System, method and apparatus for non-mechanical optical and photonic beam steering

1. A system, comprising:

an electro-optic (EO) substrate layer comprising an EO active material, the EO active material comprising a plurality of thin EO active elements alternating with a plurality of thick EO active elements;

a high-side electrode layer comprising a plurality of discrete electrodes, each of the plurality of discrete electrodes being associated with one of the plurality of thick EO active elements and positioned on a first side of the EO substrate layer, the plurality of discrete electrodes being configured to apply a modulo 2πn beam steering to the EO active elements;

a low-side electrode layer positioned on a second side of the EO substrate layer; and

an insulator layer operationally coupled to the EO substrate layer, and at least partially positioned between each of the plurality of thick EO active elements.

2. The system of claim 1 , wherein the high-side electrode layer further comprises a second plurality of discrete electrodes, each of the second plurality of discrete electrodes being associated with one of the plurality of thin EO active elements.

3. The system of claim 1 , wherein each of the plurality of thick EO active elements comprises an identical thickness.

4. The system of claim 1 , wherein each of the plurality of thin EO active elements comprises an identical thickness.

5. The system of claim 1 , wherein each of the plurality of thin EO active elements comprises a thickness of one wavelength corresponding to a target electro-magnetic (EM) frequency.

6. The system of claim 5 , wherein each of the plurality of thick EO active elements comprises a thickness of two wavelengths corresponding to the target EM frequency.

7. The system of claim 1 , further comprising:

a second EO substrate layer comprising a second plurality of thin EO active elements alternating with a second plurality of thick EO active elements,

wherein the EO substrate layer and the second EO substrate layer are aligned such that the plurality of thick EO active elements is not aligned with the second plurality of thick EO active elements.

8. The system of claim 7 , further comprising a second high-side electrode layer comprising a second plurality of discrete electrodes, each of the second plurality of discrete electrodes being associated with one of the second plurality of thick EO active elements, and positioned on a first side of the second EO substrate layer.

9. The system of claim 8 , wherein the EO substrate layer and the second EO substrate layer share the low-side electrode layer.

10. The system of claim 1 , wherein:

each of the plurality of discrete electrodes comprises a resistive electrode; and

the plurality of discrete electrodes are further configured to apply the modulo 2πn beam steering to the EO active elements according to a half-wave voltage profile.

11. The system of claim 1 , further comprising:

a plurality of the EO substrate layers, each of the plurality of EO substrate layers having a corresponding high-side electrode layer,

wherein the plurality of EO substrate layers are aligned such that a perpendicular line through the plurality of the EO substrate layers intersects only one of the plurality of thick EO active elements of the plurality of the EO substrate layers.

12. The system of claim 1 , further comprising:

a plurality of the EO substrate layers,

wherein the plurality of EO substrate layers are arranged such that a perpendicular line through the plurality of the EO substrate layers passes through an equal thickness of EO active elements of the plurality of the EO substrate layers.

13. The system of claim 12 , wherein each high-side electrode layer further comprises a second plurality of discrete electrodes, each of the second plurality of discrete electrodes being associated with one of the plurality of thin EO active elements of the plurality of EO substrate layers.

14. The system of claim 13 , wherein:

the EO active elements comprise each of the plurality of thin EO active elements; and

each of the plurality of thick EO active elements has an associated discrete electrode.

15. The system of claim 1 , further comprising:

a plurality of the EO substrate layers,

wherein the plurality of EO substrate layers are arranged such that a perpendicular line through the plurality of the EO substrate layers passes through a configured thickness of the EO active elements of the plurality of the EO substrate layers, the configured thickness comprising a thickness selected to apply a progressive phase shift to an incident electro-magnetic (EM) beam.

16. The system of claim 15 , wherein each high-side electrode layer further comprises a second plurality of discrete electrodes, each of the second plurality of discrete electrodes being associated with one of the plurality of thin EO active elements of the plurality of EO substrate layers.

17. The system of claim 16 , wherein:

the EO active elements comprise each of the plurality of thin EO active elements; and

each of the plurality of thick EO active elements has an associated discrete electrode.

18. The system of claim 17 , wherein each of the plurality of thin EO active elements comprises an equal thickness.

19. The system of claim 17 , wherein each of the plurality of thick EO active elements comprises an equal thickness.

20. The system of claim 17 , wherein:

each of the plurality of thin EO active elements comprises a thickness of x wavelengths corresponding to a target electro-magnetic (EM) frequency;

each of the plurality of thick EO active elements comprises a thickness of y wavelengths corresponding to the target EM frequency;

each of x and y comprise integer values; and

the y value for each of the plurality of thick EO active elements is at least one greater than the x value for an adjacent one of the plurality of thin EO active elements.

21. The system of claim 20 , wherein x comprises one (1).

22. The system of claim 21 , wherein y comprises two (2).

23. The system of claim 20 , wherein:

a first one of the plurality of thick EO active elements comprises a y value that is smaller than an x value for a first one of the plurality of thin EO active elements; and

the first one of the plurality of thick EO active elements is not adjacent to the first one of the plurality of thin EO active elements.

24. The system of claim 23 , wherein the one of the plurality of thick EO active elements is not in a same one of the plurality of EO substrate layers as the first one of the plurality of thin EO active elements.

25. A system, comprising:

an electro-optic (EO) substrate layer comprising:

an EO active material comprising a plurality of EO active elements,

wherein adjacent ones of the plurality of EO active elements have a thickness value varying by at least one wavelength corresponding to a target electro-magnetic (EM) frequency;

a high-side electrode layer comprising a plurality of discrete electrodes, each of the plurality of discrete electrodes being associated with one of the plurality of EO active elements and positioned on a first side of the EO substrate layer, the plurality of discrete electrodes being configured to apply a modulo 2πn beam steering to the EO active elements;

a low-side electrode layer positioned on a second side of the EO substrate layer; and

an insulator layer operationally coupled to the EO substrate layer, and at least partially positioned between geometric gaps of the plurality of EO active elements.

26. The system of claim 25 , wherein:

the plurality of discrete electrodes comprises resistive electrodes; and

the plurality of discrete electrodes are further configured to apply the modulo 2πn beam steering to the EO active elements according to a half-wave voltage profile.

27. The system of claim 25 , further comprising:

a plurality of the EO substrate layers,

wherein two adjacent ones of the plurality of the EO substrate layers share the low-side electrode layer.

28. The system of claim 27 , wherein a terminating one of the plurality of EO substrate layers is associated with a reflective low-side electrode layer.

29. The system of claim 25 , wherein the plurality of EO substrate layers are arranged such that a perpendicular line through the plurality of the EO substrate layers passes through a configured thickness of the EO active elements of the plurality of the EO substrate layers, the configured thickness comprising a thickness selected to apply a progressive phase shift to an incident EM beam.