Display apparatus and method of manufacturing the same
A display apparatus including a substrate including a display area and a sensor area, the sensor area including a transmission portion that transmits light, a plurality of first display devices arranged in the display area, a display device group including a plurality of second display devices, the display device group being arranged in the sensor area, and a passivation layer covering the display device group and having a first hole corresponding to the transmission portion.
1. A method of manufacturing a display apparatus comprising a plurality of first display devices, a display device group comprising a plurality of second display devices, and a transmission portion that transmits light, the method comprising:
forming a plurality of pixel electrodes on a substrate comprising a display area in which the plurality of first display devices are arranged and a sensor area in which the display device group and the transmission portion are arranged;
forming a pixel defining layer on the plurality of pixel electrodes, the pixel defining layer having an opening exposing at least a portion of each of the plurality of pixel electrodes and a hole corresponding to the transmission portion;
forming a sacrificial layer on the pixel defining layer;
patterning the sacrificial layer such that at least some of the pixel electrodes of the display device group are exposed and the hole is covered;
forming a passivation layer on the patterned sacrificial layer; and
forming in the passivation layer a first hole corresponding to the transmission portion by removing the patterned sacrificial layer,
wherein the passivation layer covers the display device group and has first patterns spaced from each other with the first hole between the first patterns.
2. The method of claim 1 , wherein the patterning of the sacrificial layer comprises:
forming a photoresist layer on the sacrificial layer; and
patterning the photoresist layer to correspond to the transmission portion,
wherein the patterned sacrificial layer is formed by using a patterned photoresist layer such that a portion of the sacrificial layer corresponding to the transmission portion remains.
3. The method of claim 2 , wherein the forming of the patterned sacrificial layer comprises forming an undercut cross-section of the patterned sacrificial layer and the patterned photoresist layer.
4. The method of claim 1 , wherein the forming of the passivation layer on the patterned sacrificial layer comprises:
forming an emission layer on the plurality of pixel electrodes and the patterned sacrificial layer;
forming an opposite electrode on emission layer; and
forming the passivation layer on the opposite electrode.
5. The method of claim 1 , further comprising, before the forming of the plurality of pixel electrodes, forming a lower hole by removing a portion of at least one of a plurality of insulating layers formed on the substrate, the portion corresponding to the transmission portion.
6. The method of claim 1 , further comprising forming, on the passivation layer, an encapsulation layer comprising an inorganic encapsulation layer and an organic encapsulation layer,
wherein the encapsulation layer covers the display area and the sensor area.
7. The method of claim 1 , further comprising arranging, on the passivation layer, an encapsulation substrate opposite the substrate,
wherein the encapsulation substrate covers the display area and the sensor area.
8. The method of claim 7 , further comprising forming a filling material filled between the passivation layer and the encapsulation substrate,
wherein the filling material has a refractive index between a refractive index of the passivation layer and a refractive index of the encapsulation substrate.