Contaminant detection metrology system, lithographic apparatus, and methods thereof
A system ( 400 ) includes an illumination system ( 402 ), a detector ( 404 ), and a comparator ( 406 ). The illumination system includes a radiation source ( 408 ) and a spatial light modulator ( 410 ). The radiation source generates a beam of radiation ( 442 ). The spatial light modulator directs the beam toward a surface ( 436 ) of an object ( 428 ) and adjusts a spatial intensity distribution of the beam at the surface. The detector receives radiation ( 444 ) scattered at the surface and by a structure ( 434 ) near the surface. The detector generates a detection signal based on the received radiation. The comparator receives the detection signal, generates a first image based on the detection signal, and distinguishes between a spurious signal and a signal corresponding to a presence of a foreign particle on the surface based on the first image and the adjusted spatial intensity distribution.
1. A system comprising:
an illumination system comprising:
a radiation source configured to generate a beam of radiation;
a spatial light modulator configured to direct the beam toward a surface of an object and to adjust a spatial intensity distribution of the beam at the surface;
a detector configured to receive radiation scattered at the surface and by a structure near the surface and to generate a detection signal based on the received radiation; and
a comparator configured to:
analyze the detection signal;
determine a location of a defect on the surface based on the analyzing; and
distinguish between a spurious signal and a signal corresponding to the defect based on the analyzing and adjusting.
2. The system of claim 1 , wherein:
the spatial light modulator is further configured to adjust the spatial intensity distribution such that an illumination intensity of the beam at a first location on the surface is modulated according to a first pattern and an illumination intensity of the beam at a second location on the surface is modulated according to a second pattern different from the first pattern;
the second location is different from the first location; and
the analyzing comprises an analysis of the detection signal based on the modulating.
3. The system of claim 2 , wherein a first intensity state of the first pattern is associated with a first wavelength and a second intensity state of the first pattern is associated with a second wavelength different from the first wavelength.
4. The system of claim 2 , wherein an intensity state of the first pattern is associated with a first wavelength and an intensity state of the second pattern is associated with a second wavelength different from the first wavelength.
5. The system of claim 2 , wherein:
the spatial light modulator is further configured to adjust the spatial intensity distribution such that an illumination intensity of the beam at additional locations on the surface are modulated according to corresponding additional patterns;
the first, second, and each of the additional patterns are different from each other;
the distinguishing comprises associating the spurious signal with a pattern uncharacteristic of the given location.
6. The system of claim 2 , wherein:
the first and second patterns correspond to first and second periodic patterns;
a frequency and/or phase of the first periodic pattern is different from a frequency and/or phase of the second periodic pattern; and
the analysis comprises a frequency analysis.
7. The system of claim 6 , wherein:
the frequency analysis comprises a determination of a frequency and/or phase of illumination modulation used at a given location on the surface; and
the distinguishing comprises associating the spurious signal with a frequency and/or phase uncharacteristic of the given location.
8. The system of claim 6 , wherein:
a sequence of intensity states of the first periodic pattern comprises a variation relative to an orderly original sequence of the first periodic pattern; and/or
a sequence of intensity states of the second periodic pattern comprises a variation relative to an orderly original sequence of the second periodic pattern.
9. The system of claim 1 , wherein:
the spatial intensity distribution comprises a sequence of first, second, and third states of a periodic spatial intensity distribution based on the adjusting;
the second state is different from the first and third states;
the detection signal comprises a modulation based on the first, second and third states; and
the analyzing comprises an analysis of the modulation to determine at least a location on the surface exhibiting a diminished optical response to the adjusting.
10. The system of claim 9 , wherein the distinguishing comprises associating the spurious signal with the location on the surface exhibiting the diminished optical response to the adjusting.
11. The system of claim 9 , wherein:
the radiation scattered by the structure near the surface is generated from a transmitted portion of the beam through the surface; and
the transmitted portion comprises the periodic spatial intensity distribution with a diminished contrast.
12. The system of claim 1 , wherein:
the radiation source is further configured to adjust a wavelength of the beam;
the beam comprises first and second wavelengths that are different;
the detection signal comprises wavelength information of the received radiation based on the first and second wavelengths; and
the analyzing comprises an analysis of the wavelength information to determine at least a location on the surface exhibiting a difference in optical response to the adjusting the wavelength.
13. The system of claim 12 , wherein the distinguishing comprises associating the spurious signal with the location on the surface exhibiting the difference in optical response to the adjusting the wavelength.
14. The system of claim 12 , wherein the difference in optical response to the adjusting the wavelength comprises a difference between an attenuation of the received radiation based on the first wavelength and an attenuation of the received radiation based on the second wavelength.
15. The system of claim 1 , wherein:
the illumination system is configured to adjust a polarization of the beam and further comprises a polarizer configured to modify the polarization of the beam;
the beam comprises first and second polarizations that are different;
the detection signal comprises polarization information of the received radiation based on the first and second polarizations; and
the analyzing comprises an analysis of the polarization information to determine at least a location on the surface exhibiting a difference in optical response to the adjusting the polarization.
16. The system of claim 15 , wherein the distinguishing comprises associating the spurious signal with the location on the surface exhibiting the difference in optical response to the adjusting the polarization.
17. The system of claim 15 , wherein the difference in optical response to the adjusting the polarization comprises a difference between an intensity of the received radiation based on the first polarization and an intensity of the received radiation based on the second polarization.
18. The system of claim 1 , wherein:
the spatial light modulator is further configured to adjust the spatial intensity distribution so as to illuminate a portion of the surface at a non-zero incidence angle;
the detector is further configured to receive radiation along an optical path of radiation scattered at the portion of the surface; and
the system is configured to reduce a probability of a spurious signal event based on a difference between the optical path and an optical path corresponding to radiation scattered by the structure near the surface.
19. The system of claim 1 , wherein:
the spatial light modulator is further configured to temporally adjust the spatial intensity distribution such that an illumination intensity of the beam at a first location on the surface is modulated at a first frequency and an illumination intensity of the beam at a second location on the surface is modulated at a second frequency;
the second location is different from the first location;
the second frequency is different from the first frequency; and
the system is configured to enhance an optical resolution of detection based on a frequency analysis of the detection signal.
20. A lithographic apparatus comprising:
an illumination apparatus configured to illuminate a pattern of a patterning device;
a projection system configured to project an image of the pattern onto a substrate; and
a metrology system comprising:
an illumination system comprising:
a radiation source configured to generate a beam of radiation;
a spatial light modulator configured to direct the beam toward a surface of an object and to adjust a spatial intensity distribution of the beam at the surface;
a detector configured to receive radiation scattered at the surface and by a structure near the surface and to generate a detection signal based on the received radiation; and
a processor configured to:
analyze the detection signal;
determine a location of a defect on the surface based on the analyzing; and
distinguish between a spurious signal and a signal corresponding to the defect based on the analyzing and adjusting.