IP Library › Granted Patent US 11,911,871
Granted Patent B2
US 11,911,871 · App. 16/285,605 · Granted Feb 27, 2024

Method of manufacturing composite article

Inventors: Hua-Chou Chiang (Hsinchu County, TW); Chandler Ying Lai See (Hsinchu, TW); Chung-Chieh Ko (Hsinchu, TW)
Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
B24B53/017B24B37/04B27N3/007H01L21/304H01L21/3212H01L21/67
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Quick Facts
Patent No.
US 11,911,871
App. No.
16/285,605
Granted
Feb 27, 2024
Kind
B2
Abstract

A method of manufacturing a composite article includes providing a polishing pad; rubbing over the polishing pad to produce a polishing pad debris; collecting the polishing pad debris; providing a wood material; and applying a force over the wood material and the polishing pad debris to form the composite article, wherein the composite article includes the wood material and the polishing pad debris, and the rubbing of the polishing pad includes removing a portion of the polishing pad to produce the polishing pad debris.

Claims (14)

1. A method of manufacturing a composite article, comprising:

providing a polishing pad including a rough surface;

providing a semiconductor structure disposed above the polishing pad;

contacting the semiconductor structure with the rough surface of the polishing pad;

rotating the semiconductor structure relative to the polishing pad to generate a semiconductor structure debris peeled off from the semiconductor structure and a polishing pad debris peeled off from the polishing pad;

collecting the polishing pad debris generated during the rotation;

providing a wood material; and

mixing the collected polishing pad debris with the wood material to form the composite article.

2. The method of claim 1 , wherein the semiconductor structure debris includes silicon and is physically separated from the semiconductor structure.

3. The method of claim 1 , wherein the semiconductor structure debris and the polishing pad debris are generated simultaneously during the rotation.

4. The method of claim 1 , wherein a first amount of the polishing pad debris in the composite article is less than a second amount of the wood material in the composite article.

5. The method of claim 4 , wherein a ratio of the first amount to the second amount is about 3:7.

6. The method of claim 1 , wherein the polishing pad debris is physically separated from the polishing pad upon the compression.

7. The method of claim 1 , wherein the polishing pad is rotated upon the rotation of the semiconductor structure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 26, 2019
From: CHIANG, HUA-CHOU; SEE, CHANDLER YING LAI; KO, CHUNG-CHIEH
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
Reel/Frame 048439/0136 →
Continuity (2)
Provisional Application 62753302 · Oct 31, 2018
Related Publication 20200130137A1 · Apr 30, 2020