Stage system, lithographic apparatus, method for positioning and device manufacturing method
A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.
1. A stage system for positioning an object, the stage system comprising:
a member having a plurality of gas bearing devices arranged to support the object; and
a control device,
wherein each gas bearing device comprises a free surface having multiple discharge openings in the free surface and an inlet opening in the free surface, the multiple discharge openings are formed in a porous material and the inlet opening is surrounded with the multiple discharge openings,
wherein the free surface is arranged to support and contact the object at least during a materials processing of the object,
wherein the discharge openings are arranged to provide pressurized gas and the inlet opening is arranged to provide a sub-atmospheric pressure, and
wherein the control device is arranged to change a shape of the object by controlling a pressure and/or a gas flow rate at the discharge openings of at least one of the gas bearing devices and/or by controlling a pressure and/or a gas flow rate at the inlet opening of at least one of the gas bearing devices.
2. The stage system of claim 1 , wherein the gas bearing devices are circular.
3. The stage system of claim 1 , further comprising a measurement system configured to obtain shape data of the object arranged on or above the member during activation of the gas bearing devices.
4. The stage system of claim 3 , wherein at least a part of the measurement system is arranged on the member.
5. The stage system of claim 3 , wherein the measurement system comprises a capacitive sensor.
6. The stage system of claim 3 , wherein the control device is configured to receive the shape data from the measurement system to control a pressure and/or a gas flow in the discharge openings of at least one of the gas bearing devices.
7. The stage system of claim 1 , wherein the plurality of gas bearing devices comprises multiple gas bearing groups, and wherein the control device is configured to control a pressure and/or gas flow rate at the discharge openings in at least one gas bearing group separately from the pressure and/or gas flow rate at the discharge openings in at least one other gas bearing group.
8. The stage system of claim 7 , wherein the control device is configured to control a timing of an activation of respective gas bearing groups.
9. The stage system of claim 1 , wherein the control device is configured to change the shape of the object by controlling a pressure and/or gas flow rate at the inlet opening of at least one of the gas bearing devices.
10. A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, wherein the lithographic apparatus comprises the stage system according to claim 1 .
11. A lithographic apparatus comprising:
a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
a substrate table constructed to hold a substrate; and
a projection system configured to project the patterned radiation beam onto a target portion of the substrate,
wherein the substrate table comprises the stage system of claim 1 and the object comprises the substrate.
12. The stage system of claim 1 , wherein a flow resistance to a flow of gas into the porous medium is larger than a flow resistance to a flow of gas into the inlet opening.
13. The stage system of claim 12 , wherein flow resistance is a characteristic respectively of the discharge openings structure itself and of the inlet opening structure itself.
14. The stage system of claim 1 , wherein a materials processing of the object comprises exposing the object to electromagnetic radiation.
15. A method comprising:
supporting an object on a stage, the stage comprising a member having a plurality of gas bearing devices arranged to support the object, wherein each gas bearing device comprises a free surface having multiple discharge openings in the free surface and having an inlet opening in the free surface, wherein the multiple discharge openings are formed in a porous material, wherein the inlet opening is surrounded with the multiple discharge openings, wherein the free surface supports and contacts the object at least during a materials processing of the object, and wherein the discharge openings are arranged to provide pressurized gas and the inlet opening is arranged to provide a sub-atmospheric pressure; and
changing a shape of the object by controlling a pressure and/or a gas flow rate at the discharge openings of at least one of the gas bearing devices and/or by controlling a pressure and/or a gas flow rate at the inlet opening of at least one of the gas bearing devices.
16. The method of claim 15 , further comprising using a measurement system to obtain shape data of the object arranged on or above the member during activation of the gas bearing devices, wherein the controlling is based on the shape data.
17. The method of claim 16 , wherein at least a part of the measurement system is arranged on the member.
18. The method of claim 15 , wherein the plurality of gas bearing devices comprises multiple gas bearing groups, and wherein the controlling comprises controlling a pressure and/or gas flow rate at the discharge openings in at least one gas bearing group separately from the pressure and/or gas flow rate at the discharge openings in at least one other gas bearing group.
19. The method of claim 18 , comprising controlling a timing of an activation of respective gas bearing groups.
20. The method of claim 15 , wherein the controlling comprises controlling a pressure and/or gas flow rate at the inlet opening of at least one of the gas bearing devices.
21. The method of claim 15 , further comprising transferring a pattern from a patterning device onto a substrate as the object.
22. A stage system for positioning an object, the stage system comprising:
a member having a plurality of gas bearing devices arranged to support the object; and
a control device,
wherein each gas bearing device comprises a free surface having a porous medium in the free surface and having an inlet opening in the free surface connected to a channel formed in the porous medium,
wherein the porous medium is arranged to provide pressurized gas to the object and the inlet opening is arranged to provide a sub-atmospheric pressure to the object, wherein the porous medium is exposed to an open interior of the channel on at least part of an interior surface of the channel and has a sealing material contacted on or injected in at least a surface region of the porous medium at a location away from the interior surface of the channel and contacted on or injected in at least part of the interior surface of the channel, and
wherein the control device is arranged to change a shape of the object by controlling a pressure and/or a gas flow rate of the pressurized gas of at least one of the gas bearing devices and/or by controlling a pressure and/or a gas flow rate at the inlet opening of at least one of the gas bearing devices.
23. The stage system of claim 22 , wherein the pressurized gas providing porous medium surrounds the inlet opening.