Adhesive composition, film-like adhesive and production method thereof, and semiconductor package using film-like adhesive and production method thereof

1. An adhesive composition, comprising:

an epoxy resin (A);

an epoxy resin curing agent (B);

a polymer component (C); and

an inorganic filler (D),

wherein the inorganic filler (D) satisfies the condition (1) of (an average particle diameter (d50) is 0.1 to 3.5 μm) and condition (2) of (a ratio of a particle diameter at 90% cumulative distribution frequency (d90) to the average particle diameter (d50) is 5.0 or less), and

wherein a proportion of the inorganic filler (D) in a total content of the epoxy resin (A), the epoxy resin curing agent (B), the polymer component (C) and the inorganic filler (D) is 20 to 70% by volume.

2. The adhesive composition according to claim 1 ,

wherein when a film-like adhesive obtained from the adhesive composition is heated at a temperature elevation rate of 5° C./′min from 25° C., a melt viscosity at 70° C. reaches a range of 6,000 to 50,000 Pa·s, and a melt viscosity at 120° C. reaches a range of 500 to 10,000 Pa·s, and

wherein a cured product having a thermal conductivity of 1.0 W/m·K or more is obtained after thermal curing of the film-like adhesive.

3. The adhesive composition according to claim 1 , wherein the polymer component (C) comprises a phenoxy resin.

4. The adhesive composition according to claim 1 ,

wherein the inorganic filler (D) is a particle made of a thermally conductive material or a particle whose surface is coated with the thermally conductive material, and

wherein a thermal conductivity of the thermally conductive material is 12 W/m·K or more.

5. A film-like adhesive, which is obtained from the adhesive composition according to claim 1 ,

wherein an arithmetic average roughness Ra of a surface of the film-like adhesive is 3.0 μm or less, and

wherein a thickness of the film-like adhesive is in a range of 1 μm or more and less than 10 μm.

6. A method of producing a film-like adhesive, comprising manufacturing by applying the adhesive composition according to claim 1 on a substrate film subjected to release treatment and drying the adhesive composition.

7. A method of producing a semiconductor package, comprising:

a first step of providing an adhesive layer by thermocompression bonding the film-like adhesive according to claim 5 to a back surface of a semiconductor wafer in which at least one semiconductor circuit is formed on a surface, and providing a dicing tape via the adhesive layer;

a second step of dicing the semiconductor wafer and the adhesive layer simultaneously to obtain a semiconductor chip with an adhesive layer, the semiconductor chip with an adhesive layer including the semiconductor wafer and the adhesive layer on the dicing tape;

a third step of removing the dicing tape from the adhesive layer and thermocompression bonding the semiconductor chip with an adhesive layer and a wiring board via the adhesive layer; and

a fourth step of thermally curing the adhesive layer.