Active matrix substrate and method for manufacturing same
An active matrix substrate includes a first TFT having an oxide semiconductor layer formed from a first oxide semiconductor film and a second TFT having an oxide semiconductor layer formed from a second oxide semiconductor film. The oxide semiconductor layer of each TFT includes a high-resistance region including a channel region and offset regions and low-resistance regions including a source contact region, a drain contact region, and interposed regions. The first TFT has a gate insulating layer including a first insulating film and a second insulating film. The second TFT has a gate insulating layer including the second insulating film but not including the first insulating film. A total length L 1 of the offset regions of the first TFT in a channel length direction is greater than a total length L 2 of the offset regions of the second TFT in the channel length direction.
1. An active matrix substrate comprising:
a substrate; and
a plurality of oxide semiconductor TFTs, supported by a principal surface of the substrate, that include a first TFT and a second TFT,
wherein
each of the oxide semiconductor TFTs has an oxide semiconductor layer, a gate insulating layer disposed over a part of the oxide semiconductor layer, a gate electrode disposed over a part of the gate insulating layer, a source electrode, and a drain electrode,
the oxide semiconductor layer of the first TFT is formed from a first oxide semiconductor film,
the oxide semiconductor layer of the second TFT is a layer that is separate from the oxide semiconductor layer of the first TFT, and is formed from a second oxide semiconductor film that is higher in mobility than the first oxide semiconductor film,
each of the oxide semiconductor layers of the first and second TFTs includes
a high-resistance region covered with the gate insulating layer, and
low-resistance regions located on both sides of the high-resistance region and not covered with the gate insulating layer, the low-resistance regions having smaller specific resistance than the high-resistance region,
the high-resistance region includes a channel region overlapping the gate electrode when viewed from an angle parallel with a direction normal to the principal surface of the substrate and offset regions that, when viewed from an angle parallel with the direction normal to the principal surface of the substrate, overlap the gate insulating layer but do not overlap the gate electrode, the offset regions including source-side and drain-side offset regions located on both sides, respectively, of the channel region,
the low-resistance regions include a source contact region electrically connected to the source electrode, a drain contact region placed opposite the source contact region across the high-resistance region and electrically connected to the drain electrode, a source-side interposed region located between the source contact region and the high-resistance region, and a drain-side interposed region located between the drain contact region and the high-resistance region,
the gate insulating layer of the first TFT includes a first insulating film and a second insulating film disposed over the first insulating film,
the gate insulating layer of the second TFT includes the second insulating film but does not include the first insulating film, and
a total length L 1 of the offset regions of the first TFT in a channel length direction is greater than a total length L 2 of the offset regions of the second TFT in the channel length direction.
2. The active matrix substrate according to claim 1 , further comprising a first insulating layer located between the oxide semiconductor layer of the second TFT and the substrate,
wherein the first insulating layer includes the first insulating film.
3. A method for manufacturing the active matrix substrate according to claim 2 , the method comprising:
(A) forming the oxide semiconductor layer of the first TFT over the substrate;
(B) forming an insulating film so that the insulating film covers the oxide semiconductor layer of the first TFT, the insulating film being to serve as the first insulating film;
(C) forming the oxide semiconductor layer of the second TFT over the insulating film;
(D) forming a different insulating film so that the different insulating film covers the oxide semiconductor layer of the second TFT, the different insulating film being to serve as the second insulating film;
(E) forming the gate electrode of the first TFT and the gate electrode of the second TFT over the different insulating film;
(F) by patterning the insulating film and the different insulating film after step (E), obtaining the first insulating film and the second insulating film from the insulating film and the different insulating film, respectively, thereby forming the gate insulating layer of the first TFT and the gate insulating layer of the second TFT and forming the first insulating layer on a side of the oxide semiconductor layer of the second TFT that faces the substrate; and
(G) by subjecting each of the first and second TFTs to a resistance lowering process for making portions of the oxide semiconductor layer not covered with the gate insulating layer lower in specific resistance than a portion of the oxide semiconductor layer covered with the gate insulating layer, forming the low-resistance regions in the portions of the oxide semiconductor layer not covered with the gate insulating layer.
4. The method according to claim 3 , wherein step (F) includes
forming the gate insulating layer of the first TFT, the gate insulating layer of the second TFT, and the first insulating layer by subjecting the insulating film and the different insulating film to dry etching with an identical resist layer as a mask, and
making a width of the gate insulating layer of the first TFT in the channel length direction greater than a width of the gate insulating layer of the second TFT in the channel length direction by performing the dry etching under such conditions that the taper shapes are formed on the side surfaces of the first insulating film and the second insulating film in the gate insulating layer of the first TFT and the side surfaces of the second insulating film in the gate insulating layer of the second TFT.
