IP Library › Granted Patent US 11,872,323
Granted Patent B2
US 11,872,323 · App. 17/650,110 · Granted Jan 16, 2024

Gasifier for sterilizer and cleaning method of gasifier for sterilizer

Inventors: Atsushi Hayakawa (Tokyo, JP); Masatoshi Takagi (Tokyo, JP); Kazufumi Suzuki (Tokyo, JP); Hidenori Tanaka (Tokyo, JP); Hayato Akiyama (Tokyo, JP)
Assignee: Dai Nippon Printing Co., Ltd.
A61L2/208B65B55/10A01N59/00A23L3/24A23L3/3445A61L2202/23
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,872,323
App. No.
17/650,110
Granted
Jan 16, 2024
Kind
B2
Abstract

A device capable of stably obtaining gas of a sterilizer containing hydrogen peroxide for a long time is provided. A cleaning device that cleans a heating surface that gasifies a sterilizer of a gasifier for a sterilizer is provided, and after an operation for a fixed time period, the heating surface is cleaned.

Claims (17)

1. A cleaning method of a gasifier for a sterilizer that brings a sterilizer containing at least hydrogen peroxide and a stabilizer into contact with a heating surface to gasify the sterilizer,

wherein the heating surface is cleaned by blasting a cleaning liquid to the heating surface, a cleaning liquid blasting device that blasts the cleaning liquid is separate from a spray nozzle that sprays the sterilizer into the gasifier, and

when the cleaning liquid is blasted to the heating surface the temperature of the heating surface is 50° C. to 250° C.

2. The cleaning method of a gasifier for a sterilizer according to claim 1 ,

wherein after a product is produced by using an aseptic filling and packaging machine, the heating surface is cleaned by blasting a cleaning liquid to the heating surface.

3. The cleaning method of a gasifier for a sterilizer according to claim 2 ,

wherein after the cleaning liquid is blasted to the heating surface, air is blasted to the heating surface.

4. The cleaning method of a gasifier for a sterilizer according to claim 3 ,

wherein the cleaning liquid is water or water containing an acidic compound or a basic compound.

5. The cleaning method of a gasifier for a sterilizer according to claim 2 ,

wherein the cleaning liquid is water or water containing an acidic compound or a basic compound.

6. The cleaning method of a gasifier for a sterilizer according to claim 1 ,

wherein after the cleaning liquid is blasted to the heating surface, air is blasted to the heating surface.

7. The cleaning method of a gasifier for a sterilizer according to claim 6 ,

wherein the cleaning liquid is water or water containing an acidic compound or a basic compound.

8. The cleaning method of a gasifier for a sterilizer according to claim 1 ,

wherein the cleaning liquid is water or water containing an acidic compound or a basic compound.

Priority Claims (1)
JP 2017-029250 · Feb 20, 2017 · national
Continuity (2)
Continuation 16478601
Related Publication 20220152247A1 · May 19, 2022