IP Library › Granted Patent US 11,840,466
Granted Patent B2
US 11,840,466 · App. 17/449,364 · Granted Dec 12, 2023

Dispensing system with bypass

Inventors: Roger A Benham (San Diego, CA); Daniel O. Benham (San Diego, CA); Blaine A. Benham (San Diego, CA)
C02F1/685C02F1/008G05D7/0688C02F2209/005C02F2209/40C02F2301/043
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Quick Facts
Patent No.
US 11,840,466
App. No.
17/449,364
Granted
Dec 12, 2023
Kind
B2
Abstract

A chemical injection system connects a main water flow to a source of chemicals to a bypass chemical dispenser in a water treatment system. The chemical injection system includes a supply pipe, a return pipe having a bypass chemical dispenser located along a length thereof, and a controlled pumping system including a compounding-rate pump controller connected to a pumping loop.

Claims (9)

1. A chemical injection system connecting a main water flow to a source of chemicals to a bypass chemical dispenser in a water treatment system, the chemical injection system comprising:

a supply pipe bringing water from a pipeline of the main water flow to a pumping loop;

a return pipe connected to the pumping loop for returning water from the pumping loop to the pipeline, the return pipe having a bypass chemical dispenser located along a length thereof; and

a controlled pumping system connected between the supply pipe and the return pipe, the control pumping system including a compounding-rate pump controller connected to the pumping loop, the pumping loop is comprised of a feed pump, a bypass circuit, in which a flow rate in the bypass circuit is controlled by a bypass valve, and a feed control needle valve, and the compounding-rate pump controller is a programable electronic controller with self-compounding feed rate adjustment.

2. The chemical injection system according to claim 1 , wherein the feed pump includes a solenoid pump, a centrifugal pump, or a positive displacement pump.

3. The chemical injection system according to claim 1 , further including a first flow circuit between the bypass chemical dispenser and a remote water pipeline in which the main water flow flows and a second flow circuit appurtenant to the first flow circuit, wherein a pump is installed within the second flow circuit.

4. The chemical injection system according to claim 3 , wherein the pumping loop includes a feed pump, a bypass circuit, in which a flow rate in the bypass circuit is controlled by a bypass valve, and a feed control needle valve, and the feed control needle valve is installed after the feed pump and within the second flow circuit to change flow rate within the first flow circuit.

5. The chemical injection system according to claim 1 , further including a flow sensor that is used to electronically regulate a pumping rate of the pumping loop.

6. The chemical injection system according to claim 1 , wherein the compounding-rate pump controller is configured to increase a pumping rate of the feed pump of the pumping loop to a preselected percentage rate increase over a preselected period of time.

Continuity (2)
Provisional Application 63084729 · Sep 29, 2020
Related Publication 20220098066A1 · Mar 31, 2022