IP Library › Granted Patent US 12,004,381
Granted Patent B2
US 12,004,381 · App. 17/504,927 · Granted Jun 4, 2024

Display apparatus and method of manufacturing the same

Inventors: Yung Bin Chung (Yongin-si, KR); Yeoungkeol Woo (Seongnam-si, KR); Kwanghyun Kim (Hwaseong-si, KR); Sangwoo Sohn (Yongin-si, KR); Dokeun Song (Yongin-si, KR); Sangwook Lee (Yongin-si, KR); Heon Sik Ha (Hwaseong-si, KR)
Assignee: SAMSUNG DISPLAY CO., LTD.
H10K59/124H01L27/1237H10K59/1213
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Quick Facts
Patent No.
US 12,004,381
App. No.
17/504,927
Granted
Jun 4, 2024
Kind
B2
Abstract

A display apparatus includes a base substrate, an active pattern disposed on the base substrate, a gate insulation layer disposed on the active pattern, a gate electrode disposed on the gate insulation layer and overlapping the active pattern, a first insulation layer disposed on the gate electrode and having a total amount of hydrogen of about 5 atomic percent (at. %) to about 30 at. %, and a source electrode and a drain electrode which are disposed on the first insulation layer and are electrically connected to the active pattern.

Claims (42)

1. A display apparatus, comprising:

a base substrate;

an active pattern disposed on the base substrate;

a gate insulation layer disposed on the active pattern;

a gate electrode disposed on the gate insulation layer and overlapping the active pattern;

a first insulation layer disposed on the gate electrode and comprising silicon (Si), nitrogen (N), and hydrogen (H);

a second insulation layer disposed on the first insulation layer;

a storage electrode disposed between the first insulation layer and the second insulation layer and overlapping the gate electrode; and

a source electrode and a drain electrode which are disposed on the second insulation layer and are electrically connected to the active pattern,

wherein the first insulation layer has a total amount of hydrogen of about 5 atomic percent to about 30 atomic percent, Si—H bond in the first insulation layer is about 0.1 atomic percent to about 10 atomic percent, and the first insulation layer has a reflective index of about 1.884 to about 2.312.

2. The display apparatus of claim 1 , wherein the gate electrode comprises:

a conductive layer comprising aluminum (Al) or aluminum alloy;

a first capping layer disposed on the conductive layer and comprising titanium nitride (TiNx); and

a second capping layer disposed on the first capping layer and comprising titanium (Ti).

3. The display apparatus of claim 2 , wherein an atomic ratio of nitrogen and titanium, which is a number of nitrogen atoms divided by a number of titanium atoms, contained in the first capping layer of the gate electrode is about 0.9 to about 1.2.

4. The display apparatus of claim 2 , wherein the active pattern comprises poly silicon.

5. The display apparatus of claim 1 ,

wherein the storage electrode comprises:

a conductive layer comprising aluminum (Al) or aluminum alloy;

a first capping layer disposed on the conductive layer and comprising titanium nitride (TiNx); and

a second capping layer disposed on the first capping layer and comprising titanium (Ti).

6. The display apparatus of claim 5 , wherein an atomic ratio of nitrogen and titanium, which is a number of nitrogen atoms divided by a number of titanium atoms, contained in the first capping layer of the gate electrode is about 0.9 to about 1.2.

7. The display apparatus of claim 1 , further comprising:

a via insulation layer disposed on the source and drain electrodes; and

a light emitting structure disposed on the via insulation layer.

8. The display apparatus of claim 7 , wherein the light emitting structure comprises:

a first electrode disposed on the via insulation layer, and electrically connected to the drain electrode;

a light emitting layer disposed on the first electrode; and

a second electrode disposed on the light emitting layer, and

wherein a thin film transistor comprising the active pattern, the gate electrode, the source electrode, and the drain electrode is a driving transistor for supplying a driving current to the light emitting structure.

9. A display apparatus, comprising:

a base substrate;

an active pattern disposed on the base substrate;

a gate insulation layer disposed on the active pattern;

a gate electrode disposed on the gate insulation layer and overlapping the active pattern;

a first insulation layer disposed on the gate electrode and having a total amount of hydrogen of about 5 atomic percent to about 30 atomic percent;

a second insulation layer disposed on the first insulation layer;

a storage electrode disposed between the first insulation layer and the second insulation layer and overlapping the gate electrode; and

a source electrode and a drain electrode which are disposed on the second insulation layer and are electrically connected to the active pattern.

10. The display apparatus of claim 9 , wherein the first insulation layer comprises silicon (Si), nitrogen (N), and hydrogen (H).

11. The display apparatus of claim 10 , wherein Si—H bond in the first insulation layer is about 0.1 atomic percent to about 10 atomic percent.

12. The display apparatus of claim 10 , wherein the first insulation layer has a reflective index of about 1.884 to about 2.312.

Priority Claims (1)
KR 10-2018-0118152 · Oct 4, 2018 · national
Continuity (2)
Continuation 16575845 · Sep 19, 2019
Related Publication 20220037435A1 · Feb 3, 2022