IP Library › Granted Patent US 12,027,207
Granted Patent B2
US 12,027,207 · App. 17/646,549 · Granted Jul 2, 2024

Vertical memory devices and methods for operating the same

Inventors: DongXue Zhao (Hubei, CN); Tao Yang (Hubei, CN); Yuancheng Yang (Hubei, CN); Lei Liu (Hubei, CN); Di Wang (Hubei, CN); Kun Zhang (Hubei, CN); Wenxi Zhou (Hubei, CN); Zhiliang Xia (Hubei, CN); ZongLiang Huo (Hubei, CN)
Assignee: Yangtze Memory Technologies Co., Ltd.
G11C16/0433G11C16/08G11C16/24G11C16/26G11C16/30
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,027,207
App. No.
17/646,549
Granted
Jul 2, 2024
Kind
B2
Abstract

This disclosure is directed to methods for performing operations on a memory device. The memory device can include a bottom select gate, a plate line above the bottom select gate, a word line above the plate line, a pillar extending through the bottom select gate, the plate line, and the word line, a source line under the pillar, a drain cap above the pillar and a bit line formed above the drain cap. The method can include applying a first positive voltage bias to the bottom select gate and applying a second positive voltage bias to the word line. The method can also include applying a third positive voltage bias to the bit line after the word line reaches the second positive voltage bias. The method can further include applying a ground voltage to the word line and applying the ground voltage to the bit line.

Claims (20)

1. A method for performing a programming operation on a memory device, wherein the memory device comprises a bottom select gate, a plate line above the bottom select gate, a word line above the plate line, a pillar extending through the bottom select gate, a source line under the pillar, and a bit line formed above the pillar, the method comprising:

applying a first positive voltage bias to the bottom select gate;

applying a second positive voltage bias to the word line;

applying a third positive voltage bias to the bit line after the word line reaches the second positive voltage bias;

applying a ground voltage to the word line; and

applying the ground voltage to the bit line.

2. The method of claim 1 , wherein applying the ground voltage comprises performing the applying to the word line after the bit line reaches the third positive voltage bias.

3. The method of claim 1 , wherein applying the ground voltage to the bit line comprises performing the applying after the word line reaches the ground voltage.

4. The method of claim 1 , further comprising applying a fourth positive voltage bias to the plate line.

5. The method of claim 1 , wherein applying the first positive voltage bias comprises applying a voltage of between about 0.9 V and about 1.1 V to the bottom select gate.

6. A method for performing a programming operation on a memory device, wherein the memory device comprises a plate line, a bias gate above the plate line, a word line above the plate line, a pillar extending through the plate line, a source line under the pillar, a drain cap above the pillar and a bit line formed above the drain cap, the method comprising:

applying a first positive voltage bias to the bias gate;

applying a second positive voltage bias to the word line;

applying a third positive voltage bias to the bit line after the word line reaches the second positive voltage bias;

applying a ground voltage to the word line; and

applying the ground voltage to the bit line.

7. The method of claim 6 , wherein applying the ground voltage to the word line occurs after the bit line reaches the third positive voltage bias.

8. The method of claim 6 , wherein applying the ground voltage to the bit line occurs after the word line reaches the ground voltage.

9. The method of claim 6 , further comprising applying a fourth positive voltage bias to the plate line.

10. The method of claim 6 , wherein applying the first positive voltage bias comprises applying a voltage of between about 0.9 V and about 1.1 V to the bias gate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 30, 2021
From: ZHAO, DONGXUE; YANG, TAO; YANG, YUANCHENG; LIU, LEI; WANG, DI; ZHANG, KUN; ZHOU, WENXI; XIA, ZHILIANG; HUO, ZONGLIANG
To: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
Reel/Frame 058511/0071 →
Continuity (2)
Continuation PCTCN2021129782 · Nov 10, 2021
Related Publication 20230142290A1 · May 11, 2023