Thermally conductive composition and methods and devices in which said composition is used
A highly thermally conductive composition is provided, such composition comprising: (A) An organopolysiloxane composition; (B) a filler treating agent; (C) a thermal stabilizer; and (D) thermally conductive filler mixture, comprising: (D-1) a small-particulate thermally conductive filler having a mean size of up to 3 μm, (D-2) spherical aluminum nitride having a mean size of from 50 to 150 μm, (D-3) boron nitride having a mean size of from 20 to 200 μm.
1. A composition comprising:
(A) An organopolysiloxane composition that comprises;
an organopolysiloxane having a general formula (I)
R 1 3 Si—(R 1 R 2 SiO) a (R 1 2 SiO) b —R 3 —SiR 1 3 (I)
wherein each R 1 is independently a C1-C6 alkyl group, each R 2 is an aryl group, each R 3 is selected from an oxygen atom or a divalent hydrocarbon group, subscript a is 0 or has an average value of at least 1, subscript b has an average value of at least 1;
(B) a filler treating agent;
(C) a thermal stabilizer; and
(D) thermally conductive filler, comprising:
(D-1) a small-particulate thermally conductive filler having a mean size of up to 3 μm;
(D-2) spherical aluminum nitride having a mean size of from 50 to 150 μm;
(D-3) boron nitride having a mean size of from 20 to 200 μm.
2. The composition according to claim 1 , wherein component (A) is curable.
3. The composition according to claim 2 , wherein component (A) is a combination of organopolysiloxanes comprising:
(A′1) An alkenyl-containing organopolysiloxane having general formulae
R 1 (3-p) R 4 p SiO(R 1 2 SiO) c (R 1 R 2 SiO) d (R 1 R 4 SiO) e SiR 1 (3-q) R 4 q , (II)
R 1 3 SiO(R 1 2 SiO) f (R 1 R 2 SiO) g (R 1 R 4 SiO) h SiR 1 3 , (III)
or
a combination thereof,
where each R 1 is independently an alkyl group, R 2 is independently an aryl group, R 4 is independently an alkenyl group, subscript d and subscript e may be 0 or a positive number, subscripts p and q are independently 0, 1, or 2, provided that p, q, and e are not all 0 at the same time,; and
(A′-2) organohydrogenpolysiloxane comprising a compound of the formulae
R 3 SiO(R 2 SiO) i (RHSiO) j SiR 3 (IV),
R 2 HSiO(R 2 SiO) k (RHSiO) l SiR 2 H (V),
or a combination thereof,
where each R is independently independently a monovalent organic group, subscript i has an average value ranging from 0 to 2000, subscript j has an average value ranging from 2 to 2000, subscript k has an average value ranging from 0 to 2000, and subscript 1 has an average value ranging from 0 to 2000 , wherein the mole ratio of the alkenyl group in component (A′1) and the silicon-bonded hydrogen atom in component (A′2) is in the range of 10:1 to 1:10.
4. The composition according to claim 1 , wherein component (A) is cured.
5. The composition according to claim 1 , wherein component (B) comprises a silicone and/or a silane.
6. The composition according to claim 5 , wherein component (B) is selected from the group consisting of alkyl trialkoxysilane and alkenyl end-capped trialkoxysiloxy-terminated dimethylpolysiloxane.
7. The composition according to claim 6 , wherein component (B) is selected from n-decyltrimethoxysilane and dimethylvinylsiloxy- and trimethoxysiloxy-terminated dimethylpolysiloxane.
8. The composition according to claim 1 , wherein component (C) is phthalocyanine or metal phthalocyanine.
9. The composition of claim 1 , further comprising an additional ingredient selected from (G) a spacer, (H) an antioxidant stabilizer, (I) a pigment, (J) a vehicle, or (K) a wetting agent, and a combination thereof.
10. The composition of claim 2 in which component (A) is a curable composition, further comprising (E) curing catalyst and/or (F) curing inhibitor.
11. A method comprising interposing the composition of claim 1 along a thermal path between a heat source and a heat dissipator.
12. The method of claim 11 , where the heat source comprises an (opto)electronic component.
13. A device comprising:
a) a heat source,
b) a composition according to claim 1 , and
c) a heat dissipator;
where the composition is positioned between the heat source and the heat dissipator along a thermal path extending from a surface of the heat source to a surface of the heat dissipator.