Connection structure and method of forming the same

1. A connection structure comprising:

a first passivation layer comprises an opening;

a first conductive pattern that penetrates the first passivation layer and protrudes upwardly from the first passivation layer;

a second passivation layer on the first passivation layer and covering the first conductive pattern;

a second conductive pattern on the second passivation layer and electrically connected to the first conductive pattern;

a third passivation layer on the second passivation layer and covering the second conductive pattern;

a third conductive pattern on the third passivation layer and electrically connected to the second conductive pattern; and

an external terminal in the opening and electrically connected to the first conductive pattern,

wherein the first conductive pattern is thicker than the second conductive pattern, and the second conductive pattern is thicker than the third conductive pattern,

wherein a width of the first conductive pattern is greater than a width of the second conductive pattern, and the width of the second conductive pattern is equal to or greater than a width of the third conductive pattern, and

wherein a pitch between patterns of the first conductive pattern is greater than a pitch between patterns of the second conductive pattern, and the pitch between the patterns of the second conductive pattern is equal to or greater than a pitch between patterns of the third conductive pattern.

2. The connection structure as claimed in claim 1 , wherein the second passivation layer is the thickest among the first passivation layer, the second passivation layer, and the third passivation layer.

3. The connection structure as claimed in claim 1 , wherein the first conductive pattern comprises:

a head segment that horizontally extends on the first passivation layer; and

a tail segment that vertically penetrates the first passivation layer and is connected with the external terminal,

wherein a bottom surface of the head segment is on a top surface of the first passivation layer.

4. The connection structure as claimed in claim 3 , wherein the head segment of the first conductive pattern has a thickness larger than a thickness of a redistribution layer segment, of the second conductive pattern, which horizontally extends on the second passivation layer.

5. The connection structure of claim 1 , further comprising an additional pattern on at least one from among the first passivation layer and the second passivation layer.

6. The connection structure of claim 5 , wherein the additional pattern is formed between the patterns of the first conductive pattern or between the patterns of the second conductive pattern.

7. The connection structure of claim 6 , wherein the additional pattern is one of:

a dummy pattern electrically isolated on the at least one from among the first passivation layer and the second passivation layer; and

a pattern either for electrical power delivery or for electrical ground.

8. The connection structure of claim 1 , wherein the second conductive pattern comprises:

a redistribution layer segment that horizontally extends on the second passivation layer; and

a via segment that vertically penetrates the second passivation layer and is connected with the first conductive pattern.

9. The connection structure of claim 1 , further comprising a first seed pattern on a bottom surface of the first conductive pattern, the bottom surface of the first conductive pattern facing the external terminal.

10. The connection structure of claim 9 , wherein the first seed pattern is not provided at an interface between the first conductive pattern and the external terminal.

11. The connection structure of claim 1 , further comprising a second seed pattern on a bottom surface of the second conductive pattern, the bottom surface of the second conductive pattern facing the first conductive pattern.

12. A semiconductor package, comprising:

a connection structure;

a semiconductor chip mounted on the connection structure;

a molding layer covering the semiconductor chip on the connection structure; and

external terminals on a bottom surface of the connection structure,

wherein the connection structure comprises:

a first passivation layer having an opening;

a first conductive pattern on the first passivation layer;

a second passivation layer on the first passivation layer and covering the first conductive pattern;

a second conductive pattern on the second passivation layer and electrically connected to the first conductive pattern;

a third passivation layer on the second passivation layer and covering the second conductive pattern; and

a third conductive pattern on the third passivation layer and electrically connected to the second conductive pattern,

wherein the first conductive pattern comprises: a head segment that horizontally extends on the first passivation layer; and a tail segment that vertically penetrates the first passivation layer and is connected with one of the external terminals, a bottom surface of the head segment is on a top surface of the first passivation layer,

wherein the semiconductor chip is connected with the connection structure through chip terminals between the third conductive pattern and chip pads which is disposed on a bottom surface of the semiconductor chip, and

wherein the first conductive pattern is the thickest among the first conductive pattern, the second conductive pattern, and the third conductive pattern, and

wherein a width of the first conductive pattern is greater than a width of the second conductive pattern, and the width of the second conductive pattern is equal to or greater than a width of the third conductive pattern.

13. The semiconductor package as claimed in claim 12 , wherein the second passivation layer is the thickest among the first passivation layer, the second passivation layer, and the third passivation layer.

14. The semiconductor package as claimed in claim 12 , wherein the head segment of the first conductive pattern has a thickness larger than a thickness of a redistribution layer segment, of the second conductive pattern, which horizontally extends on the second passivation layer.

15. The semiconductor package of claim 12 , further comprising an additional pattern on at least one from among the first passivation layer and the second passivation layer.

16. The semiconductor package of claim 15 , wherein at least one from among the first conductive pattern and the second conductive pattern is provided in plural, and

wherein the additional pattern is formed between the plurality of first conductive patterns or between the plurality of second conductive patterns.

17. The semiconductor package of claim 15 , wherein the additional pattern is one of:

a dummy pattern electrically isolated on the at least one from among the first passivation layer and the second passivation layer; and

a pattern either for electrical power delivery or for electrical ground.

18. The semiconductor package of claim 15 , wherein a pitch between patterns of the first conductive pattern is greater than a pitch between patterns of the second conductive pattern, and the pitch between the patterns of the second conductive pattern is equal to or greater than a pitch between patterns of the third conductive pattern.

19. A semiconductor package, comprising:

a connection structure;

a semiconductor chip mounted on the connection structure;

a molding layer covering the semiconductor chip on the connection structure; and

external terminals on a bottom surface of the connection structure,

wherein the connection structure comprises:

a first passivation layer having an opening;

a first conductive pattern on the first passivation layer;

a second passivation layer on the first passivation layer and covering the first conductive pattern;

a second conductive pattern on the second passivation layer and electrically connected to the first conductive pattern;

a third passivation layer on the second passivation layer and covering the second conductive pattern; and

a third conductive pattern on the third passivation layer and electrically connected to the second conductive pattern,

wherein the first conductive pattern comprises: a head segment that horizontally extends on the first passivation layer; and a tail segment that vertically penetrates the first passivation layer and is connected with one of the external terminals, a bottom surface of the head segment is on a top surface of the first passivation layer,

wherein the semiconductor chip is connected with the connection structure through chip terminals between the third conductive pattern and chip pads, the chip pads disposed on a bottom surface of the semiconductor chip, and

wherein the first conductive pattern is the thickest among the first conductive pattern, the second conductive pattern, and the third conductive pattern, and

wherein a pitch between patterns of the first conductive pattern is greater than a pitch between patterns of the second conductive pattern, and the pitch between the patterns of the second conductive pattern is equal to or greater than a pitch between patterns of the third conductive pattern.

20. The semiconductor package of claim 19 , further comprising an additional pattern on at least one from among the first passivation layer and the second passivation layer.