Additive manufacturing of polishing pads
A formulation, system, and method for additive manufacturing of a polishing pad. The formulation includes monomer, dispersant, and nanoparticles. A method of preparing the formulation includes adding a dispersant that is a polyester derivative to monomer, adding metal-oxide nanoparticles to the monomer, and subjecting the monomer having the nanoparticles and dispersant to sonication to disperse the nanoparticles in the monomer.
1. A formulation for three dimensional (3D) printing of a polishing layer of a polishing pad, comprising:
a parent formulation comprising:
monomer;
a dispersant comprising a polyester derivative; and
nanoparticles dispersed in the parent formulation, wherein the dispersant is less than 6 weight percent of the parent formulation, and wherein the nanoparticles are at least 45 weight percent of the parent formulation.
2. The formulation of claim 1 , wherein the nanoparticles comprise ceria nanoparticles.
3. The formulation of claim 1 , wherein the nanoparticles comprise silica nanoparticles.
4. The formulation of claim 1 , wherein the monomer comprises a methacrylate monomer.
5. The formulation of claim 1 , wherein viscosity of the parent formulation is less than 8 centipoise (cP) at 70° C.
6. The formulation of claim 1 , wherein the formulation further comprises a crosslinker, an oligomer, a surface energy modifier, or a rheology modifier, or any combinations thereof.
7. The formulation of claim 6 , wherein viscosity of the formulation is less than 17 centipoise (cP) at 70° C.
8. The formulation of claim 6 , wherein the nanoparticles comprise cerium (IV) oxide (CeO2) nanoparticles, and wherein the nanoparticles are at least 25 weight percent of the formulation.
9. The formulation of claim 6 , wherein the formulation does not comprise a surfactant.
10. A formulation for three dimensional (3D) printing of a polishing layer of a polishing pad, comprising:
a parent formulation comprising:
monomer;
a dispersant comprising a polyester derivative; and
nanoparticles dispersed in the parent formulation, wherein the monomer is less than 50 weight percent of the parent formulation.
11. A formulation for three dimensional (3D) printing of a polishing layer of a polishing pad, comprising:
a parent formulation comprising:
monomer;
a dispersant comprising a polyester derivative; and
nanoparticles dispersed in the parent formulation, wherein the nanoparticles comprise metal-oxide nanoparticles, and wherein the polyester derivative comprises an ester block and an ether block.
12. A method of fabricating a polishing pad, comprising:
ejecting droplets of a formulation via a three-dimensional (3D) printer to form a polishing layer of the polishing pad, wherein the formulation comprises monomer, nanoparticles dispersed in the monomer, and a dispersant comprising a polyester derivative; and
polymerizing the monomer as ejected to form the polishing layer, wherein the polishing layer comprises the nanoparticles, wherein the nanoparticles comprise ceria nanoparticles, and wherein the polyester derivative comprises an ester block and an ether block.
13. The method of claim 12 , wherein the dispersant comprises less than 6 weight percent of the formulation.
14. The method of claim 12 , wherein the formulation does not comprise a surfactant.
15. The method of claim 12 , wherein the formulation comprises a crosslinker, an oligomer, a surface energy modifier, or a rheology modifier, or any combinations thereof, and wherein viscosity of the formulation is less than 17 centipoise (cP) at 70° C.
16. The method of claim 12 , wherein the nanoparticles comprise at least 25 weight percent of the formulation.