In situ threshold voltage determination of a semiconductor device

1. A method for in situ threshold voltage determination of a device comprising:

sourcing a current to a first terminal of the device;

driving an insulated gate terminal of the device with a plurality of gate levels in response to a device voltage indicating an inactive condition of the device, wherein each gate level comprises a respective gate voltage being different than the respective gate voltage of a temporally adjacent and preceding gate level;

measuring the device voltage between the first terminal and a second terminal of the device, the device configured to variably conduct a device current thereinbetween in response to the respective gate voltage exceeding a threshold voltage of the device;

storing the respective gate voltage in response to the device voltage indicating an active condition of the device; and

estimating a change in the threshold voltage of the device by comparing the stored gate voltage with a previously stored gate voltage.

2. The method of claim 1 wherein a temperature difference between a first measured temperature of the stored gate voltage and a second measured temperature of the previously stored gate voltage is less than a temperature threshold.

3. The method of claim 1 wherein the plurality of gate levels comprises a step function.

4. The method of claim 1 wherein the plurality of gate levels comprises gate pulses.

5. The method of claim 4 further comprising limiting a duty cycle of each of the plurality of gate pulses.

6. The method of claim 1 wherein the respective gate voltage of each gate level increases from the respective gate voltage of the temporally adjacent and preceding gate level.

7. The method of claim 1 further comprising comparing the change in the threshold voltage to a voltage limit to determine an incipient fault condition of the device.

8. The method of claim 1 further comprising charging the first terminal to a precharged voltage with the current and determining the inactive condition in response to the device voltage exceeding a voltage limit.

9. A method for in situ threshold voltage determination of a transistor comprising:

sourcing a current to a first terminal of the transistor;

driving a gate terminal of the transistor with a plurality of gate levels, each gate level comprising one of a plurality of different gate voltages;

measuring a transistor voltage between the first terminal and a second terminal of the transistor during each gate level;

storing the respective gate voltage in response to the transistor voltage transitioning past a voltage limit; and

estimating a temperature dependent threshold voltage of the transistor for a first measured temperature measured during the storing of the stored gate voltage from a previously stored gate voltage and a second measured temperature.

10. The method of claim 9 wherein the transistor comprises an Insulated Gate Bipolar Transistor.

11. The method of claim 9 wherein the transistor comprises a Field Effect Transistor.

12. The method of claim 9 wherein the plurality of gate levels comprises a step function.

13. The method of claim 9 wherein each of the plurality of gate levels comprises a gate pulse and the sequentially increasing gate voltage of each gate pulse is determined by incrementing an analog voltage with a Digital to Analog Converter to modulate an output of an amplifier, wherein the output generates each gate pulse.

14. The method of claim 9 wherein the transistor comprises a low-side transistor of a half-bridge inverter.

15. The method of claim 9 wherein the transistor comprises a high-side transistor of a half-bridge inverter.

16. A method for in situ aging determination of a half bridge inverter comprising:

sourcing a current to a first terminal of a first transistor of the half bridge inverter;

driving a gate terminal of the first transistor with a plurality of gate levels, each gate level comprising one of a plurality of sequentially increasing gate voltages, the half bridge inventor comprising the first transistor and a second transistor, wherein the first transistor connects between the first terminal and a second terminal, and a second transistor connects in series with the first transistor;

measuring a transistor voltage between the first terminal and the second terminal during each gate level;

storing the respective gate voltage in response to the transistor voltage transitioning past a voltage limit;

measuring a temperature to generate a temperature measurement; and

estimating a temperature dependent threshold voltage of the first transistor for a first measured temperature measured during the storing of the stored gate voltage from a previously stored gate voltage and a second measured temperature.

17. The method of claim 16 further comprising estimating a change in the temperature dependent threshold voltage of the first transistor between the stored gate voltage and the previously stored gate voltage normalized for a difference between the first measured temperature and the second measured temperature and performing a system level action in response thereto.

18. The method of claim 16 wherein the current value of the current is calibrated to enable the estimation of the threshold voltage to nullify changes to the threshold voltage due to a time-dependent variation in the current.

19. The method of claim 16 wherein the temperature varies in proportion to a transistor temperature of the first transistor.

20. The method of claim 16 further comprising turning off the second transistor prior to driving the gate terminal of the first transistor with the plurality of gate levels.