5. The method according to claim 3 , wherein step (F) includes
(f1) subjecting the different insulating film to first etching with a first resist layer as a mask, and
(f2) after step (f1), subjecting the insulating film to second etching with a second resist layer as a mask, the second resist layer being different from the first resist layer.
6. The method according to claim 3 , wherein step (F) includes
(f3) patterning the insulating film and the different insulating film by third etching with a third resist layer as a mask to form the gate insulating layer of the second TFT and the first insulating layer in a region in which the second TFT is formed, and
(f4) before or after step (f3), patterning the insulating film and the different insulating film by fourth etching with a fourth resist layer as a mask to form the gate insulating layer of the first TFT in a region in which the first TFT is formed, the fourth resist layer being different from the third resist layer.
7. The active matrix substrate according to claim 1 , wherein side surfaces of the first insulating film and the second insulating film in the gate insulating layer of the first TFT and side surfaces of the second insulating film in the gate insulating layer of the second TFT all have taper shapes.
8. The active matrix substrate according to claim 7 , wherein the side surfaces of the first insulating film and the side surfaces of the second insulating film in the gate insulating layer of the first TFT are aligned with each other.
9. The active matrix substrate according to claim 7 , wherein when viewed from an angle parallel with the direction normal to the substrate, a distance d 1 between an edge of the second insulating film and an edge of the gate electrode in the first TFT and a distance d 2 between an edge of the second insulating film and an edge of the gate electrode in the second TFT are substantially equal to each other, and a distance d 3 between an edge of the first insulating film and the edge of the gate electrode in the first TFT is greater than the distance d 1 and the distance d 2 .
10. The active matrix substrate according to claim 1 , wherein
in the gate insulating layer of the first TFT, the second insulating film covers only a part of an upper surface of the first insulating film, and
when viewed from an angle parallel with the direction normal to the substrate, the side surfaces of the second insulating film are located further inward than the side surfaces of the first insulating film.
11. The active matrix substrate according to claim 1 , wherein the first insulating film and the second insulating film contain an identical insulating material.
12. The active matrix substrate according to claim 1 , wherein the first TFT has a threshold voltage obtained by shifting a threshold voltage of the second TFT in a positive direction.
13. The active matrix substrate according to claim 12 , wherein
the first TFT has an enhancement characteristic, and
the second TFT has a depression characteristic.
14. The active matrix substrate according to claim 1 , wherein
the active matrix substrate has a display area including a plurality of pixel areas and a non-display area provided around the display area,
the plurality of oxide semiconductor TFTs include a plurality of pixel TFTs each disposed in one of the plurality of pixel areas and a plurality of circuit TFTs constituting a peripheral circuit disposed in the non-display area,
each of the pixel TFTs is the first TFT, and
the plurality of circuit TFTs include the second TFT.
15. The active matrix substrate according to claim 14 , further comprising:
a plurality of source bus lines; and
a plurality of gate bus lines,
wherein
the source electrode of each of the pixel TFTs is electrically connected to one of the plurality of source bus lines,
the gate electrode of each of the pixel TFTs is electrically connected to one of the plurality of gate bus lines,
the peripheral circuit includes an SSD circuit that distributes a display signal to n source bus lines of the plurality of source bus lines, and
the SSD circuit includes a plurality of SSD circuit TFTs, and
each of the SSD circuit TFTs is the second TFT.
16. The active matrix substrate according to claim 1 , wherein
the active matrix substrate has a display area including a plurality of pixel areas; and a non-display area provided around the display area,
the plurality of oxide semiconductor TFTs include a plurality of pixel TFTs each disposed in one of the plurality of pixel areas and a plurality of circuit TFTs constituting a peripheral circuit disposed in the non-display area, and
the plurality of circuit TFTs include the first TFT and the second TFT.
17. The active matrix substrate according to claim 1 , wherein
the first oxide semiconductor film and the second oxide semiconductor film both contain In or Sn or both, and
a total of atomic-number ratios of In and Sn with respect to all metallic elements in the second oxide semiconductor film is greater than a total of atomic-number ratios of In and Sn with respect to all metallic elements in the first oxide semiconductor film.
18. The active matrix substrate according to claim 17 , wherein
the first oxide semiconductor film and the second oxide semiconductor film are both In—Ga—Zn—O semiconductor films, and
a total of atomic-number ratios of In with respect to all metallic elements in the second oxide semiconductor film is greater than a total of atomic-number ratios of In with respect to all metallic elements in the first oxide semiconductor film.
19. The active matrix substrate according to claim 1 , wherein
the second oxide semiconductor film contains Sn, and
the first oxide semiconductor film either does not contain Sn or contains Sn at a lower concentration than the second oxide semiconductor film.
20. The active matrix substrate according to claim 1 , wherein at least either the first oxide semiconductor film or the second oxide semiconductor film is an In—Ga—Zn—O semiconductor film containing a crystalline portion.