IP Library › Granted Patent US 11,988,574
Granted Patent B2
US 11,988,574 · App. 17/456,240 · Granted May 21, 2024

Illumination system for AR metrology tool

Inventors: Yangyang Sun (San Jose, CA); Jinxin Fu (Fremont, CA); Kazuya Daito (Milpitas, CA); Ludovic Godet (Sunnyvale, CA)
Assignee: Applied Materials, Inc.
G01M11/0264G02B19/0047G02B27/30G06T7/0002H04N23/56G06T2207/10152G06T2207/30168G06T2207/30204
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Quick Facts
Patent No.
US 11,988,574
App. No.
17/456,240
Granted
May 21, 2024
Kind
B2
Abstract

Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.

Claims (25)

1. A method, comprising:

projecting a pattern, the pattern projected with a light from a light engine, the light engine disposed in a measurement system, the measurement system having:

a stage operable to retain an optical device or an optical device substrate having at least one optical device disposed thereon, the light engine disposed above the stage;

projecting a light at a range of wavelengths from a plurality of light sources of the light engine toward the at least one optical device;

collimating the light from a plurality of light sources through a first lens;

positioning a reticle tray disposed below the plurality of light sources, the reticle tray having a plurality of reticles disposed thereon, each reticle of the plurality of reticles having a different pattern to be projected when the light is directed to each reticle of the plurality of reticles, each reticle pattern corresponding to a different metrology metric, the reticle tray movable such that each of the plurality of reticles is positionable below the first lens; and

directing the pattern projected from reticle tray to a second lens disposed below the reticle tray;

projecting the pattern from second lens to an input coupling grating of the optical device; detecting one or more images of the pattern, the image detected when the pattern undergoing total internal reflection through the optical device is outcoupled to a reflection detector; and

processing the image to extract the metrology metric.

2. The method of claim 1 , wherein a light width of the light is substantially equal to a width of the input coupling grating of the optical device.

3. The method of claim 1 , further comprising rotating or tilting the light engine when projecting the light.

4. The method of claim 1 , further comprising utilizing an alignment camera of the measurement system to correct misalignments of the optical device relative to the light engine.

5. The method of claim 1 , wherein the metrology metrics include one or more of an angular uniformity metric, a contrast metric, a efficiency metric, a color uniformity metric, a modulation transfer function (MTF) metric, a field of view (FOV) metric, a ghost image metric, an eye box metric.

6. The method of claim 1 , further comprising repeating the method for subsequent patterns.

7. A method, comprising:

projecting a pattern, the pattern projected with a light from a light engine, the light engine disposed in a measurement system, the measurement system having:

a stage operable to retain an optical device or an optical device substrate having at least one optical device disposed thereon, the light engine disposed above the stage;

projecting a light at a range of wavelengths from a plurality of light sources of the light engine toward the at least one optical device;

collimating the light from a plurality of light sources through a first lens;

positioning a reticle tray disposed below the plurality of light sources, the reticle tray having a plurality of reticles disposed thereon, each reticle of the plurality of reticles having a different pattern to be projected when the light is directed to each reticle of the plurality of reticles, each reticle pattern corresponding to a different metrology metric, the reticle tray movable such that each of the plurality of reticles is positionable below the first lens; and

directing the pattern projected from reticle tray to a second lens disposed below the reticle tray;

projecting the pattern from second lens to an input coupling grating of the optical device; detecting one or more images of the pattern, the image detected when the pattern undergoing total internal reflection through the optical device is outcoupled to a detector; and

processing the image to extract the metrology metric.

8. The method of claim 7 , further comprising utilizing an alignment camera of the measurement system to correct misalignments of the optical device relative to the light engine.

9. The method of claim 7 , wherein the metrology metrics include one or more of an angular uniformity metric, a contrast metric, a efficiency metric, a color uniformity metric, a modulation transfer function (MTF) metric, a field of view (FOV) metric, a ghost image metric, an eye box metric.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 23, 2022
From: SUN, YANGYANG; FU, JINXIN; DAITO, KAZUYA; GODET, LUDOVIC
To: APPLIED MATERIALS, INC.
Reel/Frame 059372/0705 →
Continuity (3)
Provisional Application 63184398 · May 5, 2021
Provisional Application 63117576 · Nov 24, 2020
Related Publication 20220163423A1 · May 26, 2022