IP Library › Granted Patent US 11,794,220
Granted Patent B2
US 11,794,220 · App. 16/924,633 · Granted Oct 24, 2023

Fluid supply unit and substrate treating apparatus having the same

Inventors: Inhwang Park (Suwon-si, KR); Gui Su Park (Cheonan-si, KR); Young Hun Lee (Cheonan-si, KR); Youngseop Choi (Cheonan-si, KR); Seung Hoon Oh (Cheonan-si, KR); Jonghyeon Woo (Asan-si, KR); Jin Mo Jae (Geoje-si, KR)
Assignee: Semes Co., Ltd.
B08B7/0021H01L21/6719H01L21/67028H01L21/67051H01L21/67103
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Quick Facts
Patent No.
US 11,794,220
App. No.
16/924,633
Granted
Oct 24, 2023
Kind
B2
Abstract

An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.

Claims (34)

1. An apparatus for treating a substrate, the apparatus comprising:

a process chamber having a treatment space for treating the substrate;

a fluid supply unit configured to supply a fluid to the treatment space,

wherein the fluid supply unit includes:

a supply pipe connected to the treatment space, the supply pipe configured to supply the fluid to the treatment space;

a pump in the supply pipe, the pump configured to provide flow pressure to the fluid;

a vent line between the pump and the process chamber, the vent line configured to discharge pressure in the fluid to an outside of the apparatus;

a relief valve configured to open and close the vent line; and

a reservoir between the pump and a first branch point where the vent line branches from the supply pipe,

wherein the reservoir has a first cross-sectional area larger than a second cross-sectional area of a portion of the supply pipe located between the pump and the branch point.

2. The apparatus of claim 1 , wherein the reservoir has a pipe shape.

3. The apparatus of claim 1 , wherein the reservoir includes two ends, both ends of the reservoir having the second cross-sectional area.

4. The apparatus of claim 3 , wherein the first cross-sectional area of the reservoir increases from each end of the reservoir toward a middle point of the reservoir.

5. The apparatus of claim 3 , wherein the reservoir has an oblong shape.

6. The apparatus of claim 1 , wherein the fluid is supercritical state fluid.

7. The apparatus of claim 6 , wherein the fluid is Carbon Dioxide.

8. The apparatus of claim 1 , wherein the reservoir is configured to hold inertia fluid having inertia for suppressing pressure hunting of the fluid.

9. The apparatus of claim 8 , wherein the reservoir is configured to hold the inertia fluid such that the inertia fluid held in the reservoir remains in the reservoir during a flow of the fluid through the reservoir and after the fluid ceases to flow through the reservoir.

10. The apparatus of claim 1 , wherein the supply pipe includes an upper branched pipe configured to supply the fluid to a top portion of the process chamber and a lower branched pipe configured to supply the fluid to a bottom portion of the process chamber.

11. The apparatus of claim 10 , wherein the upper branched pipe and the lower branched pipe branch from the supply pipe at a second branch point between the first branch point and the process chamber.

12. The apparatus of claim 1 , wherein the pump is located upstream of the reservoir.

13. The apparatus of claim 1 , wherein the supply pipe is located between a fluid supply source and the process chamber.

14. A fluid supply unit comprising:

a supply pipe configured to convey a fluid;

a pump in the supply pipe configured to provide flow pressure to the fluid;

a vent line at a rear end of the pump configured to discharge pressure in the fluid to an outside of the fluid supply unit; and

a relief valve in the vent line, the relief valve configured to open and close the vent line,

wherein the supply pipe includes a flow-path enlarging pipe between the pump and a branch point where the vent line branches from the supply pipe, the flow-path enlarging pipe having a first cross-sectional area larger than a second cross-sectional area of the supply pipe configured to alleviate pressure variation in the supply pipe.

15. The fluid supply unit of claim 14 , wherein the fluid is supercritical state fluid.

16. The fluid supply unit of claim 15 , wherein the fluid is Carbon Dioxide.

17. The fluid supply unit of claim 14 , wherein the flow-path enlarging pipe is configured to hold an inertia fluid having inertia to suppress a pressure hunting phenomenon of the fluid.

18. The fluid supply unit of claim 14 , wherein the flow-path enlarging pipe includes two ends, both ends of the flow-path enlarging pipe having the second cross-sectional area.

19. The fluid supply unit of claim 18 , wherein the first cross-sectional area of the flow-path enlarging pipe increases from each end of the flow-path enlarging pipe toward a middle point of the flow-path enlarging pipe.

20. The fluid supply unit of claim 18 , wherein the flow-path enlarging pipe has an oblong shape.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 13, 2020
From: PARK, INHWANG; PARK, GUI SU; LEE, YOUNG HUN; CHOI, YOUNGSEOP; OH, SEUNG HOON; WOO, JONGHYEON; JAE, JIN MO
To: SEMES CO., LTD.
Reel/Frame 053188/0086 →
Priority Claims (1)
KR 10-2019-0083113 · Jul 10, 2019 · national
Continuity (1)
Related Publication 20210008606A1 · Jan 14, 2021
Cited By (1)
US 12,465,935