Semiconductor device and method of manufacture
A semiconductor device including a test pad contact and a method of manufacturing the semiconductor device are disclosed. In an embodiment, a semiconductor device may include a first metal feature and a second metal feature disposed in a single top metal layer over a substrate. A test pad may be formed over and electrically connected to the first metal feature. A first passivation layer may be formed over the second metal feature and the test pad and may cover top and side surfaces of the test pad. A first via may be formed penetrating the first passivation layer and contacting the test pad and a second via may be formed penetrating the first passivation layer and contacting the second metal feature.
1. A method comprising:
forming a first conductive feature and a second conductive feature in a first dielectric layer on a semiconductor substrate;
depositing a second dielectric layer on the first conductive feature, the second conductive feature, and the first dielectric layer;
forming a first conductive via in the second dielectric layer and electrically coupled to the first conductive feature;
forming a third conductive feature on and electrically coupled to the first conductive via;
depositing a bond layer on the third conductive feature, the second conductive feature, and the second dielectric layer;
forming a first bond pad extending through the bond layer and electrically coupled to the third conductive feature;
forming a second bond pad extending through the bond layer and the second dielectric layer, wherein the second bond pad is electrically coupled to the second conductive feature; and
planarizing the bond layer, the first bond pad, and the second bond pad.
2. The method of claim 1 , wherein the bond layer is deposited after forming the third conductive feature.
3. The method of claim 1 , further comprising planarizing the first conductive feature, the second conductive feature, and the first dielectric layer.
4. The method of claim 1 , further comprising planarizing the first conductive via and the second dielectric layer.
5. The method of claim 1 , wherein forming the first bond pad and the second bond pad comprises:
forming a first plurality of openings in the bond layer; and
widening top portions of the first plurality of openings such that the openings have a stair-step structure.
6. The method of claim 1 , wherein the first conductive feature and the second conductive feature are formed of copper, and wherein the third conductive feature is formed of aluminum.
7. The method of claim 1 , further comprising performing a wafer-acceptance test on the third conductive feature.
8. A method comprising:
forming a first conductive feature and a second conductive feature on a substrate;
forming a third conductive feature over and electrically coupled to the first conductive feature;
performing a wafer-acceptance test on the third conductive feature;
forming a first bond pad physically and electrically coupled to the third conductive feature;
forming a second bond pad physically and electrically coupled to the second conductive feature; and
planarizing the first bond pad and the second bond pad.
9. The method of claim 8 , wherein the first conductive feature and the second conductive feature are formed in a first dielectric layer, wherein the method further comprises planarizing the first conductive feature, the second conductive feature, and the first dielectric layer.
10. The method of claim 8 , further comprising forming a bond layer on the third conductive feature after performing the wafer-acceptance test.
11. The method of claim 10 , wherein the first bond pad and the second bond pad extend through the bond layer, and wherein planarizing the first bond pad and the second bond pad further planarizes the bond layer.
12. The method of claim 8 , wherein the first conductive feature and the second conductive feature are formed of copper, and wherein the third conductive feature is formed of aluminum.
13. The method of claim 8 , wherein the second bond pad is formed with a height greater than a combined height of the first bond pad and the third conductive feature.
14. The method of claim 8 , further comprising:
planarizing the first conductive feature and the second conductive feature; and
forming a conductive via on and electrically coupled to the first conductive feature, wherein the third conductive feature is formed on and electrically coupled to the conductive via.
15. A method comprising:
planarizing a first conductive feature, a second conductive feature, and a first dielectric layer on a substrate;
depositing a second dielectric layer on the first conductive feature, the second conductive feature, and the first dielectric layer;
forming a conductive via in the second dielectric layer;
forming a third conductive feature on the conductive via;
probing the third conductive feature to perform a circuit test;
forming a third dielectric layer on the second dielectric layer and the third conductive feature;
forming a first bond pad extending through the third dielectric layer to the third conductive feature; and
forming a second bond pad extending through the third dielectric layer and the second dielectric layer to the second conductive feature.
16. The method of claim 15 , further comprising planarizing the second dielectric layer and the conductive via.
17. The method of claim 15 , further comprising planarizing the first bond pad, the second bond pad, and the third dielectric layer.
18. The method of claim 15 , wherein a combined height of the first bond pad, the third conductive feature, and the conductive via is equal to a height of the second bond pad.
19. The method of claim 15 , further comprising:
forming a first opening in the third dielectric layer exposing the third conductive feature;
forming a second opening in the third dielectric layer and the second dielectric layer exposing the second conductive feature; and
widening top portions of the first opening and the second opening.
20. The method of claim 19 , wherein the second opening is formed after forming the first opening.