Silicon carbide substrate and method of manufacturing silicon carbide substrate

1. A silicon carbide substrate comprising a first main surface and a second main surface opposite to the first main surface, wherein

the silicon carbide substrate includes screw dislocations and pits having a maximum diameter of 1 μm to 10 μm in a direction parallel to the first main surface,

when the screw dislocations and the pits are observed in the first main surface, a percentage obtained by dividing a number of the pits by a number of the screw dislocations is 1% or less, and

a concentration of magnesium in the first main surface is less than 1×10 11 atoms/cm 2 .

2. The silicon carbide substrate according to claim 1 , wherein each of concentrations of calcium, aluminum, sodium, potassium, and manganese in the first main surface is less than 1×10 11 atoms/cm 2 .

3. The silicon carbide substrate according to claim 1 , wherein each of concentrations of magnesium, calcium, aluminum, sodium, potassium, and manganese in the first main surface is less than 5×10 10 atoms/cm 2 .

4. The silicon carbide substrate according to claim 1 , wherein the screw dislocations in the first main surface have an area density of 100 cm −2 to 5000 cm −2 .

5. The silicon carbide substrate according to claim 1 , wherein each of concentrations of calcium, aluminum, sodium, potassium, and manganese in the first main surface is less than 1×10 11 atoms/cm 2 , and the screw dislocations in the first main surface have an area density of 100 cm −2 to 5000 cm −2 .

6. A method of manufacturing a silicon carbide substrate, the method comprising:

preparing a silicon carbide single-crystal substrate having a first main surface and a second main surface opposite to the first main surface;

performing chemical mechanical polishing on the silicon carbide single-crystal substrate using a polishing liquid; and

after the performing the chemical mechanical polishing on the silicon carbide single-crystal substrate using the polishing liquid, treating the silicon carbide single-crystal substrate using a solution containing an organic acid having two or more carboxy groups in one molecule,

wherein the polishing liquid has a Brix value of 10 or more.

7. The method of manufacturing the silicon carbide substrate according to claim 6 , further comprising, after performing the chemical mechanical polishing on the silicon carbide single-crystal substrate using the polishing liquid and before treating the silicon carbide single-crystal substrate using the solution containing the organic acid having the two or more carboxy groups in the one molecule, immersing the silicon carbide single-crystal substrate in an alkaline solution.

8. The method of manufacturing the silicon carbide substrate according to claim 6 , wherein the organic acid having the two or more carboxy groups in the one molecule is oxalic acid or citric acid.

9. The method of manufacturing the silicon carbide substrate according to claim 6 , wherein the Brix value is 30 or less.

10. The silicon carbide substrate according to claim 1 , wherein each of concentrations of magnesium, calcium, aluminum, sodium, potassium, and manganese in the first main surface is less than 5×10 10 atoms/cm 2 , and the screw dislocations in the first main surface have an area density of 100 cm −2 to 5000 cm −2 .

11. The silicon carbide substrate according to claim 1 , wherein the first main surface has a maximum diameter of 150 mm or more.

12. The silicon carbide substrate according to claim 1 , wherein each of concentrations of calcium, aluminum, sodium, potassium, and manganese in the first main surface is less than 1×10 11 atoms/cm 2 , and the first main surface has a maximum diameter of 150 mm or more.

13. The silicon carbide substrate according to claim 1 , wherein each of concentrations of magnesium, calcium, aluminum, sodium, potassium, and manganese in the first main surface is less than 5×10 10 atoms/cm 2 , and the first main surface has a maximum diameter of 150 mm or more.

14. The method of manufacturing the silicon carbide substrate according to claim 6 , further comprising, after the performing the chemical mechanical polishing on the silicon carbide single-crystal substrate using the polishing liquid and before treating the silicon carbide single-crystal substrate using the solution containing the organic acid having the two or more carboxy groups in the one molecule, immersing the silicon carbide single-crystal substrate in an alkaline solution, wherein the organic acid having the two or more carboxy groups in the one molecule is oxalic acid or citric acid.

15. The method of manufacturing the silicon carbide substrate according to claim 6 , further comprising, after the performing the chemical mechanical polishing on the silicon carbide single-crystal substrate using the polishing liquid and before the treating the silicon carbide single-crystal substrate using the solution containing the organic acid having the two or more carboxy groups in the one molecule, immersing the silicon carbide single-crystal substrate in an alkaline solution, wherein the Brix value is 30 or less.

16. The method of manufacturing the silicon carbide substrate according to claim 6 , wherein the organic acid having the two or more carboxy groups in the one molecule is oxalic acid or citric acid, and the Brix value is 30 or less.

17. The method of manufacturing the silicon carbide substrate according to claim 6 , further comprising, after the performing the chemical mechanical polishing on the silicon carbide single-crystal substrate using the polishing liquid and before the treating the silicon carbide single-crystal substrate using the solution containing the organic acid having the two or more carboxy groups in the one molecule, immersing the silicon carbide single-crystal substrate in an alkaline solution, wherein the organic acid having the two or more carboxy groups in the one molecule is oxalic acid or citric acid, and the Brix value is 30 or less.