PVD directional deposition for encapsulation
Embodiments described herein relate to encapsulated nanostructured optical devices and methods of encapsulating gratings of such devices by asymmetric selective physical vapor deposition (PVD). In some embodiments, a method for encapsulating optical device gratings includes a first PVD process and a second PVD process that may be carried out simultaneously or sequentially. The first PVD process may provide a first stream of material at a first angle non-perpendicular to a substrate of the grating. The second PVD process may provide a second stream of material at a second angle non-perpendicular to the substrate of the grating. The combination of the first PVD process and the second PVD process forms an encapsulation layer over the grating and one or more air gaps between adjacent fins of the grating.
1. A method for encapsulating gratings of a waveguide combiner by asymmetric selective physical vapor deposition (PVD), comprising:
providing a first stream of a first material from a first PVD source towards the waveguide combiner, the waveguide combiner includes an input coupling grating and an output coupling grating, the input coupling grating has at least a first fin structure and a second fin structure, the first stream provided in a first direction to one or more surfaces of a first fin structure and at a first non-perpendicular angle relative to the waveguide combiner;
depositing the first material on the one or more surfaces of the first fin structure, the deposition of the first material forming a first protrusion extending laterally from the first fin structure;
providing a second stream of a second material from a second PVD source towards one or more surfaces of the second fin structure of the input coupling grating, the second stream provided in a second direction and at a second non-perpendicular angle relative to the waveguide combiner; and
depositing the second material on the one or more surfaces of the second fin structure, the deposition of the second material forming a second protrusion extending laterally from the second fin structure, the second protrusion converging with the first protrusion to form an encapsulation layer over the first and second fin structures of the input coupling grating.
2. The method of claim 1 , wherein the encapsulation layer partially defines an air gap between the first fin structure and the second structure.
3. The method of claim 2 , wherein the air gap comprises atmospheric air.
4. The method of claim 3 , wherein the air gap is filled at or about atmospheric pressure.
5. The method of claim 3 , wherein the air gap is filled at sub-atmospheric pressure.
6. The method of claim 1 , wherein the first stream of the first material and the second stream of the second material are provided and deposited simultaneously.
7. The method of claim 1 , wherein the first stream of the first material and the second stream of the second material are provided and deposited sequentially.
8. The method of claim 1 , wherein the first material and the second material are substantially the same in composition.
9. The method of claim 1 , wherein the first material and the second material are substantially different in composition.
10. The method of claim 1 , wherein the first non-perpendicular angle is between about 70 degrees and about 89 degrees relative to a surface normal of the substrate.
11. The method of claim 1 , wherein the second non-perpendicular angle is between about 91 degrees and about 110 degrees relative to a surface normal of the substrate.
12. The method of claim 1 , further comprising:
scanning the substrate through the first stream of the first material or the second stream of the second material via a movable support.
13. The method of claim 1 , further comprising:
directing the first stream of the first material through a collimator having at least one opening to limit an angular range of the first material passing through the at least one opening.
14. The method of claim 13 , further comprising:
directing the second stream of the second material through the collimator having the at least one opening to limit an angular range of the second material passing through the at least one opening.
15. The method of claim 1 , wherein there is no deposition of the first material or the second material on a bottom portion of the first and second fin structures.
16. A method for encapsulating gratings of a waveguide combiner by asymmetric selective physical vapor deposition (PVD), comprising:
providing a first stream of a first material from a first PVD source towards the waveguide combiner, the waveguide combiner includes an input coupling grating and an output coupling grating, the input coupling grating has at least a first fin structure and a second fin structure having a slant angle relative to a surface normal of the waveguide combiner, the first stream provided in a first direction to one or more surfaces of a first fin structure and at a first non-perpendicular angle relative to a plane of the waveguide combiner;
depositing the first material on the one or more surfaces of the first fin structure;
providing a second stream of a second material from a second PVD source towards the one or more surfaces of the second fin structure of the input coupling grating, the second stream provided in a second direction and at a second non-perpendicular angle relative to the plane of the waveguide combiner; and
depositing the second material on the one or more surfaces of the second fin structure, wherein the deposition of the first material and the second material on the one or more surfaces of the second fin structure forms an encapsulation layer over the first and second fin structures input coupling grating.
17. The method of claim 16 , wherein the first stream of the first material and the second stream of the second material are provided and deposited simultaneously.
18. The method of claim 16 , wherein the first stream of the first material and the second stream of the second material are provided and deposited sequentially.
19. The method of claim 16 , wherein the first material and the second material are substantially the same in composition.
20. A method for encapsulating gratings of a waveguide combiner by asymmetric selective physical vapor deposition (PVD), comprising:
providing a first stream of a first material from a first PVD source towards the waveguide combiner, the waveguide combiner includes an input coupling grating and an output coupling grating, the input coupling grating has at least a first fin structure and a second fin structure, the first stream provided in a first direction to one or more surfaces of a first fin structure and at a first non-perpendicular angle relative to the waveguide combiner a;
directing the first stream of the first material through a collimator having at least one opening to limit an angular range of the first material passing through the at least one opening;
depositing the first material on the one or more surfaces of the first fin structure, the deposition of the first material forming a first protrusion extending laterally from a top portion of the first fin structure;
providing a second stream of a second material from a second PVD source towards one or more surfaces of the second fin structure of the input coupling prating, the second stream provided in a second direction and at a second non-perpendicular angle relative to the waveguide combiner;
directing the second stream of the second material through the collimator having the at least one opening to limit an angular range of the second material passing through the at least one opening; and
depositing the second material on the one or more surfaces of the second fin structure, the deposition of the second material forming a second protrusion extending laterally from the second fin structure, the second protrusion converging with the first protrusion to form an encapsulation layer over the first and second fin structures of the input coupling grating, the encapsulation layer partially defining one or more air gaps between adjacent fins of the grating.