Alkali-free glass

1. An alkali-free glass having a strain point of 650° C. or more, an average coefficient of thermal expansion at 50 to 350° C. of from 30×10 −7 to 45×10 −7 /° C., and a temperature T 2 at which a glass viscosity reaches 10 2 dPa·s of from 1,500 to 1,800° C.,

comprising, as represented by mol % based on oxides,

SiO 2 : from 62 to 70%,

Al 2 O 3 : from 9 to 16%

B 2 O 3 : from 0 to 12%,

MgO: from 5 to 10%,

CaO: from 4 to 12%,

SrO: from 0 to 6%,

BaO from 0 to 1%, and

Fe 2 O 3 : from 0.001 to 0.04%,

provided that MgO+CaO+SrO+BaO is from 12 to 25%, and

having a β-OH value of from 0.35 to 0.85/mm.

2. The alkali-free glass according to claim 1 , wherein a value represented by the following formula A is from 7 to 30:

(3.119×10 −4 T 2 2 −0.2014 T 2 −17.38)[Fe 2 O 3 ]+(6.434×10 −7 T 2 2 +0.0144 T 2 −7.842)[β-OH]  Formula A

wherein [Fe 2 O 3 ] is a numerical value represented by mol % of a total iron in terms of Fe 2 O 3 , and [β-OH] is a numerical value represented by a unit/mm.

3. The alkali-free glass according to claim 1 , having an effective thermal conductivity at the temperature T 2 at which the glass viscosity reaches 10 2 dPa·s of from 40 to 65 W/m·K.

4. The alkali-free glass according to claim 1 , having a transmittance at a wavelength of 300 nm in terms of a plate thickness of 0.5 mm of 50% or more.

5. The alkali-free glass according to claim 1 , having a glass plate shape and a thickness of from 0.05 mm to 3 mm.

6. A method for producing the alkali-free glass according to claim 1 , comprising forming a molten glass by a float process or a fusion process.

7. A display panel comprising the alkali-free glass according to claim 1 .

8. A semiconductor device comprising the alkali-free glass according to claim 1 .

9. An information recording medium comprising the alkali-free glass according to claim 1 .