Phase modulators in alignment to decrease mark size
An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing Interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.
1. An alignment apparatus, comprising:
an illumination system configured to produce one or more illumination beams, direct the one or more illumination beams toward an alignment target and receive one or more diffraction beams reflected from the alignment target, wherein the one or more diffraction beams comprise at least one positive diffraction order or one negative diffraction order;
a self-referencing interferometer configured to receive the one or more diffraction beams, and generate diffraction sub-beams, wherein the diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped;
an optical element configured to generate interference intensity between overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches; and
a detection system configured to determine a position of the alignment target based on a light intensity measurement of the optical branches, wherein the measured light intensity is modulated by a phase modulator, and
wherein the phase modulator comprises:
a waveplate covering half of a pupil plane to change polarization states of the positive and negative diffraction orders,
a transmissive and a deflective region, wherein each region comprises two diametrically opposite quadrants, and the deflective region is wedge shaped with a varying thickness,
an internal grating to produce frequency modulation of an off-axis illumination beam by scanning the internal grating, or
a half-wave plate to produce frequency modulation of an off-axis illumination beam by rotating the half-wave plate.
2. The alignment apparatus of claim 1 , wherein the illumination system is further configured to produce off-axis illumination beams at first and second positions diametrically opposite to one another in a pupil plane.
3. The alignment apparatus of claim 2 , wherein the off-axis illumination beams are modulated by the phase modulator.
4. The alignment apparatus of claim 1 , wherein the phase modulator modulates the positive or negative diffraction order of the diffraction beams reflected from the alignment target.
5. The alignment apparatus of claim 1 , wherein the phase modulator modulates the optical branches produced by the optical element.
6. The alignment apparatus of claim 1 , wherein the phase modulator modulates an image of the alignment target at an input to the detection system.
7. The alignment apparatus of claim 1 , wherein the phase modulator is a piezoelectric mirror assembly that produces phase modulation by applying an electric signal on a piezoelectric material.
8. The alignment apparatus of claim 1 , wherein the phase modulator comprises a liquid crystal modulator, a photo-elastic modulator, an electro-optic modulator, a ferroelectric liquid crystal, a micro mirror array or a digitized spatial light modulator.
9. The alignment apparatus of claim 8 , wherein the liquid crystal modulator is a potassium dideuterium phosphate (KD*P) crystal.
10. The alignment apparatus of claim 1 , wherein the phase modulator is an acousto-optic modulator.
11. A lithographic apparatus comprising:
an illumination system configured to illuminate a patterning device;
a projection system configured to project an image of the patterning device onto a wafer; and
an alignment system comprising:
an illumination system configured to produce one or more illumination beams, direct the one or more illumination beams toward an alignment target and receive one or more diffraction beams reflected from the alignment target, wherein the one or more diffraction beams comprise at least one positive diffraction order or one negative diffraction order;
a self-referencing interferometer configured to receive the one or more diffraction beams, and generate diffraction sub-beams, wherein the diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped;
an optical element configured to generate interference intensity between overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches; and
a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is modulated by a phase modulator, and
wherein the phase modulator comprises:
a waveplate covering half of a pupil plane to change polarization states of the positive and negative diffraction orders,
a transmissive and a deflective region, wherein each region comprises two diametrically opposite quadrants, and the deflective region is wedge shaped with a varying thickness,
an internal grating to produce frequency modulation of an off-axis illumination beam by scanning the internal grating, or
a half-wave plate to produce frequency modulation of an off-axis illumination beam by rotating the half-wave plate.
12. The lithographic apparatus of claim 11 , wherein the illumination system is further configured to produce off-axis illumination beams at first and second positions diametrically opposite to one another in the pupil plane.
13. The lithographic apparatus of claim 12 , wherein the off-axis illumination beams are modulated by the phase modulator.
14. The lithographic apparatus of claim 11 , wherein the phase modulator modulates the positive or negative diffraction order of the diffraction beams reflected from the alignment target.
15. The lithographic apparatus of claim 11 , wherein the phase modulator modulates the optical branches produced by the optical element.
16. The lithographic apparatus of claim 11 , wherein the phase modulator modulates an image of the alignment target at an input to the detection system.
17. The lithographic apparatus of claim 11 , wherein the phase modulator is a piezoelectric mirror assembly that produces phase modulation by applying an electric signal on a piezoelectric material.
18. The lithographic apparatus of claim 11 , wherein the phase modulator comprises a liquid crystal modulator, a photo-elastic modulator, an electro-optic modulator, a ferroelectric liquid crystal, a micro mirror array or a digitized spatial light modulator.
19. The lithographic apparatus of claim 18 , wherein the liquid crystal modulator is a potassium dideuterium phosphate (KD*P) crystal.
20. The lithographic apparatus of claim 11 , wherein the phase modulator is an acousto-optic modulator.