and causing a control circuit to control a lower level computer to execute the stored items of the functional flow of the etching machine when needed.
2. The method according to claim 1 , wherein:
the items of the functional flow of the etching machine include an action instruction service and a logic instruction; and
the logic instruction is used to control an execution sequence, execution time, and an execution condition of the functional flow of the etching machine.
3. The method according to claim 2 , wherein:
the logic instruction includes a wait instruction, when the functional flow of the etching machine is executed to the wait instruction, a next item is executed after waiting for determined time; or
when the functional flow of the etching machine is executed to the wait instruction, whether the execution condition is satisfied is determined, or whether wait time reaches the determined time is determined, if yes, the next item is executed.
4. The method according to claim 2 , wherein:
the logic instruction further includes a cycle start instruction and a cycle end instruction;
when the functional flow of the etching machine is executed to the cycle start instruction, items between the cycle start instruction and the cycle end instruction are automatically and cyclically executed for a predetermined time; or
when the functional flow of the etching machine is executed to the cycle start instruction, whether the execution condition is satisfied is determined, if yes, the items between the cycle start instruction and the cycle end instruction are executed cyclically for the predetermined time.
5. The method according to claim 2 , wherein:
the logic instruction further includes a start instruction and an end instruction; and
when the functional flow of the etching machine is executed to the start instruction, whether the execution condition is satisfied is determined, if yes, items between the start instruction and the end instruction are executed; if not, the items between the start instruction and the end instruction are not executed; or
the logic instruction further includes the start instruction, a middle instruction, and the end instruction; and
when the functional flow of the etching machine is executed to the start instruction, whether the execution condition is satisfied is determined, if yes, items between the start instruction and the middle instruction are executed, and items between the middle instruction and the end instruction are not executed; if not, the items between the middle items and the end instruction are executed, and the items between the start instruction and the middle instruction are not executed.
6. The control system according to claim 1 , wherein:
a format of a storage file of the functional flow circuit includes XML; and
a format of a configuration file of the service configuration circuit includes XML.
7. A host computer for a control system of an etching machine, configured to perform the control method according to claim 1 .
8. A control system of an etching machine, comprising:
a host computer, configured to perform the control method according to claim 1 , and
a lower level computer configured to receive service and parameters of the service sent from the host computer and execute items of the functional flow of the etching machine according to the service and the parameters.
9. A control method of an etching machine, configured to edit a functional flow of the etching machine by using a host computer, comprising:
editing items of the functional flow of the etching machine item by item by executing the functional flow of the etching machine;
storing edited items of the functional flow of the etching machine; and
controlling a lower level computer to execute the stored items of the functional flow of the etching machine when needed, wherein:
the items of the functional flow of the etching machine include an action instruction service and a logic instruction; and
the logic instruction is used to control an execution sequence, execution time, and an execution condition of the functional flow of the etching machine.