Semiconductor storage device
A semiconductor storage device includes: a substrate layer; and a stacked body that is provided on the substrate layer. The semiconductor storage device includes a columnar portion that includes a semiconductor body extending within the stacked body in a stacking direction. The semiconductor storage device includes: an insulating layer provided on the plurality of terrace portions; and a plurality of columnar bodies extending in a first direction and provided within the insulating layer. The semiconductor storage device includes slit portions that split the stacked body into a plurality of string units. Each of the columnar bodies adjacent to each of the slit portions has a core film, the semiconductor body, a tunnel insulating film, and a block insulating film formed in sequence from a shaft center side to an outer periphery side of the columnar body, and the columnar body does not have the charge storage portion.
1. A semiconductor storage device comprising:
a substrate layer;
a stacked body disposed on the substrate layer and including a plurality of electrode layers stacked in a first direction via insulators, the stacked body including stepped portions in which the plurality of electrode layers include a plurality of terrace portions forming level difference portions and the plurality of terrace portions aligned in a staircase pattern;
columnar portions, each columnar portion including a semiconductor body extending within the stacked body in the first direction, and a charge storage portion disposed between the semiconductor body and the electrode layers;
an insulating layer disposed on the plurality of terrace portions;
a plurality of columnar bodies extending in the first direction and disposed within the insulating layer; and
slit portions extending in the first direction and a second direction crossing the first direction, the slit portions disposed in the stacked body at predetermined intervals in a third direction crossing the first direction and the second direction, the slit portions splitting the stacked body into a plurality of string units, wherein
each of the columnar bodies adjacent to each of the slit portions has a core film, the semiconductor body, a tunnel insulating film, and a block insulating film formed in sequence from a shaft center side to an outer periphery side of the columnar bodies, without having the charge storage portion between the tunnel insulating film and the block insulating film,
without having the charge storage portion between each of the columnar bodies and each of the plurality of electrode layers.
2. The semiconductor storage device according to claim 1 , wherein
the columnar portions each include the core film, the semiconductor body, the tunnel insulating film, the charge storage portion, and the block insulating film formed in sequence from a shaft center side to an outer periphery side of the columnar portion.
3. The semiconductor storage device according to claim 1 , wherein
each of the string units includes a plurality of the columnar bodies in each of the terrace portions in the stacked body, and includes a plurality of the columnar portions in portions other than the terrace portions in the stacked body.
4. The semiconductor storage device according to claim 1 , wherein
the block insulating film has a first block film and a second block film.
5. The semiconductor storage device according to claim 4 , wherein the second block film is a metal oxide film higher in dielectric constant than a material of the first block film.
6. The semiconductor storage device according to claim 1 , wherein
the stacked body has a lower stacked body and an upper stacked body, the plurality of electrode layers and a plurality of insulators being alternately stacked in the lower stacked body and in the upper stacked body.
7. The semiconductor storage device according to claim 6 , wherein
the columnar portions each have a lower layer columnar portion disposed in the lower stacked body and an upper layer columnar portion disposed in the upper stacked body.
8. The semiconductor storage device according to claim 6 , wherein
the columnar bodies each have a lower layer columnar body disposed in the lower stacked body and an upper layer columnar body disposed in the upper stacked body.
9. The semiconductor storage device according to claim 6 , wherein the upper stacked body is directly above the lower stacked body.
10. The semiconductor storage device according to claim 1 , wherein the substrate includes a semiconductor layer.
11. The semiconductor storage device according to claim 1 , wherein the semiconductor storage device is a three dimensional memory device.
12. The semiconductor storage device according to claim 1 , wherein the electrode layers include at least one of tungsten or molybdenum.
13. The semiconductor storage device according to claim 1 , wherein the insulators include silicon oxide as a main component.
14. The semiconductor storage device according to claim 1 , wherein the columnar portions are arranged as part of a staggered arrangement or a square grid pattern.
15. The semiconductor storage device according to claim 1 , further comprising one or more bit lines connected to the plurality of columnar bodies.
16. The semiconductor storage device according to claim 1 , wherein the slit portions are filled with an insulating film.