Preserving hierarchical structure information within a design file

1. A method, comprising:

accessing a design file for a digital lithography device from a memory;

detecting areas of interest within the design file based on interactions between structures of cells within one or more hierarchical layers of the design file;

applying one or more compliance rules to the design file to determine compliance of the design file by:

detecting non-orthogonal edges within the areas of interest based on detecting an edge of a first structure of the structures being non-orthogonal with an edge of a second structure of the structures, wherein the first structure and the second structure are overlapping with each other;

detecting non-compliant overlapping structures within the areas of interest; and

detecting a non-compliant interaction between a reference layer of the design file and a target layer of the design file; and

verifying the design file in a response to a comparison of a number of the non-orthogonal edges, the non-compliant overlapping structures and the non-compliant interactions to a threshold, wherein the verified design file is output to the digital lithography device to pattern a substrate based on the verified design file.

2. The method of claim 1 , wherein detecting the non-orthogonal edges further comprises:

detecting a region of overlap between the first structure and the second structure.

3. The method of claim 2 , wherein detecting the region of overlap comprises:

generating a plurality of markers around the first structure and the second structure; and

selecting a first marker and a second marker of the plurality of markers that identify an interaction region of the first structure and the second structure, and wherein determining if the first structure forms an orthogonal edge with the second structure comprises determining if the first marker is orthogonal with the second marker.

4. The method of claim 1 , wherein detecting the non-compliant overlapping structures comprises at least one of:

comparing an amount of a third structure that extends into a fourth structure to a first threshold;

identifying one or more edges of at least one of the third structure and the fourth structure that is non-orthogonal in a region of overlap between the third structure and the fourth structure; and

comparing a number of adjacent edges of the third structure within the region of overlap to an edge threshold.

5. The method of claim 4 , wherein a location corresponding to the third and fourth structures is determined to be non-compliant in response to one or more of:

the amount of the third structure that extends into the fourth structure exceeding the first threshold;

identifying at least one non-orthogonal edge in the region of overlap; and

the number of adjacent edges exceeding the edge threshold.

6. The method of claim 1 , detecting the non-compliant overlapping structures comprises:

identifying a third structure that overlaps with a fourth structure;

determining an amount of overlap between the third and fourth structures; and

comparing the amount of overlap to a distance threshold.

7. The method of claim 6 , wherein a location corresponding to the third structure and the fourth structure is determined to be non-compliant in response to the amount of overlap being less than the threshold.

8. A verification device for verifying a design file for digital lithography, the verification device comprises:

a memory comprising the design file; and

a controller configured to:

access the design file;

detect areas of interest within the design file based on interactions between structures of cells within one or more hierarchical layers of the design file;

apply one or more compliance rules to the design file to determine compliance of the design file by:

detecting non-orthogonal edges within the areas of interest based on detecting an edge of a first structure of the structures being non-orthogonal with an edge of a second structure of the structures, wherein the first structure and the second structure are overlapping with each other;

detecting non-compliant overlapping structures within the areas of interest; and

detecting a non-compliant interaction between a reference layer of the design file and a target layer of the design file; and

verify the design file in response to a comparison of a number of the non-orthogonal edges, the non-compliant overlapping structures and the non-compliant interactions to a threshold, wherein the verified design file is output to a digital lithography device to pattern a substrate based on the verified design file.

9. The verification device of claim 8 , wherein detecting the non-orthogonal edges further comprises:

detecting a region of overlap between the first structure and the second structure.

10. The verification device of claim 9 , wherein detecting the region of overlap comprises:

generating a plurality of markers around the first structure and the second structure; and

selecting a first marker and a second marker of the plurality of markers that identify an interaction region of the first structure and the second structure, and wherein determining if the first structure fails to form an orthogonal edge with the second structure comprises determining if the first marker is orthogonal with the second marker.

11. The verification device of claim 8 , wherein detecting the non-compliant overlapping structures comprises at least one of:

comparing an amount of a third structure that extends into a fourth structure to a first threshold;

identifying one or more edges of at least one of the third structure and the fourth structure that is non-orthogonal in a region of overlap between the third structure and the fourth structure; and

comparing a number of adjacent edges of the third structure within the region of overlap to an edge threshold.

12. The verification device of claim 11 , wherein a location corresponding to the first and second structures is determined to be non-compliant in response to one or more of:

the amount of the third structure that extends into the fourth structure exceeding the first threshold;

identifying at least one non-orthogonal edge in the region of overlap; and

the number of adjacent edges exceeding the edge threshold.

13. The verification device of claim 8 , detecting the non-compliant overlapping structures comprises:

identifying a third structure that overlaps with a fourth structure;

determining an amount of overlap between the third and fourth structures; and

comparing the amount of overlap to a distance threshold.

14. The verification device of claim 13 , wherein a location corresponding to the third structure and the fourth structure is determined to be non-compliant in response to the amount of overlap being less than the threshold.

15. A computer program product for verifying a design file for digital lithography, the computer program product comprising:

a computer-readable storage medium having computer-readable program code embodied therewith, the computer-readable program code executable by one or more computer processors to:

access the design file from a memory;

detect areas of interest within the design file based on interactions between structures of cells within one or more hierarchical layers of the design file;

apply one or more compliance rules the design file to determine compliance of the design file by:

detecting non-orthogonal edges within the areas of interest based on detecting an edge of a first structure of the structures being non-orthogonal with an edge of a second structure of the structures, wherein the first structure and the second structure are overlapping with each other;

detecting non-compliant overlapping structures within the areas of interest; and

detecting a non-compliant interaction between a reference layer of the design file and a target layer of the design file; and

verify the design file in a response to a comparison of a number of the non-orthogonal edges, the non-compliant overlapping structures and the non-compliant interactions to a threshold, wherein the verified design file is output to a digital lithography device to pattern a substrate based on the verified design file.

16. The computer program product of claim 15 , wherein detecting the non-orthogonal edges comprises:

detecting a region of overlap between the first structure and the second structure within the design file; and

determining if the first structure fails to form an orthogonal edge with the second structure.

17. The computer program product of claim 16 , wherein detecting the region of overlap comprises:

generating a plurality of markers around the first structure and the second structure; and

selecting a first marker and a second marker of the plurality of markers that identify an interaction region of the first structure and the second structure, and wherein determining if the first structure forms the orthogonal edge with the second structure comprises determining if the first marker is orthogonal with the second marker.

18. The computer program product of claim 15 , wherein detecting the non-compliant overlapping structures comprises at least one of:

comparing an amount of a third structure that extends into a fourth structure to a first threshold;

identifying one or more edges of at least one of the third structure and the fourth structure that is non-orthogonal in a region of overlap between the third structure and the fourth structure; and

comparing a number of adjacent edges of the third structure within the region of overlap to an edge threshold.

19. The computer program product of claim 18 , wherein a location corresponding to the first and second structures is determined to be non-compliant in response to one or more of:

the amount of the third structure that extends into the fourth structure exceeding the first threshold;

identifying at least one non-orthogonal edge in the region of overlap; and

the number of adjacent edges exceeding the edge threshold.

20. The computer program product of claim 15 , detecting the non-compliant overlapping structures comprises:

identifying a third structure that overlaps with a fourth structure;

determining an amount of overlap between the third and fourth structures; and

comparing the amount of overlap to a distance threshold.