IP Library › Granted Patent US 12,009,636
Granted Patent B2
US 12,009,636 · App. 18/164,285 · Granted Jun 11, 2024

Wavelength-variable laser

Inventors: Junji Yoshida (Tokyo, JP); Hirokazu Itoh (Tokyo, JP); Satoshi Irino (Tokyo, JP); Yuichiro Irie (Tokyo, JP); Taketsugu Sawamura (Tokyo, JP)
Assignee: FURUKAWA ELECTRIC CO., LTD.
H01S5/3216H01S3/0675H01S3/06754H01S5/02251H01S5/02253H01S5/1064H01S5/2018H01S5/2077H01S5/2205H01S5/2206H01S5/227H01S5/3213H01S5/34H01S5/3406H01S5/34306H01S5/3434B82Y20/00H01S3/04H01S3/094003H01S3/094011H01S3/09415H01S3/302H01S5/0064H01S5/024H01S5/0287H01S5/1039H01S5/146H01S5/2222H01S2301/03H01S2301/166
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Quick Facts
Patent No.
US 12,009,636
App. No.
18/164,285
Granted
Jun 11, 2024
Kind
B2
Abstract

An optical semiconductor device outputting a predetermined wavelength of laser light includes a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction. The optical semiconductor device includes a separate confinement heterostructure layer positioned between the quantum well active layer and the n-type cladding layer. The optical semiconductor device further includes an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and the n-type cladding layer and configured by at least two semiconductor layers having band gap energy greater than band gap energy of a barrier layer constituting the quantum well active layer. The optical semiconductor device is applied to a ridge-stripe type laser.

Claims (51)

1. An optical semiconductor device outputting a predetermined wavelength of laser light comprising:

a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction;

a separate confinement heterostructure layer positioned between the quantum well active layer and the n-type cladding layer; and

an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and the n-type cladding layer and configured by at least two semiconductor layers having band gap energy greater than band gap energy of a barrier layer constituting the quantum well active layer, wherein the optical semiconductor device is fabricated on a GaAs substrate.

2. The optical semiconductor device according to claim 1 , further comprising a current constriction structure positioned at both sides of width direction of the quantum well active layer, wherein

the electric-field-distribution-control layer is formed to overlap with the current constriction structure in the thickness direction.

3. The optical semiconductor device according to claim 1 , wherein

the semiconductor layers constituting the electric-field-distribution-control layer are constituted by a first semiconductor layer made from semiconductor material having band gap energy that is the same as the n-type cladding layer and a second semiconductor layer made from semiconductor material having band gap energy greater than the barrier layer constituting the quantum well active layer.

4. The optical semiconductor device according to claim 3 , wherein

the first semiconductor layer is made from InP, and the second semiconductor layer is made from III-V group compound semiconductor including an As atom and a P atom as composition.

5. The optical semiconductor device according to claim 4 , wherein

the second semiconductor layer is made from GaInAsP, and

a sum of layer thicknesses of the second semiconductor layers constituting the electric-field-distribution-control layer is equal to or smaller than 1 μm.

6. The optical semiconductor device according to claim 5 , wherein band gap composition wavelength of GaInAsP constituting the second semiconductor layer is equal to or greater than 1 μm.

7. A semiconductor laser module comprising:

an optical semiconductor device which is a semiconductor laser element outputting a predetermined wavelength of laser light comprising:

a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction;

a separate confinement heterostructure layer positioned between the quantum well active layer and the n-type cladding layer; and

an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and the n-type cladding layer and configured by at least two semiconductor layers having band gap energy greater than band gap energy of a barrier layer constituting the quantum well active layer;

a temperature-control module controlling temperature of the semiconductor laser element;

an optical fiber guiding the laser light outputted from the semiconductor laser element to outside; and

an optical-coupling lens system coupling the semiconductor laser element and the optical fiber optically, wherein the optical semiconductor device is fabricated on a GaAs substrate.

8. The semiconductor laser module according to claim 7 , further comprising:

an optical detector measuring optical output from the semiconductor laser element; and

an optical isolator transmitting therethrough the laser light outputted from the semiconductor laser element.

9. The semiconductor laser module according to claim 7 , further comprising:

an optical detector measuring optical output from the semiconductor laser element; and

an optical feedback unit returning a part of the laser light propagating the optical fiber to the semiconductor laser element.

10. An optical fiber amplifier comprising:

a semiconductor laser module comprising:

an optical semiconductor device which is a semiconductor laser element outputting a predetermined wavelength of laser light comprising:

a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction;

a separate confinement heterostructure layer positioned between the quantum well active layer and the n-type cladding layer; and

an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and the n-type cladding layer and configured by at least two semiconductor layers having band gap energy greater than band gap energy of a barrier layer constituting the quantum well active layer;

a temperature-control module controlling temperature of the semiconductor laser element;

an optical fiber guiding the laser light outputted from the semiconductor laser element to outside; and

an optical-coupling lens system coupling the semiconductor laser element and the optical fiber optically;

an amplification optical fiber including amplification medium; and

an optical coupler multiplexing inputted signal light and the laser light outputted from the semiconductor laser module and making the multiplexed light input into the amplification optical fiber, wherein the optical semiconductor device is fabricated on a GaAs substrate.

11. An optical fiber amplifier comprising:

a semiconductor laser module comprising:

an optical semiconductor device which is a semiconductor laser element outputting a predetermined wavelength of laser light comprising:

a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction;

a separate confinement heterostructure layer positioned between the quantum well active layer and the n-type cladding layer; and

an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and the n-type cladding layer and configured by at least two semiconductor layers having band gap energy greater than band gap energy of a barrier layer constituting the quantum well active layer;

a temperature-control module controlling temperature of the semiconductor laser element;

an optical fiber guiding the laser light outputted from the semiconductor laser element to outside; and

an optical-coupling lens system coupling the semiconductor laser element and the optical fiber optically;

an optical fiber transmitting signal light; and

an optical coupler making the laser light outputted from the semiconductor laser module input into the optical fiber, wherein

an optical amplification is performed by Raman amplification, wherein the optical semiconductor device is fabricated on a GaAs substrate.

Continuity (9)
Division 17187086 · Feb 26, 2021
Continuation 16672163 · Nov 1, 2019
Continuation In Part 16029285 · Jul 6, 2018
Continuation In Part 15454444 · Mar 9, 2017
Continuation 14795387 · Jul 9, 2015
Continuation 14507374 · Oct 6, 2014
Continuation PCTJP2013060391 · Apr 4, 2013
Provisional Application 61621013 · Apr 6, 2012
Related Publication 20230187906A1 · Jun 15, 2023
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