Faceplate tensioning method and apparatus to prevent droop
Embodiments of showerheads for use in a process chamber and methods of reducing drooping of a showerhead faceplate are provided herein. In some embodiments, a showerhead for use in a process chamber includes: a faceplate having a plurality of gas distribution holes disposed therethrough; and one or more cables that engage with the faceplate and configured to prestress the faceplate.
1. A showerhead for use in a process chamber, comprising:
a faceplate having a plurality of gas distribution holes disposed therethrough; and
one or more cables that engage with the faceplate and configured to prestress the faceplate, wherein the faceplate includes one or more channels on an upper surface thereof to accommodate the one or more cables, wherein the one or more channels include an annular portion extending about an outer periphery of the faceplate and radial portions extending from the annular portion to an outer sidewall of the faceplate.
2. The showerhead of claim 1 , further comprising one or more cover plates disposed on the faceplate to cover the one or more channels.
3. The showerhead of claim 1 , wherein the one or more channels comprise two channels and the radial portions of each of the two channels are disposed approximately 180 degrees from each other.
4. The showerhead of claim 1 , wherein the one or more cables are disposed radially outward of the plurality of gas distribution holes.
5. The showerhead of claim 1 , wherein the one or more cables comprise a plurality of interwoven metal strands.
6. The showerhead of claim 1 , further comprising an anchor coupled to each end of the one or more cables and configured to maintain the one or more cables in a stressed position to prestress the faceplate.
7. The showerhead of claim 1 , wherein an upper surface of the faceplate includes an annular seal groove disposed radially inward from the one or more cables.
8. The showerhead of claim 1 , further comprising a blocker plate having a plurality of through holes coupled to an upper surface of the faceplate.
9. A process chamber, comprising:
a chamber body coupled to a lid assembly to define an interior volume therein;
a substrate support disposed in the interior volume; and
a faceplate having an outer periphery that rests on the chamber body, wherein the faceplate includes a plurality of gas distribution holes extending therethrough disposed in the interior volume opposite the substrate support, wherein one or more cables are disposed proximate the outer periphery of the faceplate and configured to prestress the faceplate, wherein the faceplate includes one or more channels on an upper surface thereof to house the one or more cables, and wherein one or more cover plates are disposed over the one or more cables to cover the one or more channels.
10. The process chamber of claim 9 , wherein the one or more cables are embedded in the faceplate.
11. The process chamber of claim 9 , further comprising an upper liner and a lower liner surrounding the substrate support.