Passivation of silicon dioxide defects for atomic layer deposition

1. A method for selectively depositing a metal, metal nitride, metal oxide, or metal silicide layer on a substrate, the substrate comprising a surface, the surface comprising: an SiO2 layer portion comprising hydroxyl groups on SiO 2 ; and a metal or metal oxide portion, the method comprising:

a) pre-treating the SiO2 layer portion of the surface, wherein the pre-treating cleans and renders the SiO2 layer portion of the surface hydrophilic;

b) exposing the surface to a passivant for a period of time between about 2 hours and less than about 24 hours at a temperature of about 200° C. or below that renders the surface of the SiO2 layer portion of the surface hydrophobic;

c) annealing the substrate at a temperature of about 300° C. or above to selectively passivate the SiO2 layer portion of the surface over the metal or metal oxide portion of the surface, wherein the passivant binds selectively to —OH or O on the SiO2 layer portion over the metal or metal oxide portion above about 300° C., wherein the passivant is selectively bound to the SiO2 portion of the surface over the metal or metal oxide portion of the surface, and wherein the metal or metal oxide of the surface is unpassivated and/or has characteristics of an unpassivated surface after the substrate is annealed; and

d) selectively growing the metal, metal nitride, metal oxide, or metal silicide layer on the metal or metal oxide portion of the surface,

wherein the passivant enhances selective growth of the metal, metal nitride, metal oxide, or metal silicide layer on the metal or metal oxide portion of the surface over the SiO2 layer portion of the surface, and wherein the metal, metal oxide, metal nitride, or metal silicide layer is grown by atomic layer deposition (ALD), and wherein the passivant is tetramethyldisilazane (TMDS).

2. The method of claim 1 , wherein the substrate is annealed in an ultra-high vacuum (UHV) after the substrate is exposed to the passivant.

3. The method of claim 1 , wherein the metal or metal oxide portion of the surface of the substrate comprises W, Cu, or Co.

4. The method of claim 1 , wherein the metal, metal nitride, metal oxide, or metal silicide layer grown is molybdenum silicide, titanium dioxide, or hafnium dioxide.

5. The method of claim 1 , wherein exposing the oxide layer portion of the surface of the substrate to the passivant comprises exposing the oxide layer portion of the surface of the substrate to a solution comprising the passivant.

6. The method of claim 1 , wherein the surface is exposed to the passivant at a temperature between about 70° C. and about 100° C.

7. A method for selectively depositing a molybdenum silicide TiO 2 layer on a substrate, the substrate comprising a surface, the surface comprising: a SiO 2 portion; and a Cu or Co portion, the method comprising:

a) pre-treating the SiO 2 portion of the surface, the SiO 2 portion of the surface comprising hydroxyl groups, wherein the pre-treating renders the SiO 2 portion of the surface hydrophilic;

b) exposing the SiO 2 portion of the surface to a passivant for a period of time of less than about 24 hours at a temperature of about 200° or below that renders the surface of the SiO 2 portion of the surface hydrophobic;

c) annealing the substrate at a temperature of about 300° C. or above to selectively passivate the SiO 2 portion of the surface over the Cu or Co portion of the surface, wherein the passivant is selectively bound to the SiO 2 portion of the surface over the Cu or Co portion of the surface, and wherein the Cu or Co portion of the surface is unpassivated and/or has characteristics of an unpassivated surface after the substrate is annealed; and

d) selectively growing the molybdenum silicide or TiO 2 layer on the Cu or Co portion of the surface,

wherein the passivant enhances selective growth of the molybdenum silicide or TiO 2 layer on the Cu or Co portion of the surface over the SiO 2 portion of the surface, wherein the molybdenum silicide or TiO 2 layer is grown by atomic layer deposition (ALD), and wherein the passivant is tetramethyldisilazane (TMDS).

8. The method of claim 7 , wherein the substrate is annealed in an ultra-high vacuum (UHV) after the substrate is exposed to the passivant.

9. The method of claim 7 , wherein exposing the SiO 2 portion of the surface to the passivant comprises exposing the SiO 2 portion of the surface to a solution comprising the passivant.

10. The method of claim 7 , wherein the surface is exposed to the passivant for a period of time between about 2 hours and about 24 hours.