Semiconductor device and a method for fabricating the same
A semiconductor device includes a first gate structure disposed on a substrate and extending in a first direction. The first gate structure includes a first gate electrode, a first cap insulating layer disposed over the first gate electrode, first sidewall spacers disposed on opposing side faces of the first gate electrode and the first cap insulating layer and second sidewall spacers disposed over the first sidewall spacers. The semiconductor device further includes a first protective layer formed over the first cap insulating layer, the first sidewall spacers and the second sidewall spacers. The first protective layer has a π-shape having a head portion and two leg portions in a cross section along a second direction perpendicular to the first direction.
1. A semiconductor device comprising:
a gate structure including:
a gate electrode,
a cap insulating layer disposed over the gate electrode,
first sidewall spacers disposed on opposing side faces of the gate electrode and on opposing side faces of the cap insulating layer, and
second sidewall spacers disposed on the first sidewall spacers,
wherein the first sidewall spacers include lower portions and upper portions having different material than the lower portions,
a bottom of the upper portion is disposed on a top of the lower portion, and
the lower portions and upper portions are in contact with side surfaces of the cap insulating layer.
2. The semiconductor device of claim 1 , wherein a respective interface between the lower portions and the upper portions is located at a height below a top of the cap insulating layer and at a height above a top of the gate electrode.
3. The semiconductor device of claim 1 , wherein the cap insulating layer is made of a same material as the second sidewall spacers and is made of a different material than the lower portions of the first sidewall spacers.
4. The semiconductor device of claim 3 , wherein the cap insulating layer and the second sidewall spacers are made of a silicon nitride based material.
5. The semiconductor device of claim 4 , wherein the lower portions of the first sidewall spacers are made of a silicon oxide based material.
6. The semiconductor device of claim 1 , wherein:
the cap insulating layer and the second sidewall spacers are made of SiN, and
the lower portions of the first sidewall spacers are made of at least one of SiOC or SiOCN.
7. The semiconductor device of claim 6 , wherein the upper portions of the first sidewall spacers are made of at least one of aluminum nitride, aluminum oxynitride, aluminum oxide, titanium oxide, or zirconium oxide.
8. The semiconductor device of claim 1 , wherein the gate electrode is a metal gate electrode.
9. A semiconductor device comprising:
a gate structure including:
a gate electrode,
a cap insulating layer disposed over the gate electrode,
first sidewall spacers disposed on opposing side faces of the gate electrode and on opposing side faces of the cap insulating layer, and
second sidewall spacers disposed on the first sidewall spacers, wherein:
the first sidewall spacers include lower portions and upper portions having different material than the lower portions,
the upper portions of the first sidewall spacers are connected by a connection part made of a same material as the upper portions, and
the connection part is in contact with tops of the second sidewall spacers.
10. The semiconductor device of claim 9 , wherein the connection part is in contact with a top of the cap insulating layer.
11. The semiconductor device of claim 9 , wherein a respective interface between the lower portions and the upper portions is located at a height below a top of the cap insulating layer and at a height above a top of the gate electrode.
12. The semiconductor device of claim 9 , wherein:
the cap insulating layer and the second sidewall spacers are made of SiN, and
the first sidewall spacers are made of at least one of SiOC and SiOCN.
13. The semiconductor device of claim 12 , wherein the connection part is made of at least one of aluminum nitride, aluminum oxynitride, aluminum oxide, titanium oxide, or zirconium oxide.
14. The semiconductor device of claim 9 , wherein a thickness of the connecting part over the cap insulating layer is in a range from 1 nm to 5 nm.
15. A semiconductor device comprising:
a gate structure including:
a gate electrode,
a cap insulating layer disposed over the gate electrode,
first sidewall spacers disposed on opposing side faces of the gate electrode and on opposing side faces of the cap insulating layer, and
second sidewall spacers disposed on the first sidewall spacers;
a source/drain epitaxial layer adjacent to the gate structure;
a source/drain contact contacting the source/drain epitaxial layer; and
a source/drain cap layer disposed on the source/drain contact,
wherein the first sidewall spacers include lower portions and upper portions having different material than the lower portions,
the upper portions are connected by a connection part disposed above the gate electrode, and
a ratio H1/H2 of a thickness H1 of the vertical length of the upper portion to a thickness of the connecting part is in a range from 2 to 6.
16. The semiconductor device of claim 15 , wherein a lowermost portion of the upper portions is located at a height above a lowermost portion of the cap insulating layer and above a top of the gate electrode.
17. The semiconductor device of claim 16 , wherein a top of the source/drain cap layer is located above a top of the gate electrode.
18. The semiconductor device of claim 17 , wherein a lowermost portion of the upper portions is located above a top of the source/drain contact.
19. The semiconductor device of claim 15 , wherein the source/drain cap insulating layer is made of SiC or SiOC.
20. The semiconductor device of claim 15 , wherein the upper portions of the first sidewall spacers are made of at least one of aluminum nitride, aluminum oxynitride, aluminum oxide, titanium oxide, or zirconium oxide.