IP Library › Granted Patent US 11,875,827
Granted Patent B2
US 11,875,827 · App. 17/705,147 · Granted Jan 16, 2024

SOT reader using BiSb topological insulator

Inventors: Quang Le (San Jose, CA); Brian R. York (San Jose, CA); Xiaoyong Liu (San Jose, CA); Son T. Le (San Jose, CA); Cherngye Hwang (San Jose, CA); Michael A. Gribelyuk (San Jose, CA); Xiaoyu Xu (San Jose, CA); Kuok San Ho (Emerald Hills, CA); Hisashi Takano (San Jose, CA); Julian Sasaki (Tokyo, JP); Huy H. Ho (Tokyo, JP); Khang H. D. Nguyen (Tokyo, JP); Nam Hai Pham (Tokyo, JP)
Assignee: Western Digital Technologies, Inc.
G11B5/39G11B2005/0021G11B2005/3996
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Quick Facts
Patent No.
US 11,875,827
App. No.
17/705,147
Granted
Jan 16, 2024
Kind
B2
Abstract

The present disclosure generally relate to spin-orbit torque (SOT) devices. The SOT devices each comprise a non-magnetic layer, a free layer disposed in contact with the non-magnetic layer, and a bismuth antimony (BiSb) layer disposed over the free layer. The non-magnetic layer has a thickness of about 0.5 nm to about 2 nm. The BiSb layer has a thickness of about 5 nm to about 10 nm. The BiSb layer and the free layer have collective thickness between about 5 nm to about 20 nm. By reducing the thickness of the non-magnetic layer and BiSb layer, a read gap of each SOT device is reduced while enabling large inverse spin Hall angles and high signal-to-noise ratios.

Claims (47)

1. A spin-orbit torque (SOT) device, comprising:

a first non-magnetic layer;

a first free layer disposed in contact with the first non-magnetic layer;

a first bismuth antimony (BiSb) layer disposed over the first free layer; and

an interlayer disposed between the first free layer and the first BiSb layer, wherein the first BiSb layer, the interlayer, and the first free layer have collective thickness between about 5 nm to about 20 nm.

2. The SOT device of claim 1 , wherein the first BiSb layer and the first free layer have collective thickness less than or equal to about 17 nm.

3. The SOT device of claim 1 , wherein the first non-magnetic layer has a thickness less than or equal to about 2 nm.

4. The SOT device of claim 1 , wherein the first free layer comprises Co, CoFeB, NiFe, or CoFe.

5. The SOT device of claim 1 , wherein the first non-magnetic layer comprises Pt, Ru, Ta, MgO, or a combination thereof.

6. The SOT device of claim 1 , further comprising:

a second non-magnetic layer disposed in contact with the first non-magnetic layer;

a second free layer disposed in contact with the second non-magnetic layer; and

a second bismuth antimony (BiSb) layer disposed over the second free layer, wherein the second BiSb layer and the second free layer have collective thickness between about 5 nm to about 20 nm.

7. A magnetic recording head comprising a write head and a read head, the read head comprising the SOT device of claim 1 .

8. A magnetic recording device comprising the magnetic recording head of claim 7 .

9. A magnetic recording head comprising a write head and a read head, the write head comprising the SOT device of claim 1 .

10. A magnetic recording device comprising the magnetic recording head of claim 9 .

11. A magneto-resistive memory comprising the SOT device of claim 1 .

12. The SOT device of claim 1 , wherein the first BiSb layer has a thickness between about 5 nm to about 10 nm.

13. A spin-orbit torque (SOT) device, comprising:

a shield comprising a magnetic material;

a non-magnetic layer having a thickness between about 0.5 nm to about 5 nm disposed on the shield;

a free layer disposed in contact with the non-magnetic layer;

a bismuth antimony (BiSb) layer having a (012) orientation disposed over the free layer; and

an interlayer disposed between the free layer and the BiSb layer, wherein the BiSb layer, the interlayer, and the free layer have collective thickness between about 5 nm to about 20 nm.

14. The SOT device of claim 13 , wherein the BiSb layer and the free layer have collective thickness less than or equal to about 17 nm.

15. The SOT device of claim 13 , further comprising:

a cap layer disposed over the BiSb layer.

16. The SOT device of claim 13 , wherein the BiSb layer has a thickness between about 5 nm to about 10 nm.

17. The SOT device of claim 13 , wherein the free layer comprises Co, CoFeB, NiFe, or CoFe, and wherein the non-magnetic layer comprises Pt, Ru, Ta, MgO, or a combination thereof.

18. A magnetic recording head comprising a write head and a read head, the read head comprising the SOT device of claim 13 .

19. A magnetic recording device comprising the magnetic recording head of claim 18 .

20. A magnetic recording head comprising a write head and a read head, the write head comprising the SOT device of claim 13 .

21. A magnetic recording device comprising the magnetic recording head of claim 20 .

22. A spin-orbit torque (SOT) device, comprising:

a substrate comprising a magnetic material;

a non-magnetic layer having a thickness between about 0.5 nm to about 5 nm disposed on the substrate, wherein the non-magnetic layer comprises Pt, Ru, Ta, MgO, or a combination thereof;

a free layer disposed in contact with the non-magnetic layer, the free layer comprising Co, CoFeB, NiFe, or CoFe;

an interlayer disposed in contact with the free layer; and

a bismuth antimony (BiSb) layer disposed in contact with the interlayer, wherein the BiSb layer, the interlayer, and the free layer have collective thickness less than or equal to about 17 nm.

23. The SOT device of claim 22 , further comprising a seed layer disposed on the BiSb layer.

24. The SOT device of claim 22 , wherein the BiSb layer has a (012) orientation.

25. A magnetic recording head comprising a write head and a read head, the read head comprising the SOT device of claim 22 .

26. A magnetic recording device comprising the magnetic recording head of claim 25 .

27. A magnetic recording head comprising a write head and a read head, the write head comprising the SOT device of claim 22 .

28. A magnetic recording device comprising the magnetic recording head of claim 27 .

29. A magneto-resistive memory comprising the SOT device of claim 22 .

Assignments (4)
PATENT COLLATERAL AGREEMENT - A&R LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064715/0001 →
PATENT COLLATERAL AGREEMENT - DDTL LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 067045/0156 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 30, 2022
From: LE, QUANG; YORK, BRIAN R.; LIU, XIAOYONG; LE, SON T.; HWANG, CHERNGYE; GRIBELYUK, MICHAEL; YU, XIAOYU; HO, KUOK SAN; TAKANO, HISASHI
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 059444/0365 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 30, 2022
From: PHAM, NAM HAI; SASAKI, JULIAN; HO, HUY H.; NGUYEN, KHANG H. D.
To: TOKYO INSTITUTE OF TECHNOLOGY
Reel/Frame 059444/0396 →
Continuity (1)
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