Polarizing plate, method of manufacturing the same, and optical apparatus
Provided is a polarizing plate 1 having a wire grid structure, the polarizing plate 1 comprising: a transparent substrate 10 ; and grid protrusions 11 provided over the transparent substrate 10 , arranged in an array having a pitch shorter than a wavelength of light in a band to be used, and extending in a predetermined direction, the grid protrusions 11 having a reflective layer 13 , a dielectric layer 14 , and an absorptive layer 15 that are disposed in this order in a direction away from the transparent substrate 10 , and the reflective layer 13 having a maximum width b that is smaller than each of a maximum width of the dielectric layer and a maximum width of the absorptive layer (grid width a). This makes it possible to provide a polarizing plate capable of controlling the wavelength dispersion of absorption axis reflectance more accurately.
1. A polarizing plate having a wire grid structure, the polarizing plate comprising:
a transparent substrate;
grid protrusions provided over the transparent substrate, arranged in an array having a pitch shorter than a wavelength of light in a band to be used, and extending in a predetermined direction; and
a protective film made of a dielectric material and covering a surface of the polarizing plate, the surface being configured to receive incident light,
the grid protrusions having a reflective layer, a first dielectric layer, an absorptive layer, and a second dielectric layer that are disposed in this order in a direction away from the transparent substrate, and
the reflective layer having a width that is smaller than each of a width of the first dielectric layer, a width of the second dielectric layer, and a width of the absorptive layer,
wherein the width of the first dielectric layer, the width of the second dielectric layer, and the width of the absorptive layer are substantially equal to one another,
wherein an absorption axis reflectance of the polarizing plate is minimized in the wavelength of light in the band to be used,
wherein the first dielectric layer, the second dielectric layer, and the absorptive layer each have a thickness such that, in response to the width of the reflective layer being equal to the width of the first dielectric layer, the width of the second dielectric layer, and the width of the absorptive layer, the absorption axis reflectance of the polarizing plate is minimized in a wavelength shorter than the wavelength of light in the band to be used, and
wherein a surface of the second dielectric layer is in contact with the protective film.
2. The polarizing plate according to claim 1 ,
wherein the thickness of the first dielectric layer is 1 nm to 50 nm.
3. The polarizing plate according to claim 1 ,
wherein the thickness of the absorptive layer is 10 nm to 50 nm.
4. The polarizing plate according to claim 1 ,
wherein the transparent substrate is transparent to the wavelength of the light in the band to be used, and is made of glass, quartz, or sapphire.
5. The polarizing plate according to claim 1 ,
wherein the reflective layer is made of aluminum or an aluminum alloy.
6. The polarizing plate according to claim 1 ,
wherein the dielectric layer is made of a Si oxide.
7. The polarizing plate according to claim 1 ,
wherein the absorptive layer is composed of Si as well as Fe or Ta.
8. The polarizing plate according to claim 1 ,
having a surface covered with an organic water-repellent film, the surface being configured to receive incident light.
9. A method of manufacturing a polarizing plate having a wire grid structure and an absorption axis reflectance that is minimized in a wavelength of light in a band to be used, the method comprising:
forming a reflective layer over a transparent substrate;
forming a first dielectric layer on the reflective layer;
forming an absorptive layer on the first dielectric layer;
forming a second dielectric layer on the absorptive layer;
etching a resultant laminate in a selective manner to form, over the transparent substrate, grid protrusions arranged in an array having a pitch shorter than the wavelength of light in the band to be used, and extending in a predetermined direction; and
coating, with a protective film made of a dielectric material, a surface of the transparent substrate having the grid protrusions formed thereover, the surface of the transparent substrate constituting a surface of the polarizing plate, the surface of the polarizing plate being configured to receive incident light,
the etching including making a width of the reflective layer in the grid protrusions smaller than a width of the first dielectric layer in the grid protrusions, a width of the second dielectric layer in the grid protrusions, and a width of the absorptive layer in the grid protrusions; and
adjusting the width of the reflective layer in the grid protrusions such that the absorption axis reflectance of the polarizing plate is minimized in the wavelength of light in the band to be used,
wherein the width of the first dielectric layer, the width of the second dielectric layer, and the width of the absorptive layer are substantially equal to one another,
wherein the first dielectric layer, the second dielectric layer, and the absorptive layer each have a thickness such that, in response to the width of the reflective layer in the grid protrusions being equal to the width of the first dielectric layer in the grid protrusions, the width of the second dielectric layer in the grid protrusions, and the width of the absorptive layer in the grid protrusions, the absorption axis reflectance of the polarizing plate is minimized in a wavelength shorter than the wavelength of light in the band to be used, and
wherein a surface of the second dielectric layer is in contact with the protective film.
10. An optical apparatus comprising the polarizing plate according to claim 1 .