Meta-surface optical element and method of manufacturing the same

1. A meta-surface optical device comprising:

a transparent substrate;

a meta-surface comprising a plurality of first columnar patterns provided on a first region of an upper surface of the transparent substrate; and

a light control member comprising a plurality of second columnar patterns provided on a second region of the upper surface of the transparent substrate and configured to prevent light transmission,

wherein the plurality of first columnar patterns have a same height as the plurality of second columnar patterns and the plurality of second columnar patterns are configured to surround an entirety of the first region in which the meta-surface is provided, and

wherein the plurality of first columnar patterns and the plurality of second columnar patterns are made of a dielectric material.

2. The meta-surface optical device of claim 1 , wherein the plurality of second columnar patterns and the plurality of first columnar patterns comprise a same material.

3. The meta-surface optical device of claim 1 , wherein the plurality of second columnar patterns uniformly distribute on an entirety of the second region.

4. The meta-surface optical device of claim 1 , wherein the plurality of first columnar patterns are meta-patterns having a dimension different from the plurality of second columnar patterns.

5. The meta-surface optical device of claim 1 , wherein the plurality of second columnar patterns are configured to reflect light incident thereon.

6. The meta-surface optical device of claim 1 , wherein the plurality of second columnar patterns are configured to absorb light incident thereon.

7. The meta-surface optical device of claim 1 , wherein the plurality of second columnar patterns comprise alignment key patterns and

wherein the light control member further comprises light absorption layer configured to cover the alignment key patterns.

8. The meta-surface optical device of claim 1 , wherein the plurality of second columnar patterns comprise alignment key patterns and

wherein the light control member further comprises light reflection layer configured to cover the alignment key patterns.

9. The meta-surface optical device of claim 1 , further comprising a gap between the meta-surface and the light control member, wherein a width of the gap is less than or equal to 5 μm.

10. The meta-surface optical device of claim 1 , wherein the meta-surface and the light control member overlap with each other, and a width of overlap between the meta-surface and the light control member is less than or equal to 9 μm.

11. A method of manufacturing a meta-surface optical device, the method comprising:

forming a material layer on an upper surface of a transparent substrate; and

patterning the material layer,

wherein the patterning the material layer comprises:

forming a meta-surface comprising a plurality of first columnar patterns on a first region of the upper surface of the transparent substrate; and

forming a light control member comprising a plurality of second columnar patterns on a second region of the one upper surface of the transparent substrate,

wherein the plurality of first columnar patterns have a same height as the plurality of second columnar patterns and the plurality of second columnar patterns are configured to surround an entirety of the first region in which the meta-surface is provided,

wherein the plurality of first columnar patterns and the plurality of second columnar patterns are made of a dielectric material, and

wherein the meta-surface and the light control member are formed in a same operation.

12. The method of claim 11 , wherein the plurality of second columnar patterns are configured to reflect light incident thereon.

13. The method of claim 11 , wherein the plurality of second columnar patterns and the plurality of first columnar patterns comprise a same material.

14. The method of claim 11 , wherein the light control member comprises a plurality of second columnar patterns uniformly distributed on an entirety of the second region.

15. The method of claim 11 ,

wherein the plurality of first columnar patterns are meta-patterns having a dimension different from the plurality of second columnar patterns.

16. The method of claim 11 , further comprising a gap between the meta-surface and the light control member, wherein a width of the gap is less than or equal to 5 μm.

17. The method of claim 11 , wherein the meta-surface and the light control member overlap with each other, and a width of overlap between the meta-surface and the light control member is less than or equal to 9 μm.

18. A method of manufacturing a meta-surface optical device, the method comprising:

forming a meta-surface on a light incident side of a substrate, the meta-surface comprising a plurality of first columnar patterns provided on a first region of an upper surface of the substrate; and

forming a light control member surrounding the meta-surface on the upper surface of the substrate, the light control member comprising a plurality of second columnar patterns,

wherein the meta-surface is configured to perform a first operation with respect to the light incident on an upper surface of the meta-surface,

wherein the light control member is configured to perform a second operation, different from the first operation, with respect to light incident on a surface of the light control member,

wherein the plurality of second columnar patterns are configured to surround an entirety of the first region in which the meta-surface is provided,

wherein the plurality of first columnar patterns and the plurality of second columnar patterns are made of a dielectric material,

wherein the second operation is absorptive operation, and

wherein a gap configured to remove a zero-order effect is formed between the meta-surface and the light control member and a width of the gap is less than or equal to 5 μm.