Substrate processing apparatus
A substrate processing apparatus includes: a processing chamber; a substrate holder that is disposed in the processing chamber and holds a substrate; a processing liquid supply that supplies a processing liquid to the substrate held in the substrate holder; an infrared camera that acquires an infrared image of the processing chamber; and a controller that detects at least a state of the processing liquid based on the infrared image and monitors presence/absence of an abnormality.
1. A substrate processing apparatus comprising:
a processing chamber;
a substrate holder disposed in the processing chamber and configured to hold a substrate;
a processing liquid supply configured to supply a processing liquid to the substrate held in the substrate holder;
an infrared camera configured to acquire an infrared image of the processing chamber; and
a controller configured to detect at least a state of the processing liquid based on the infrared image and monitor presence/absence of an abnormality;
wherein a plurality of processing chambers is provided,
the substrate holder, the processing liquid supply, and the infrared camera are provided for each of the plurality of processing chambers, and
the presence/absence of an abnormality includes presence/absence of an abnormality derived by comparing states of the processing liquid with each other detected based on infrared images acquired by the infrared cameras provided in the plurality of processing chambers, respectively.
2. The substrate processing apparatus according to claim 1 , wherein the processing liquid supply ejects the processing liquid having a temperature higher than an atmospheric temperature in the processing chamber, and
the controller detects the state of the processing liquid based on a temperature difference between the processing liquid and the atmospheric temperature.
3. The substrate processing apparatus according to claim 1 , wherein the presence/absence of an abnormality includes presence/absence of an abnormality with respect to a position of the processing liquid supply that ejects the processing liquid.
4. The substrate processing apparatus according to claim 1 , wherein the presence/absence of an abnormality includes presence/absence of an abnormality with respect to unexpected dripping of the processing liquid from the processing liquid supply.
5. The substrate processing apparatus according to claim 1 , wherein the presence/absence of an abnormality includes presence/absence of an abnormality with respect to unexpected splash of the processing liquid.
6. The substrate processing apparatus according to claim 1 , wherein the presence/absence of an abnormality includes presence/absence of an abnormality with respect to temperature of the processing liquid on the substrate.
7. The substrate processing apparatus according to claim 1 , wherein the controller also detects temperature of the substrate based on the infrared image and monitors the presence/absence of an abnormality.
8. The substrate processing apparatus according to claim 1 , wherein the controller records information on the presence/absence of an abnormality, in a storage.
9. The substrate processing apparatus according to claim 8 , wherein the controller records ejection start time information indicating when the ejection of the processing liquid from the processing liquid supply starts, and ejection stop time information indicating when the ejection of the processing liquid from the processing liquid supply stops, in the storage as information on the presence/absence of an abnormality.
10. The substrate processing apparatus according to claim 9 , wherein the controller controls an ejection time at which the processing liquid is ejected from the processing liquid supply, based on the ejection start time information and the ejection stop time information.
11. The substrate processing apparatus according to claim 1 , further comprising a notification device,
wherein, when an abnormality is detected, the controller operates the notification device to notify a user of the abnormality.
12. A substrate processing apparatus comprising:
a processing chamber;
a substrate holder disposed in the processing chamber and configured to hold a substrate;
a processing liquid supply configured to supply a processing liquid to the substrate held in the substrate holder;
an infrared camera configured to acquire an infrared image of the processing chamber; and
a controller configured to detect at least a state of the processing liquid based on the infrared image and monitor presence/absence of an abnormality;
wherein the controller records information on the presence/absence of an abnormality, in a storage, and
wherein the controller records ejection start time information indicating when the ejection of the processing liquid from the processing liquid supply starts, and ejection stop time information indicating when the ejection of the processing liquid from the processing liquid supply stops, in the storage as information on the presence/absence of an abnormality.
13. The substrate processing apparatus according to claim 12 , wherein the processing liquid supply ejects the processing liquid having a temperature higher than an atmospheric temperature in the processing chamber, and
the controller detects the state of the processing liquid based on a temperature difference between the processing liquid and the atmospheric temperature.
14. The substrate processing apparatus according to claim 12 , wherein the presence/absence of an abnormality includes presence/absence of an abnormality with respect to unexpected dripping of the processing liquid from the processing liquid supply.
15. The substrate processing apparatus according to claim 12 , wherein the presence/absence of an abnormality includes presence/absence of an abnormality with respect to unexpected splash of the processing liquid.
16. The substrate processing apparatus according to claim 12 , wherein the presence/absence of an abnormality includes presence/absence of an abnormality with respect to temperature of the processing liquid on the substrate.
17. The substrate processing apparatus according to claim 12 , wherein the presence/absence of an abnormality includes presence/absence of an abnormality with respect to a position of the processing liquid supply that ejects the processing liquid.
18. The substrate processing apparatus according to claim 12 , wherein the controller also detects temperature of the substrate based on the infrared image and monitors the presence/absence of an abnormality.
19. The substrate processing apparatus according to claim 12 , wherein a plurality of processing chambers is provided,
the substrate holder, the processing liquid supply, and the infrared camera are provided for each of the plurality of processing chambers, and
the presence/absence of an abnormality includes presence/absence of an abnormality derived by comparing states of the processing liquid with each other detected based on infrared images acquired by the infrared cameras provided in the plurality of processing chambers,
respectively.
20. The substrate processing apparatus according to claim 12 , wherein the controller controls an ejection time at which the processing liquid is ejected from the processing liquid supply, based on the ejection start time information and the ejection stop time information.
21. The substrate processing apparatus according to claim 12 , further comprising a notification device,
wherein, when an abnormality is detected, the controller operates the notification device to notify a user of the abnormality.