Methods and systems for providing plasma treatments to optical surfaces

1. A device for inhibiting condensation distortion on an optical element, the device comprising:

a housing;

a chamber within the housing, the chamber being configured to accommodate a dielectric barrier at least partially therein;

electrical circuitry in the housing, the electrical circuitry including a plurality of electric conductors;

a plasma activation region associated with the chamber and being configured to retain the optical element in a manner exposing an optical surface of the optical element thereof to the plasma activation region, wherein when the dielectric barrier is at least partially contained within the chamber:

the plasma activation region is configured to contain gas on a first side of the dielectric barrier, and

at least a first electric conductor of the electrical circuitry is configured to form an electrical connection with a first electrode located on the first side of the dielectric barrier;

a second electrode connected to at least a second electric conductor of the electrical circuitry, the second electrode being located on a second side of the dielectric barrier, opposite the plasma activation region, when the dielectric barrier is at least partially contained within the chamber; and

at least one processor configured to:

control electricity flow through the circuitry to cause an electric field associated with a voltage drop between the first electrode located on the first side of the dielectric barrier and the second electrode located on the second side of the dielectric barrier, to thereby generate plasma within the plasma activation region; and

maintain the generated plasma in the plasma activation region for a time period sufficient to cause the optical surface of the optical element to become hydrophilic.

2. The device of claim 1 , wherein the optical element includes a lens, and the optical surface is a surface of the lens.

3. The device of claim 1 , wherein the chamber is configured to receive an elongated tool with the optical element proximate to a distal end of the elongated tool.

4. The device of claim 1 , wherein the dielectric barrier and the first electrode are removable from the housing.

5. The device of claim 1 , wherein the dielectric barrier is configured to isolate the second electrode from gas in the chamber.

6. The device of claim 1 , wherein a thickness of the dielectric barrier is between about 0.3 mm to about 3 mm.

7. The device of claim 1 , wherein the electrical circuitry in the housing includes a plasma generating field applicator configured to cause the voltage drop to be at least 800 V.

8. The device of claim 1 , wherein the electrical circuitry in the housing includes a plasma generating field applicator configured to cause the voltage drop to be at least 1000 V.

9. The device of claim 1 , wherein the gas that the plasma activation region is configured to contain is air.

10. The device of claim 1 , wherein the gas that the plasma activation region is configured to contain is inert.

11. The device of claim 1 , further including at least one pump for causing at least a partial vacuum in the plasma activation region.

12. The device of claim 11 , wherein a gas pressure associated with the partial vacuum is below 0.1 atm.

13. The device of claim 11 , wherein a gas pressure associated with the partial vacuum is below 0.3 atm.

14. The device of claim 1 , further including a stopper for maintaining a gap between the optical element and the second electrode, the stopper acting as the dielectric barrier between the first electrode and the second electrode.

15. The device of claim 1 , wherein the optical element is moveable relative to the dielectric barrier.