Light-emitting element, manufacturing method therefor, and display device having light-emitting element

1. A light emitting element comprising:

an emission stacked pattern having a rod shape, the emission stacked pattern including:

a first conductive semiconductor layer;

an active layer disposed on the first conductive semiconductor layer; and

a second conductive semiconductor layer disposed on the active layer; and

an insulating film surrounding an outer surface of the emission stacked pattern and having a non-uniform thickness.

2. The light emitting element according to claim 1 , wherein a shape of the outer surface of the emission stacked pattern is different from a shape of an outer surface of the insulating film as seen from a perspective facing a distil end of the emission stacked pattern.

3. The light emitting element according to claim 2 , wherein

the emission stacked pattern includes the first conductive semiconductor layer, the active layer, and the second conductive semiconductor layer that are sequentially stacked, and

the outer surface of the insulating film has an elliptical shape, a polygonal shape, or a shape having the elliptical shape and the polygonal shape.

4. The light emitting element according to claim 3 , wherein the insulating film comprises at least one protrusion on the outer surface of the insulating film.

5. The light emitting element according to claim 1 , wherein a shape of the outer surface of the emission stacked pattern is same as a shape of an outer surface of the insulating film.

6. The light emitting element according to claim 5 , wherein the outer surface of the emission stacked pattern and the outer surface of the insulating film each have a polygonal shape.

7. A method of manufacturing a light emitting element, comprising:

forming an emission stacked pattern on a substrate, the emission stacked pattern having a rod shape;

forming an insulating film surrounding an outer surface of the emission stacked pattern, the insulating film having a non-uniform thickness; and

separating the emission stacked pattern surrounded by the insulating film from the substrate to form light emitting elements.

8. The method according to claim 7 , wherein the forming of the insulating film comprises:

forming an insulating film pattern having an outer surface that has a same shape as a shape of the outer surface of the emission stacked pattern; and

forming an insulating film having an outer surface that has a different shape from the shape of the outer surface of the emission stacked pattern by removing at least a portion of the insulating film pattern.

9. The method according to claim 7 , wherein the forming of the insulating film includes forming the insulating film to have an outer surface having an elliptical shape, a polygonal shape, or a shape having the elliptical shape and the polygonal shape to surround a cylindrical outer surface of the emission stacked pattern.

10. The method according to claim 9 , wherein the forming of the insulating film includes forming at least one protrusion on the outer surface of the insulating film.

11. The method according to claim 7 , wherein the forming of the emission stacked pattern comprises:

forming an emission stack by sequentially forming a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer on the substrate;

forming first micro patterns on the emission stack; and

forming a plurality of emission stacked patterns by etching the emission stack along the first micro patterns and removing the first micro patterns.

12. The method according to claim 11 , wherein the forming of the first micro patterns comprises:

forming first resins on the emission stack;

providing the first resins to fill first grooves of a first mold; and

forming the first micro patterns on the emission stack by removing the first mold.

13. The method according to claim 8 , wherein the forming of the insulating film comprises:

forming second micro patterns on the emission stacked pattern and the insulating film pattern; and

forming the insulating film by etching the insulating film pattern along the second micro patterns.

14. The method according to claim 13 , wherein the forming of the second micro patterns comprises:

forming second resins on the emission stacked pattern and the insulating film pattern that surrounds the outer surface of the emission stacked pattern;

providing the second resins to fill second grooves of a second mold; and

forming second micro patterns, by removing the second mold, on the emission stacked pattern and the insulating film pattern that surrounds the outer surface of the emission stacked pattern.

15. The method according to claim 14 , wherein a shape of the first groove of the first mold is different from a shape of the second groove of the second mold.

16. The method according to claim 7 , wherein the forming of the insulating film includes forming the insulating film to have an outer surface that has a same shape as a shape of the outer surface of the emission stacked pattern.

17. The method according to claim 16 , wherein the outer surface of the emission stacked pattern and the outer surface of the insulating film have a polygonal shape.

18. A display device, comprising:

a substrate including a display area and a non-display area; and

a plurality of pixels disposed in the display area of the substrate, each of the plurality of pixels including a plurality of sub-pixels, respectively, wherein

each of the plurality of sub-pixels comprises:

a pixel circuit layer including at least one transistor; and

a display element layer including an emission area that emits light,

the display element layer includes:

at least one light emitting element disposed on the substrate and emitting light;

a first electrode and a second electrode spaced apart from each other, the at least one light emitting element being disposed between the first electrode and the second electrode;

a first contact electrode electrically connecting the first electrode and a first end of the at least one light emitting element; and

a second contact electrode electrically connecting the second electrode and a second end of the at least one light emitting element, and the at least one light emitting element comprises:

an emission stacked pattern including:

a first conductive semiconductor layer;

an active layer disposed on the first conductive semiconductor layer; and

a second conductive semiconductor layer disposed on the active layer; and

an insulating film surrounding an outer surface of the emission stacked pattern and having a non-uniform thickness.

19. The display device according to claim 18 , wherein a shape of the outer surface of the emission stacked pattern is different from a shape of an outer surface of the insulating film.