Display device including touch sensor and manufacturing method for the same
A display device is provided that includes a substrate including an active area and a non-active area, a planarization film disposed over the substrate, an anode electrode disposed on the planarization film and including a first hole in the non-active area, a bank disposed on the anode electrode, a cathode electrode disposed on the bank, an encapsulation layer disposed on the cathode electrode, and a touch sensor disposed on the encapsulation layer and including a touch line in the non-active area. Here, the first hole may be disposed not to overlap with the touch line.
1. A display device comprising:
a substrate including an active area, in which a plurality of pixels are disposed, and a non-active area outside the active area;
a planarization film disposed over the substrate;
an anode electrode disposed in the non-active area on the planarization film and including a first hole penetrating through the anode electrode in the non-active area;
a bank disposed on the anode electrode;
a cathode electrode disposed on the bank;
an encapsulation layer disposed on the cathode electrode; and
a touch sensor disposed on the encapsulation layer and including a touch line in the non-active area,
wherein the first hole is disposed not to overlap with the touch line.
2. The display device according to claim 1 , wherein the anode electrode in the non-active area further includes a second hole penetrating through the anode electrode and having a size smaller than the first hole, and
wherein the second hole is disposed to overlap with the touch line.
3. The display device according to claim 1 , wherein the touch line includes a plurality of touch signal lines, and the first hole is disposed between the plurality of touch signal lines.
4. The display device according to claim 1 , further comprising a gate signal generation circuit disposed below the planarization film in the non-active area,
wherein the cathode and anode electrodes are disposed to overlap with the gate signal generation circuit.
5. The display device according to claim 4 , wherein the first hole is disposed to overlap with the gate signal generation circuit.
6. The display device according to claim 1 , wherein the encapsulation layer comprises:
a first inorganic film;
a second inorganic film; and
an organic film disposed between the first and second inorganic films.
7. The display device according to claim 1 , wherein the first hole is disposed in a region in which the planarization film and the bank contact with each other.
8. A method of manufacturing a display device, the method comprising:
disposing a planarization film over a substrate including an active area, in which a plurality of pixels are disposed, and a non-active area outside the active area;
disposing an anode electrode in the non-active area on the planarization film, the anode electrode including a first hole penetrating through the anode electrode in the non-active area;
disposing a bank on the anode electrode;
disposing a cathode electrode on the bank;
disposing an encapsulation layer on the cathode electrode; and
disposing a touch sensor on the encapsulation layer, the touch sensor including a touch line in the non-active area,
wherein the first hole is disposed not to overlap with the touch line.
9. The method according to claim 8 , wherein the anode electrode in the non-active area further includes a second hole penetrating through the anode electrode and having a size smaller than the first hole, and
wherein the second hole is disposed to overlap with the touch line.
10. The method according to claim 8 , wherein the touch line includes a plurality of touch signal lines, and the first hole is disposed between the plurality of touch signal lines.
11. The method according to claim 8 , further comprising disposing a gate signal generation circuit in the non-active area of the substrate before disposing the planarization film,
wherein the cathode and anode electrodes are disposed to overlap with the gate signal generation circuit.
12. The method according to claim 11 , wherein the first hole is disposed to overlap with the gate signal generation circuit.
13. The method according to claim 8 , wherein the encapsulation layer comprises:
a first inorganic film;
a second inorganic film; and
an organic film disposed between the first and second inorganic films.
14. The method according to claim 8 , wherein the first hole is disposed in a region in which the planarization film and the bank contact with each other.
15. The method of claim 8 , wherein the first hole penetrates through a top surface and a bottom surface of the anode electrode in the non-active area.
16. The method of claim 8 , wherein the anode electrode in the non-active area surrounds all lateral sides of the first hole in a plan view.
17. The display device of claim 1 , wherein the first hole penetrates through a top surface and a bottom surface of the anode electrode in the non-active area.
18. The display device of claim 1 , wherein the anode electrode in the non-active area surrounds all lateral sides of the first hole in a plan view.